JPS61291630A - 真空処理方法および装置 - Google Patents
真空処理方法および装置Info
- Publication number
- JPS61291630A JPS61291630A JP13152885A JP13152885A JPS61291630A JP S61291630 A JPS61291630 A JP S61291630A JP 13152885 A JP13152885 A JP 13152885A JP 13152885 A JP13152885 A JP 13152885A JP S61291630 A JPS61291630 A JP S61291630A
- Authority
- JP
- Japan
- Prior art keywords
- vacuum
- chamber
- vacuum processing
- chambers
- preliminary
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
- H01J37/185—Means for transferring objects between different enclosures of different pressure or atmosphere
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13152885A JPS61291630A (ja) | 1985-06-17 | 1985-06-17 | 真空処理方法および装置 |
| GB8614578A GB2178227B (en) | 1985-06-17 | 1986-06-16 | Vacuum treating method and apparatus |
| US06/874,934 US4733746A (en) | 1985-06-17 | 1986-06-16 | Vacuum treating method and apparatus |
| CA000511762A CA1283369C (en) | 1985-06-17 | 1986-06-17 | Vacuum treating method and apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13152885A JPS61291630A (ja) | 1985-06-17 | 1985-06-17 | 真空処理方法および装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61291630A true JPS61291630A (ja) | 1986-12-22 |
| JPH0250134B2 JPH0250134B2 (OSRAM) | 1990-11-01 |
Family
ID=15060174
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13152885A Granted JPS61291630A (ja) | 1985-06-17 | 1985-06-17 | 真空処理方法および装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61291630A (OSRAM) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6469205A (en) * | 1987-09-08 | 1989-03-15 | Sumitomo Electric Industries | Levitation type transfer device |
| CN113443617A (zh) * | 2021-08-19 | 2021-09-28 | 陕西六元碳晶股份有限公司 | 一种连续式碳纳米管的纯化装置及工艺 |
-
1985
- 1985-06-17 JP JP13152885A patent/JPS61291630A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6469205A (en) * | 1987-09-08 | 1989-03-15 | Sumitomo Electric Industries | Levitation type transfer device |
| CN113443617A (zh) * | 2021-08-19 | 2021-09-28 | 陕西六元碳晶股份有限公司 | 一种连续式碳纳米管的纯化装置及工艺 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0250134B2 (OSRAM) | 1990-11-01 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP4386832B2 (ja) | Cvdコーティング用の回転装置 | |
| JPH10130825A (ja) | 薄膜を被着させるための真空処理装置 | |
| JPS61291630A (ja) | 真空処理方法および装置 | |
| JPS62535A (ja) | 連続式プラズマ処理装置 | |
| US20040089227A1 (en) | Dual chamber vacuum processing system | |
| JP2010089014A (ja) | プラズマ洗浄装置 | |
| US4733746A (en) | Vacuum treating method and apparatus | |
| JPS61291631A (ja) | 真空処理方法および装置 | |
| JPH07325279A (ja) | 減圧処理装置及び方法 | |
| JP4798288B2 (ja) | 蒸着装置 | |
| US6123494A (en) | Process for the loading and unloading of an evacuatable treatment chamber and handling device for carrying out the process | |
| US8109209B2 (en) | Method and apparatus for reducing the number of microbes during tandem operation | |
| JPH0325276A (ja) | 連続真空乾燥装置 | |
| JPS60115227A (ja) | プラズマ等の処理方法とその装置 | |
| JP3388654B2 (ja) | 真空処理方法と装置 | |
| JPS60102744A (ja) | 真空処理装置 | |
| JPS63307273A (ja) | 基板に薄層をスパツタする装置 | |
| JPS60250038A (ja) | 合成樹脂製品の塗装前処理方法および装置 | |
| JP2002194552A (ja) | プラズマ処理装置及びプラズマ処理方法 | |
| JPH05237362A (ja) | 処理装置 | |
| JP4392073B2 (ja) | 成膜装置 | |
| JPS61227184A (ja) | プラズマエツチング装置 | |
| JP5598407B2 (ja) | 成膜処理装置および成膜方法 | |
| JPH01308436A (ja) | プラズマ処理装置 | |
| JPH0650661A (ja) | 真空乾燥装置 |