JPS6138138B2 - - Google Patents
Info
- Publication number
- JPS6138138B2 JPS6138138B2 JP55006633A JP663380A JPS6138138B2 JP S6138138 B2 JPS6138138 B2 JP S6138138B2 JP 55006633 A JP55006633 A JP 55006633A JP 663380 A JP663380 A JP 663380A JP S6138138 B2 JPS6138138 B2 JP S6138138B2
- Authority
- JP
- Japan
- Prior art keywords
- glass
- gas
- sioxny
- raw material
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000007789 gas Substances 0.000 claims description 88
- 239000011521 glass Substances 0.000 claims description 76
- 229910020286 SiOxNy Inorganic materials 0.000 claims description 37
- 239000002994 raw material Substances 0.000 claims description 34
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 21
- 230000005540 biological transmission Effects 0.000 claims description 17
- 238000006243 chemical reaction Methods 0.000 claims description 17
- 230000003287 optical effect Effects 0.000 claims description 17
- 238000004519 manufacturing process Methods 0.000 claims description 16
- 239000000843 powder Substances 0.000 claims description 16
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 14
- 229910052757 nitrogen Inorganic materials 0.000 claims description 14
- 239000001301 oxygen Substances 0.000 claims description 14
- 229910052760 oxygen Inorganic materials 0.000 claims description 14
- 150000003377 silicon compounds Chemical class 0.000 claims description 12
- 150000002829 nitrogen Chemical class 0.000 claims description 5
- -1 nitrogen halide Chemical class 0.000 claims description 5
- VPCDQGACGWYTMC-UHFFFAOYSA-N nitrosyl chloride Chemical compound ClN=O VPCDQGACGWYTMC-UHFFFAOYSA-N 0.000 claims description 2
- 235000019392 nitrosyl chloride Nutrition 0.000 claims description 2
- 229910020080 NCl3 Inorganic materials 0.000 claims 1
- 229910004068 NO2Cl Inorganic materials 0.000 claims 1
- ZGNIYAPHJAPRMA-UHFFFAOYSA-N chlorine azide Chemical compound ClN=[N+]=[N-] ZGNIYAPHJAPRMA-UHFFFAOYSA-N 0.000 claims 1
- QEHKBHWEUPXBCW-UHFFFAOYSA-N nitrogen trichloride Chemical group ClN(Cl)Cl QEHKBHWEUPXBCW-UHFFFAOYSA-N 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical group O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 30
- 229910004298 SiO 2 Inorganic materials 0.000 description 23
- 238000000034 method Methods 0.000 description 19
- 229910003902 SiCl 4 Inorganic materials 0.000 description 18
- 239000000835 fiber Substances 0.000 description 13
- 238000005245 sintering Methods 0.000 description 13
- 230000015572 biosynthetic process Effects 0.000 description 9
- 238000005229 chemical vapour deposition Methods 0.000 description 9
- 239000011261 inert gas Substances 0.000 description 9
- 238000003786 synthesis reaction Methods 0.000 description 9
- 239000000377 silicon dioxide Substances 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 239000010453 quartz Substances 0.000 description 6
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 5
- 229910001882 dioxygen Inorganic materials 0.000 description 5
- 239000003365 glass fiber Substances 0.000 description 5
- 229910052739 hydrogen Inorganic materials 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 230000001590 oxidative effect Effects 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 4
- 239000001257 hydrogen Substances 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 238000005253 cladding Methods 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 239000002019 doping agent Substances 0.000 description 3
- 238000010030 laminating Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000000567 combustion gas Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000006060 molten glass Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 230000002787 reinforcement Effects 0.000 description 2
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 2
- 230000000087 stabilizing effect Effects 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 229910005793 GeO 2 Inorganic materials 0.000 description 1
- 241001024304 Mino Species 0.000 description 1
- 101150110302 RND3 gene Proteins 0.000 description 1
- 229910018557 Si O Inorganic materials 0.000 description 1
- 229910007991 Si-N Inorganic materials 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910004283 SiO 4 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910006294 Si—N Inorganic materials 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- GEIAQOFPUVMAGM-UHFFFAOYSA-N ZrO Inorganic materials [Zr]=O GEIAQOFPUVMAGM-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- CFQGDIWRTHFZMQ-UHFFFAOYSA-N argon helium Chemical compound [He].[Ar] CFQGDIWRTHFZMQ-UHFFFAOYSA-N 0.000 description 1
- JFIOVJDNOJYLKP-UHFFFAOYSA-N bithionol Chemical compound OC1=C(Cl)C=C(Cl)C=C1SC1=CC(Cl)=CC(Cl)=C1O JFIOVJDNOJYLKP-UHFFFAOYSA-N 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- SLLGVCUQYRMELA-UHFFFAOYSA-N chlorosilicon Chemical compound Cl[Si] SLLGVCUQYRMELA-UHFFFAOYSA-N 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000002360 explosive Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 150000004678 hydrides Chemical class 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000005340 laminated glass Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 238000009987 spinning Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
Landscapes
- Optical Fibers, Optical Fiber Cores, And Optical Fiber Bundles (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
- Glass Compositions (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP663380A JPS56104738A (en) | 1980-01-22 | 1980-01-22 | Preparation of glass preform for light-piping |
DE19803037491 DE3037491C2 (de) | 1979-10-04 | 1980-10-03 | Verfahren zur Herstellung einer Glasvorform für optische Fasern |
GB8032139A GB2062615B (en) | 1979-10-04 | 1980-10-06 | Preparing glass preform for optical transmission |
US06/217,075 US4402720A (en) | 1980-01-22 | 1980-12-16 | Process for preparing glass preform for optical fiber |
GB08316931A GB2129417B (en) | 1979-10-04 | 1983-06-22 | A process for preparing a glass preform for optical transmission |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP663380A JPS56104738A (en) | 1980-01-22 | 1980-01-22 | Preparation of glass preform for light-piping |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS56104738A JPS56104738A (en) | 1981-08-20 |
JPS6138138B2 true JPS6138138B2 (en, 2012) | 1986-08-27 |
Family
ID=11643759
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP663380A Granted JPS56104738A (en) | 1979-10-04 | 1980-01-22 | Preparation of glass preform for light-piping |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56104738A (en, 2012) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4378987A (en) * | 1981-10-15 | 1983-04-05 | Corning Glass Works | Low temperature method for making optical fibers |
JPS60151241A (ja) * | 1984-01-17 | 1985-08-09 | Hitachi Cable Ltd | 光フアイバ母材の製造方法 |
JPS6117435A (ja) * | 1984-07-05 | 1986-01-25 | Hitachi Cable Ltd | 光フアイバ母材の製造方法 |
JP5329347B2 (ja) * | 2009-08-27 | 2013-10-30 | 湖北工業株式会社 | 紫外線伝送用光ファイバ及びその製造方法 |
-
1980
- 1980-01-22 JP JP663380A patent/JPS56104738A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS56104738A (en) | 1981-08-20 |
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