JPH0241169Y2 - - Google Patents
Info
- Publication number
- JPH0241169Y2 JPH0241169Y2 JP7272583U JP7272583U JPH0241169Y2 JP H0241169 Y2 JPH0241169 Y2 JP H0241169Y2 JP 7272583 U JP7272583 U JP 7272583U JP 7272583 U JP7272583 U JP 7272583U JP H0241169 Y2 JPH0241169 Y2 JP H0241169Y2
- Authority
- JP
- Japan
- Prior art keywords
- frequency power
- high frequency
- power source
- electrode
- plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 230000008020 evaporation Effects 0.000 description 4
- 238000001704 evaporation Methods 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 238000007733 ion plating Methods 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 2
- 239000000284 extract Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7272583U JPS59178899U (ja) | 1983-05-16 | 1983-05-16 | プラズマ発生装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7272583U JPS59178899U (ja) | 1983-05-16 | 1983-05-16 | プラズマ発生装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59178899U JPS59178899U (ja) | 1984-11-29 |
| JPH0241169Y2 true JPH0241169Y2 (enrdf_load_stackoverflow) | 1990-11-01 |
Family
ID=30202859
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7272583U Granted JPS59178899U (ja) | 1983-05-16 | 1983-05-16 | プラズマ発生装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59178899U (enrdf_load_stackoverflow) |
-
1983
- 1983-05-16 JP JP7272583U patent/JPS59178899U/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59178899U (ja) | 1984-11-29 |
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