JPS6129822A - スパッタリングによるエレクトロクロミック薄膜の製造方法 - Google Patents

スパッタリングによるエレクトロクロミック薄膜の製造方法

Info

Publication number
JPS6129822A
JPS6129822A JP59152499A JP15249984A JPS6129822A JP S6129822 A JPS6129822 A JP S6129822A JP 59152499 A JP59152499 A JP 59152499A JP 15249984 A JP15249984 A JP 15249984A JP S6129822 A JPS6129822 A JP S6129822A
Authority
JP
Japan
Prior art keywords
transparent
thin film
sputtering
iridium
metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59152499A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0558171B2 (enrdf_load_stackoverflow
Inventor
Kiyoshi Uchikawa
清 内川
Tatsuo Niwa
達雄 丹羽
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kogaku KK filed Critical Nippon Kogaku KK
Priority to JP59152499A priority Critical patent/JPS6129822A/ja
Publication of JPS6129822A publication Critical patent/JPS6129822A/ja
Publication of JPH0558171B2 publication Critical patent/JPH0558171B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Physical Vapour Deposition (AREA)
JP59152499A 1984-07-23 1984-07-23 スパッタリングによるエレクトロクロミック薄膜の製造方法 Granted JPS6129822A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59152499A JPS6129822A (ja) 1984-07-23 1984-07-23 スパッタリングによるエレクトロクロミック薄膜の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59152499A JPS6129822A (ja) 1984-07-23 1984-07-23 スパッタリングによるエレクトロクロミック薄膜の製造方法

Publications (2)

Publication Number Publication Date
JPS6129822A true JPS6129822A (ja) 1986-02-10
JPH0558171B2 JPH0558171B2 (enrdf_load_stackoverflow) 1993-08-25

Family

ID=15541796

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59152499A Granted JPS6129822A (ja) 1984-07-23 1984-07-23 スパッタリングによるエレクトロクロミック薄膜の製造方法

Country Status (1)

Country Link
JP (1) JPS6129822A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0697119A4 (en) * 1993-11-12 1996-06-19 Ppg Industries Inc IRIDIUM OXIDE FILM FOR ELECTROCHROME DEVICE
EP1986043A2 (en) 2001-09-26 2008-10-29 Chromogenics Sweden AB Electrochromic film and device comprising the same

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59180526A (ja) * 1983-03-30 1984-10-13 Fujitsu Ltd エレクトロクロミツク表示素子

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59180526A (ja) * 1983-03-30 1984-10-13 Fujitsu Ltd エレクトロクロミツク表示素子

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0697119A4 (en) * 1993-11-12 1996-06-19 Ppg Industries Inc IRIDIUM OXIDE FILM FOR ELECTROCHROME DEVICE
EP1986043A2 (en) 2001-09-26 2008-10-29 Chromogenics Sweden AB Electrochromic film and device comprising the same

Also Published As

Publication number Publication date
JPH0558171B2 (enrdf_load_stackoverflow) 1993-08-25

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