JPS6137775B2 - - Google Patents

Info

Publication number
JPS6137775B2
JPS6137775B2 JP16171380A JP16171380A JPS6137775B2 JP S6137775 B2 JPS6137775 B2 JP S6137775B2 JP 16171380 A JP16171380 A JP 16171380A JP 16171380 A JP16171380 A JP 16171380A JP S6137775 B2 JPS6137775 B2 JP S6137775B2
Authority
JP
Japan
Prior art keywords
substrate
protective resin
film
resin film
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP16171380A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5785230A (en
Inventor
Eiji Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP16171380A priority Critical patent/JPS5785230A/ja
Publication of JPS5785230A publication Critical patent/JPS5785230A/ja
Publication of JPS6137775B2 publication Critical patent/JPS6137775B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP16171380A 1980-11-17 1980-11-17 Substrate treatment Granted JPS5785230A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16171380A JPS5785230A (en) 1980-11-17 1980-11-17 Substrate treatment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16171380A JPS5785230A (en) 1980-11-17 1980-11-17 Substrate treatment

Publications (2)

Publication Number Publication Date
JPS5785230A JPS5785230A (en) 1982-05-27
JPS6137775B2 true JPS6137775B2 (tr) 1986-08-26

Family

ID=15740456

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16171380A Granted JPS5785230A (en) 1980-11-17 1980-11-17 Substrate treatment

Country Status (1)

Country Link
JP (1) JPS5785230A (tr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06100825B2 (ja) * 1985-08-29 1994-12-12 富士通株式会社 パタ−ン形成方法
JP7602924B2 (ja) * 2021-02-02 2024-12-19 東京エレクトロン株式会社 基板処理装置、基板処理システム、基板処理方法及びコンピュータ記憶媒体

Also Published As

Publication number Publication date
JPS5785230A (en) 1982-05-27

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