JPS6133247B2 - - Google Patents

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Publication number
JPS6133247B2
JPS6133247B2 JP555977A JP555977A JPS6133247B2 JP S6133247 B2 JPS6133247 B2 JP S6133247B2 JP 555977 A JP555977 A JP 555977A JP 555977 A JP555977 A JP 555977A JP S6133247 B2 JPS6133247 B2 JP S6133247B2
Authority
JP
Japan
Prior art keywords
weight
silver
electrode
binder
paste
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP555977A
Other languages
Japanese (ja)
Other versions
JPS5389960A (en
Inventor
Harufumi Bandai
Kunitaro Nishimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Murata Manufacturing Co Ltd
Original Assignee
Murata Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Murata Manufacturing Co Ltd filed Critical Murata Manufacturing Co Ltd
Priority to JP555977A priority Critical patent/JPS5389960A/en
Publication of JPS5389960A publication Critical patent/JPS5389960A/en
Publication of JPS6133247B2 publication Critical patent/JPS6133247B2/ja
Granted legal-status Critical Current

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  • Ceramic Capacitors (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

この発明はチタン酸ストロンチウムを主体とす
る半導体磁器コンデンサ、特に誘電率を大きくし
た粒界絶縁型半導体磁器コンデンサに関するもの
である。 従来、チタン酸バリウム系、チタン酸ストロン
チウム系などからなる半導体磁器の粒界に絶縁層
を形成させることにより、いままでの磁器コンデ
ンサにくらべ見掛誘電率を大きくした、コンデン
サが得られることは知られている。 この中でチタン酸ストロンチウムを主体とする
ものはチタン酸バリウムを主体とするものと比較
して静電容量の温度変化率が小さく、誘電体損失
も小さいという特徴を持つている。 しかし、このチタン酸ストロンチウム系のもの
はチタン酸バリウム系のものと比較して誘電率が
小さく、これまでの見掛誘電率は20000〜35000の
範囲であつた。このような欠点を改善させるため
に、結晶粒界を絶縁体化させる酸化物の種類を変
えることによつて誘電率を大きくする手段が採ら
れている。 このような粒界絶縁型半導体磁器コンデンサに
は一般に銀電極が用いられているが、この銀電極
を形成するには銀、ガラスフリツト、ワニスを混
練したペースト状のものを磁器表面に塗布、焼付
けしている。銀ペーストの成分をさらに詳しく説
明すると、銀90〜96重量%、ホウケイ酸鉛、ホウ
ケイ酸ビスマスなどのガラスフリツトからなるバ
インダ10〜4重量%、さらにこれにワニスなどの
溶剤を加えたものである。この電極ペーストを刷
毛塗り、浸漬法、吹き付け塗装、スクリーン印刷
法、転写法などにより塗布し、これを400〜800℃
で焼付けしているが、このペースト中の溶剤は焼
付けの段階で飛散し、ガラス成分からなるバイン
ダが半導体磁器との接着強度を高めていることは
知られている。 ところが電極成分中のバインダ成分を少なくし
た銀ペーストを半導体磁器の表面に塗布し、これ
を焼付けて電極を形成した場合、従来公知のバイ
ンダ(4〜10重量%)を含む銀ペーストを塗布、
焼付けした半導体磁器コンデンサにくらべてさら
に大きな見掛誘電率が得られることを見い出した
のである。 この発明はこのような知見にもとづいてなされ
たもので、その要旨とするところは、チタン酸ス
トロンチウムを主体とする半導体磁器の結晶粒界
に絶縁層を形成した粒界絶縁型半導体磁器の表面
に銀99重量%以上、ガラス成分からなるバインダ
1重量%以下からなる電極を形成したことを特徴
とするものである。 ここでチタン酸ストロンチウムを主体とする半
導体磁器とは、SrTiO3のみだけでなく、SrTiO3
のSrの一部をCa、Ba、Pbで置換したもの、Tiの
一部をZr、Snで置換したもの、あるいはSr、Ti
についてこれらの一部置換を同時に行つたものを
主体とし、これにY、Nb、Dy、Ta、Wなどの原
子価制御元素を1種以上添加したものを意味す
る。またZn、B、Ge、Cuなどをさらに添加して
もよい。 粒界に絶縁層を形成する金属酸化物にはBi、
Pb、Cu、Bなどがある。 さらに、このチタン酸ストロンチウム系半導体
磁器に添加物として5モル%までTiO2を過剰に
加えると低温で焼結でき、粒成長が促進され、ま
た見掛誘電率の温度特性が改善されるなど好まし
い結果を示す。 電極の成分比を銀99重量%以上、ガラス成分か
らなるバインダ1重量%以下にしたのは、この範
囲外になると見掛誘電率が従来とほとんど変わり
なくなるからである。 以下この発明を実施例に従つて詳述する。 実施例 第1表に示すような組成比率の磁器組成物が得
られるように、SrTiO3、CaTiO3、PbSnO3
BaZrO3などの主体原料、Y2O3、Nd2O3
Ce2O3、Er2O3、La2O3などの原子価制御元素お
よびTiO2の各原料を適宜配合し、湿式ポツトミ
ルで粉砕混合したのち脱水、乾燥した。次にバイ
ンダとして酢酸ビニル樹脂を約10重量%添加し
て、約50メツシユに造粒、整粒し、油圧プレスを
用いて直径12mm、肉厚0.6mmの円板に成型した。 成型円板を大気中1150℃で2時間仮焼成してバ
インダを飛ばし、次いで水素1容量%、窒素99容
量%からなる還元性雰囲気中において、1450℃で
2時間一次焼成を行い、直径10mm、肉厚0.5mmの
チタン酸ストロンチウム系半導体磁器試料を得
た。 得られた試料に第1表に示す金属酸化物の各ペ
ーストを塗布した。この金属酸化物ペーストは酸
化ビスマス、酸化銅、酸化鉛の各金属酸化物を適
宜選択し、ワニスと混練したものである。このペ
ーストを試料の全面に一様な厚さに塗布し、乾燥
させたのち、大気中1150℃で約1時間焼付けを行
つた。この処理により結晶粒界に金属酸化物が拡
散し、結晶粒界に絶縁層が形成されることにな
る。 さらに、試料に第1表に示す電極ペーストを直
径8mmのパターンでスクリーン印刷し、800℃で
2時間焼付けしてコンデンサを作成した。電極ペ
ーストは銀粉、(B2O3:13重量%、SiO2:12重量
%、Pb3O4:75重量%)ワニスをそれぞれ適宜選
択して混練したものである。 このようにして得られた半導体磁器コンデンサ
の静電容量、見掛誘電率(ε)、誘電体損失(tan
δ)、絶縁抵抗(IR)、破壊電圧(BDV)、静電容
量の温度特性(TC)、半田付け性およびリード線
接着強度を測定し、その結果を第2表に示した。 静電容量、見掛誘電率および誘導体損失は+25
℃、1KHz−0.3Vの条件で測定し、絶縁抵抗は+
25℃でmm当たり50Vの印加電圧が測定した。静電
容量の温度特性は+25℃を基準にして−35℃〜+
85℃の温度範囲で測定した。半田付け性は各コン
デンサを半田槽に浸漬し、半田の付着状態を目視
により判断したもので、半田が電極面に100%付
