JPS6135561Y2 - - Google Patents

Info

Publication number
JPS6135561Y2
JPS6135561Y2 JP16684682U JP16684682U JPS6135561Y2 JP S6135561 Y2 JPS6135561 Y2 JP S6135561Y2 JP 16684682 U JP16684682 U JP 16684682U JP 16684682 U JP16684682 U JP 16684682U JP S6135561 Y2 JPS6135561 Y2 JP S6135561Y2
Authority
JP
Japan
Prior art keywords
glow discharge
exhaust chamber
high frequency
vacuum tube
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP16684682U
Other languages
English (en)
Japanese (ja)
Other versions
JPS5969966U (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP16684682U priority Critical patent/JPS5969966U/ja
Publication of JPS5969966U publication Critical patent/JPS5969966U/ja
Application granted granted Critical
Publication of JPS6135561Y2 publication Critical patent/JPS6135561Y2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP16684682U 1982-11-02 1982-11-02 グロ−放電発生装置 Granted JPS5969966U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16684682U JPS5969966U (ja) 1982-11-02 1982-11-02 グロ−放電発生装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16684682U JPS5969966U (ja) 1982-11-02 1982-11-02 グロ−放電発生装置

Publications (2)

Publication Number Publication Date
JPS5969966U JPS5969966U (ja) 1984-05-12
JPS6135561Y2 true JPS6135561Y2 (enrdf_load_stackoverflow) 1986-10-16

Family

ID=30365180

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16684682U Granted JPS5969966U (ja) 1982-11-02 1982-11-02 グロ−放電発生装置

Country Status (1)

Country Link
JP (1) JPS5969966U (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS5969966U (ja) 1984-05-12

Similar Documents

Publication Publication Date Title
US3763031A (en) Rf sputtering apparatus
JP2002173763A (ja) アーク蒸発源装置、その駆動方法、及びイオンプレーティング装置
US4727029A (en) Apparatus and method for the pretreatment of biological specimens for use in scanning electron microscopes
JP3150056B2 (ja) プラズマ処理装置
JPS6135561Y2 (enrdf_load_stackoverflow)
JPH0241168Y2 (enrdf_load_stackoverflow)
JPH07249614A (ja) プラズマエッチング方法及びその装置
JP2635195B2 (ja) 静電チャックの帯電除去方法
JP4642212B2 (ja) 真空処理装置及び真空処理方法
JPH0241169Y2 (enrdf_load_stackoverflow)
US4419380A (en) Method for ion-aided coating on electrically insulating substrates
JP2003137521A (ja) 成膜方法
JPH06124673A (ja) イオン注入装置におけるプラズマ発生方法
JPS63458A (ja) 真空ア−ク蒸着装置
JPH08222553A (ja) 処理装置及び処理方法
JPS60158629A (ja) マイクロ波プラズマ処理装置
JP2001064775A (ja) カーボンナノチューブ薄膜形成装置及び形成方法
JPS63238266A (ja) スパツタリング装置
JPS629324Y2 (enrdf_load_stackoverflow)
JPH0676749A (ja) イオン源
JPH04315797A (ja) プラズマ処理装置およびそのプラズマ源のクリーニング方法
JP3788632B2 (ja) 連続イオンプレーティング装置
JPS6323826B2 (enrdf_load_stackoverflow)
JPH06101458B2 (ja) プラズマ気相成長装置
JPS58171568A (ja) スパツタリング装置