JPS6135561Y2 - - Google Patents
Info
- Publication number
- JPS6135561Y2 JPS6135561Y2 JP16684682U JP16684682U JPS6135561Y2 JP S6135561 Y2 JPS6135561 Y2 JP S6135561Y2 JP 16684682 U JP16684682 U JP 16684682U JP 16684682 U JP16684682 U JP 16684682U JP S6135561 Y2 JPS6135561 Y2 JP S6135561Y2
- Authority
- JP
- Japan
- Prior art keywords
- glow discharge
- exhaust chamber
- high frequency
- vacuum tube
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000008020 evaporation Effects 0.000 description 8
- 238000001704 evaporation Methods 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 8
- 238000001514 detection method Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 238000007733 ion plating Methods 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 239000002245 particle Substances 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16684682U JPS5969966U (ja) | 1982-11-02 | 1982-11-02 | グロ−放電発生装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16684682U JPS5969966U (ja) | 1982-11-02 | 1982-11-02 | グロ−放電発生装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5969966U JPS5969966U (ja) | 1984-05-12 |
| JPS6135561Y2 true JPS6135561Y2 (enrdf_load_html_response) | 1986-10-16 |
Family
ID=30365180
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16684682U Granted JPS5969966U (ja) | 1982-11-02 | 1982-11-02 | グロ−放電発生装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5969966U (enrdf_load_html_response) |
-
1982
- 1982-11-02 JP JP16684682U patent/JPS5969966U/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5969966U (ja) | 1984-05-12 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US3763031A (en) | Rf sputtering apparatus | |
| US20020046941A1 (en) | Arc evaporator, method for driving arc evaporator, and ion plating apparatus | |
| US4727029A (en) | Apparatus and method for the pretreatment of biological specimens for use in scanning electron microscopes | |
| JP3150056B2 (ja) | プラズマ処理装置 | |
| JPS6135561Y2 (enrdf_load_html_response) | ||
| JPH0241168Y2 (enrdf_load_html_response) | ||
| JPH07249614A (ja) | プラズマエッチング方法及びその装置 | |
| JP2635195B2 (ja) | 静電チャックの帯電除去方法 | |
| JPH0241169Y2 (enrdf_load_html_response) | ||
| US4419380A (en) | Method for ion-aided coating on electrically insulating substrates | |
| JP2003137521A (ja) | 成膜方法 | |
| JPH06124673A (ja) | イオン注入装置におけるプラズマ発生方法 | |
| JPS63458A (ja) | 真空ア−ク蒸着装置 | |
| JPH08222553A (ja) | 処理装置及び処理方法 | |
| JPS60158629A (ja) | マイクロ波プラズマ処理装置 | |
| JP2001064775A (ja) | カーボンナノチューブ薄膜形成装置及び形成方法 | |
| JPS63238266A (ja) | スパツタリング装置 | |
| JPS629324Y2 (enrdf_load_html_response) | ||
| JPS6167765A (ja) | イオンプレ−テイング装置 | |
| JPH0676749A (ja) | イオン源 | |
| JPH04315797A (ja) | プラズマ処理装置およびそのプラズマ源のクリーニング方法 | |
| JPS6323826B2 (enrdf_load_html_response) | ||
| JPH06101458B2 (ja) | プラズマ気相成長装置 | |
| JPS58171568A (ja) | スパツタリング装置 | |
| JP2003302499A (ja) | 電子線照射処理装置 |