着したものを〇、80%以上付着したものを△、そ
れ以下のものを×で示した。リード線接着強度は
電極面上に直径6mmの大きさで円状に半田を付着
し、この中央にリード線を電極面に対し垂直に半
田付けしてリード線を引つ張り、その強度を測定
したものである。 第1表、第2表中※印はこの発明範囲外のもの
であり、それ以外はすべてこの発明範囲内のもの
である。
The present invention relates to a semiconductor ceramic capacitor mainly composed of strontium titanate, and particularly to a grain boundary insulated semiconductor ceramic capacitor with a high dielectric constant. It has been known that by forming an insulating layer at the grain boundaries of semiconductor ceramics made of barium titanate, strontium titanate, etc., it is possible to obtain capacitors with a higher apparent dielectric constant than conventional ceramic capacitors. It is being Among these, those mainly composed of strontium titanate have the characteristics of a smaller rate of change in capacitance with temperature and lower dielectric loss than those mainly composed of barium titanate. However, this strontium titanate-based material has a lower dielectric constant than that of the barium titanate-based material, and the apparent dielectric constant has so far been in the range of 20,000 to 35,000. In order to improve these drawbacks, measures have been taken to increase the dielectric constant by changing the type of oxide that turns the grain boundaries into an insulator. Silver electrodes are generally used in such grain-boundary insulated semiconductor porcelain capacitors, but to form these silver electrodes, a paste made by kneading silver, glass frit, and varnish is applied and baked onto the porcelain surface. ing. The ingredients of the silver paste are explained in more detail: 90 to 96% by weight of silver, 10 to 4% by weight of a binder made of glass frit such as lead borosilicate or bismuth borosilicate, and a solvent such as varnish. This electrode paste is applied by brushing, dipping, spraying, screen printing, transfer, etc., and then heated to 400 to 800℃.
It is known that the solvent in this paste scatters during the baking stage, and that the binder made of glass components increases the adhesive strength with semiconductor porcelain. However, when a silver paste with a reduced binder component in the electrode component is applied to the surface of semiconductor porcelain and baked to form an electrode, a silver paste containing a conventionally known binder (4 to 10% by weight) is applied,
They discovered that an even larger apparent dielectric constant can be obtained compared to baked semiconductor ceramic capacitors. This invention was made based on this knowledge, and its gist is that an insulating layer is formed on the surface of grain boundary-insulated semiconductor porcelain, in which an insulating layer is formed at the grain boundaries of semiconductor porcelain mainly composed of strontium titanate. The present invention is characterized in that an electrode is formed containing 99% by weight or more of silver and 1% by weight or less of a binder made of a glass component. Here, semiconductor porcelain mainly composed of strontium titanate refers to not only SrTiO 3 but also SrTiO 3
, with some of the Sr replaced with Ca, Ba, or Pb, or with some of the Ti replaced with Zr or Sn, or with Sr, Ti
The term refers to those in which these partial substitutions are made at the same time, and to which one or more valence control elements such as Y, Nb, Dy, Ta, and W are added. Furthermore, Zn, B, Ge, Cu, etc. may be further added. Metal oxides that form insulating layers at grain boundaries include Bi,
