JPS6135270B2 - - Google Patents
Info
- Publication number
- JPS6135270B2 JPS6135270B2 JP54073723A JP7372379A JPS6135270B2 JP S6135270 B2 JPS6135270 B2 JP S6135270B2 JP 54073723 A JP54073723 A JP 54073723A JP 7372379 A JP7372379 A JP 7372379A JP S6135270 B2 JPS6135270 B2 JP S6135270B2
- Authority
- JP
- Japan
- Prior art keywords
- silicon
- transition metal
- sputtering
- substrate
- metal silicide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
- C23C14/0057—Reactive sputtering using reactive gases other than O2, H2O, N2, NH3 or CH4
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7372379A JPS56275A (en) | 1979-06-12 | 1979-06-12 | Metal film formation |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7372379A JPS56275A (en) | 1979-06-12 | 1979-06-12 | Metal film formation |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS56275A JPS56275A (en) | 1981-01-06 |
JPS6135270B2 true JPS6135270B2 (enrdf_load_stackoverflow) | 1986-08-12 |
Family
ID=13526424
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7372379A Granted JPS56275A (en) | 1979-06-12 | 1979-06-12 | Metal film formation |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56275A (enrdf_load_stackoverflow) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60188693U (ja) * | 1984-05-25 | 1985-12-13 | 有限会社 船舶ジエツト推進研究所 | 船舶 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5333053B2 (enrdf_load_stackoverflow) * | 1973-08-15 | 1978-09-12 | ||
JPS5165038A (ja) * | 1974-12-04 | 1976-06-05 | Suwa Seikosha Kk | Tokeiyogaisobuhin |
JPS5915982B2 (ja) * | 1977-08-24 | 1984-04-12 | 日電アネルバ株式会社 | 放電化学反応装置 |
-
1979
- 1979-06-12 JP JP7372379A patent/JPS56275A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS56275A (en) | 1981-01-06 |
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