JPS61290605A - 低抵抗透明導電膜の製造方法 - Google Patents
低抵抗透明導電膜の製造方法Info
- Publication number
- JPS61290605A JPS61290605A JP13168285A JP13168285A JPS61290605A JP S61290605 A JPS61290605 A JP S61290605A JP 13168285 A JP13168285 A JP 13168285A JP 13168285 A JP13168285 A JP 13168285A JP S61290605 A JPS61290605 A JP S61290605A
- Authority
- JP
- Japan
- Prior art keywords
- conductive film
- film
- low resistance
- transparent conductive
- sputtering
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004544 sputter deposition Methods 0.000 claims description 17
- 239000000758 substrate Substances 0.000 claims description 14
- 238000000034 method Methods 0.000 claims description 13
- 238000000992 sputter etching Methods 0.000 claims description 13
- 238000000137 annealing Methods 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 239000002994 raw material Substances 0.000 claims description 3
- 239000010408 film Substances 0.000 description 44
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- 229910052786 argon Inorganic materials 0.000 description 4
- 238000002834 transmittance Methods 0.000 description 4
- 238000012360 testing method Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- 238000007738 vacuum evaporation Methods 0.000 description 2
- 241001156002 Anthonomus pomorum Species 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229940110676 inzo Drugs 0.000 description 1
- 210000003141 lower extremity Anatomy 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Landscapes
- Non-Insulated Conductors (AREA)
- Manufacturing Of Electric Cables (AREA)
- Liquid Crystal (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13168285A JPS61290605A (ja) | 1985-06-19 | 1985-06-19 | 低抵抗透明導電膜の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13168285A JPS61290605A (ja) | 1985-06-19 | 1985-06-19 | 低抵抗透明導電膜の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61290605A true JPS61290605A (ja) | 1986-12-20 |
| JPH0473244B2 JPH0473244B2 (https=) | 1992-11-20 |
Family
ID=15063755
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13168285A Granted JPS61290605A (ja) | 1985-06-19 | 1985-06-19 | 低抵抗透明導電膜の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61290605A (https=) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63243261A (ja) * | 1987-03-31 | 1988-10-11 | Nok Corp | 低抵抗透明導電膜の製造方法 |
| WO2016152808A1 (ja) * | 2015-03-24 | 2016-09-29 | 株式会社カネカ | 透明電極付き基板および透明電極付き基板の製造方法 |
-
1985
- 1985-06-19 JP JP13168285A patent/JPS61290605A/ja active Granted
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63243261A (ja) * | 1987-03-31 | 1988-10-11 | Nok Corp | 低抵抗透明導電膜の製造方法 |
| WO2016152808A1 (ja) * | 2015-03-24 | 2016-09-29 | 株式会社カネカ | 透明電極付き基板および透明電極付き基板の製造方法 |
| CN107109639A (zh) * | 2015-03-24 | 2017-08-29 | 株式会社钟化 | 带透明电极的基板及带透明电极的基板的制造方法 |
| US10173393B2 (en) | 2015-03-24 | 2019-01-08 | Kaneka Corporation | Transparent electrode-equipped substrate and method for producing transparent electrode-equipped substrate |
| CN107109639B (zh) * | 2015-03-24 | 2019-09-10 | 株式会社钟化 | 带透明电极的基板及带透明电极的基板的制造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0473244B2 (https=) | 1992-11-20 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN101622721B (zh) | 太阳能电池用透明电极及其制造方法 | |
| CN104937676B (zh) | 透明导电性薄膜及其制造方法 | |
| US20120028129A1 (en) | Method for manufacturing solid electrolyte battery and solid electrolyte battery | |
| JPS62122011A (ja) | 透明導電膜の製造方法 | |
| JP2000238178A (ja) | 透明導電積層体 | |
| CN104919542A (zh) | 透明导电薄膜及其制造方法 | |
| CN106571173B (zh) | 耐高温复合透明导电膜、制备方法和应用 | |
| CN101985740A (zh) | 一种铝掺氧化锌透明导电薄膜的退火方法 | |
| JP5580972B2 (ja) | スパッタリング複合ターゲット | |
| CN109811308A (zh) | 一种ito导电膜制作工艺 | |
| CN102826763A (zh) | 一种生产tco镀膜玻璃的方法 | |
| CN114959397B (zh) | 合金靶材及其制备方法、应用、阵列基板 | |
| CN108588661B (zh) | 一种采用低价钒种子层优化氧化钒薄膜性能的方法 | |
| CN103924191A (zh) | 在基片上镀制ito薄膜的方法 | |
| JPS61290605A (ja) | 低抵抗透明導電膜の製造方法 | |
| Niu et al. | Spreadability of Ag layer on oxides and high performance of AZO/Ag/AZO sandwiched transparent conductive film | |
| Hao et al. | Magnetron sputtering electrode on the BaTiO3-based PTCR ceramics and the effect of heat treatment on their properties | |
| CN118764990A (zh) | Ag基透明复合电极及其制备方法、高热稳定性的Ag基透明薄膜加热器 | |
| CN103177800B (zh) | 一种高透过率透明导电薄膜及其制备方法 | |
| CN105734512A (zh) | 一种ZnO/Mo/ZnO透明导电薄膜的制备方法 | |
| JPS61290607A (ja) | 透明導電膜の製造方法 | |
| CN116903359B (zh) | 一种用于铜电镀工艺的透明导电靶材及薄膜线路的制备方法 | |
| CN218647648U (zh) | 一种双面ito铜导电膜 | |
| CN106367720A (zh) | 一种锡酸镉（cto）薄膜退火方法 | |
| JPH0723532B2 (ja) | 透明導電膜の形成方法 |