There are Pb, Cu, B, etc. Furthermore, if TiO 2 is added in excess of up to 5 mol% as an additive to this strontium titanate semiconductor ceramic, it can be sintered at a low temperature, grain growth is promoted, and the temperature characteristics of the apparent dielectric constant are improved. Show the results. The reason why the component ratio of the electrode was set to 99% by weight or more of silver and 1% by weight or less of the binder consisting of glass component is that outside this range, the apparent dielectric constant is almost unchanged from that of the conventional electrode. This invention will be described in detail below with reference to Examples. Example SrTiO 3 , CaTiO 3 , PbSnO 3 ,
Main raw materials such as BaZrO 3 , Y 2 O 3 , Nd 2 O 3 ,
Valence control elements such as Ce 2 O 3 , Er 2 O 3 , La 2 O 3 and TiO 2 raw materials were appropriately blended, pulverized and mixed in a wet pot mill, dehydrated and dried. Next, about 10% by weight of vinyl acetate resin was added as a binder, and the particles were granulated and sized into about 50 meshes, which were then molded into a disk with a diameter of 12 mm and a wall thickness of 0.6 mm using a hydraulic press. The formed disk was pre-fired in the air at 1150°C for 2 hours to remove the binder, and then primary fired at 1450°C for 2 hours in a reducing atmosphere consisting of 1% hydrogen by volume and 99% nitrogen to form a disc with a diameter of 10mm. A strontium titanate semiconductor ceramic sample with a wall thickness of 0.5 mm was obtained. Each paste of the metal oxide shown in Table 1 was applied to the obtained sample. This metal oxide paste is made by appropriately selecting metal oxides such as bismuth oxide, copper oxide, and lead oxide and kneading them with varnish. This paste was applied to the entire surface of the sample to a uniform thickness, dried, and then baked at 1150° C. for about 1 hour in the air. This treatment causes the metal oxide to diffuse into the grain boundaries, forming an insulating layer at the grain boundaries. Further, the electrode paste shown in Table 1 was screen printed on the sample in a pattern with a diameter of 8 mm and baked at 800° C. for 2 hours to produce a capacitor. The electrode paste was prepared by appropriately selecting and kneading silver powder and varnish (B 2 O 3 : 13% by weight, SiO 2 : 12% by weight, Pb 3 O 4 : 75% by weight). The capacitance, apparent dielectric constant (ε), and dielectric loss (tan) of the semiconductor ceramic capacitor obtained in this way
δ), insulation resistance (IR), breakdown voltage (BDV), temperature characteristic of capacitance (TC), solderability, and lead wire adhesive strength were measured, and the results are shown in Table 2. Capacitance, apparent permittivity and dielectric loss are +25
Measured under the conditions of ℃, 1KHz-0.3V, insulation resistance is +
An applied voltage of 50 V per mm was measured at 25 °C. Temperature characteristics of capacitance are -35℃ to +25℃
Measurements were made in a temperature range of 85°C. Solderability was determined by immersing each capacitor in a solder bath and visually judging the state of solder adhesion. 100% solder adhering to the electrode surface is ○, 80% or more adhesion is △, and less is 0. Items are marked with an x. To measure lead wire adhesion strength, attach solder in a circle with a diameter of 6 mm on the electrode surface, solder the lead wire in the center perpendicular to the electrode surface, pull the lead wire, and measure the strength. This is what I did. Items marked with * in Tables 1 and 2 are outside the scope of this invention, and all others are within the scope of this invention.

【表】【table】

【表】 第1表、第2表から明らかなように、従来公知
の電極を形成したものは見掛誘電率が35000〜
40000と小さいが、この発明のように銀99重量%
以上、バインダ1重量%以下からなる電極を形成
することにより見掛誘電率が70000〜80000と約2
倍の増大が見られる。またガラスフリツトなどの
バインダを少なくすることによつてリード線の接
着強度が弱くなると考えられたが、これに反して
10Kg以上の接着強度が得られており、磁器との接
着性が良好な電極が形成されていると云える。ま
た半田付け性も良好である。さらにtanδは少し
大きくなり、IR、BDVは少し小さくなつている
が、実用上何ら差し支えない値である。また、こ
の実施例のほかに結晶粒界に絶縁層を形成したチ
タン酸ストロンチウム系の粒界絶縁型半導体磁器
にも適用することができる。
[Table] As is clear from Tables 1 and 2, the apparent permittivity of conventionally known electrodes is 35,000~
Although it is small at 40,000, it is made of 99% silver by weight like this invention.
As mentioned above, by forming an electrode consisting of 1% by weight or less of binder, the apparent dielectric constant is 70,000 to 80,000, which is approximately 2.
A two-fold increase is seen. It was also thought that reducing the amount of binder such as glass frit would weaken the adhesive strength of the lead wires, but contrary to this,
An adhesive strength of 10 kg or more was obtained, and it can be said that an electrode with good adhesion to porcelain was formed. It also has good solderability. Furthermore, tan δ has become a little larger, and IR and BDV have become a little smaller, but these are values that pose no problem for practical use. In addition to this embodiment, the present invention can also be applied to strontium titanate-based grain boundary insulated semiconductor ceramics in which an insulating layer is formed at grain boundaries.

Claims (1)

【特許請求の範囲】[Claims] 1 チタン酸ストロンチウムを主体とする半導体
磁器の結晶粒界に絶縁層を形成した粒界絶縁型半
導体磁器の表面に、銀99重量%以上、ガラス成分
からなるバインダ1重量%以下からなる電極を形
成したことを特徴とする粒界絶縁型半導体磁器コ
ンデンサ。
1 Forming an electrode made of 99% by weight or more of silver and 1% by weight or less of a binder made of glass component on the surface of grain boundary insulated semiconductor porcelain in which an insulating layer is formed at the grain boundaries of semiconductor porcelain mainly composed of strontium titanate. A grain boundary insulated semiconductor ceramic capacitor characterized by:
JP555977A 1977-01-20 1977-01-20 Capacitor employing semiconductor ceramic with insulating grain boundary Granted JPS5389960A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP555977A JPS5389960A (en) 1977-01-20 1977-01-20 Capacitor employing semiconductor ceramic with insulating grain boundary

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP555977A JPS5389960A (en) 1977-01-20 1977-01-20 Capacitor employing semiconductor ceramic with insulating grain boundary

Publications (2)

Publication Number Publication Date
JPS5389960A JPS5389960A (en) 1978-08-08
JPS6133247B2 true JPS6133247B2 (en) 1986-08-01

Family

ID=11614546

Family Applications (1)

Application Number Title Priority Date Filing Date
JP555977A Granted JPS5389960A (en) 1977-01-20 1977-01-20 Capacitor employing semiconductor ceramic with insulating grain boundary

Country Status (1)

Country Link
JP (1) JPS5389960A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0419626Y2 (en) * 1987-03-31 1992-05-06

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0419626Y2 (en) * 1987-03-31 1992-05-06

Also Published As

Publication number Publication date
JPS5389960A (en) 1978-08-08

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