JPS61283488A - Joining method for al and al alloy - Google Patents

Joining method for al and al alloy

Info

Publication number
JPS61283488A
JPS61283488A JP12247685A JP12247685A JPS61283488A JP S61283488 A JPS61283488 A JP S61283488A JP 12247685 A JP12247685 A JP 12247685A JP 12247685 A JP12247685 A JP 12247685A JP S61283488 A JPS61283488 A JP S61283488A
Authority
JP
Japan
Prior art keywords
joining
alloy
bonding
joint
filler metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12247685A
Other languages
Japanese (ja)
Inventor
Mitsuo Kato
光雄 加藤
Takao Funamoto
舟本 孝雄
Ryoichi Kajiwara
良一 梶原
Hiroshi Wachi
和知 弘
Kyo Matsuzaka
松坂 矯
Kazuya Takahashi
和弥 高橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP12247685A priority Critical patent/JPS61283488A/en
Publication of JPS61283488A publication Critical patent/JPS61283488A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K35/00Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
    • B23K35/22Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
    • B23K35/24Selection of soldering or welding materials proper
    • B23K35/28Selection of soldering or welding materials proper with the principal constituent melting at less than 950 degrees C
    • B23K35/286Al as the principal constituent

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Laminated Bodies (AREA)
  • ing And Chemical Polishing (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To improve the quality and strength of a joint part by removing oxide films from joint surfaces and subjecting the joint surfaces to low-temp. joining with a brazing filler metal consisting of an Al-Mg-Cu alloy which contains specific wt% each of Mg and Cu and is amorphous. CONSTITUTION:The joint surfaces of Al and Al alloys are subjected to a dry etching treatment to remove the oxide films and stains of the joint surfaces. The amorphous alloy film of the brazing filler metal consisting of the Al-Mg-Cu alloy or Al-Mg-Cu-Si-Zn alloy is disposed by a sputter vapor deposition method on the cleaned joint surfaces. The brazing filler metal which contains 25-25% Mg, 3-15 Cu and the balance Al or further contains 3-5% Si and 0.5-1.0% Zn is used. The joint surfaces are subjected to the low-temp. joining at 480-520 deg.C in a vacuum or inert gaseous atmosphere. The generation of defects is thereby prevented and the quality and strength of the joint part are improved.

Description

【発明の詳細な説明】 〔発明の背景〕 Al及びAl合金は、表面に酸化皮膜(A/、gos)
を形成しているため接合が困難である。このためAl表
面の酸化皮膜(Al鵞Os)を除去するためだ化学処理
や機械的研磨などの手法を用いているが、空気中に放置
するとすぐに酸化皮膜(kLxos)が形成されるため
あまり効果がない。特公昭57−184574 では、
脱酸剤や界面活性剤を用いたりして改善を計っている。
[Detailed Description of the Invention] [Background of the Invention] Al and Al alloys have an oxide film (A/, gos) on the surface.
This makes joining difficult. For this reason, methods such as chemical treatment and mechanical polishing are used to remove the oxide film (AlOs) on the Al surface. has no effect. Tokuko Sho 57-184574,
Efforts are being made to improve this by using deoxidizers and surfactants.

またろう接法では、フラックスを用いて接合を行ってい
る。
Furthermore, in the brazing method, bonding is performed using flux.

真空中又は不活性ガス雰囲気中でのAl及びAl合金の
接合は、フラックスが用いられないために酸化皮膜(k
Lxos1を除去できないので接合がむずかしい。この
九めAl及びAl合金の接合用ろう材としてAl−8i
 −Mg系合金が用いられている。また特公昭58−2
3197のようにAl−8i−Qa系合金や特公昭5g
−10980のようにAL−8i −Mg−I n系合
金をろう材として用いている。しかし上記したろう材を
用いたAl及びAl合金の接合では、接合温度が600
C前後と高温であるため複雑で精密な部品の場合変形を
生じやすく使用範囲が制限される。またAl合金の接合
においては、接合温度が高温であるため母材が溶融する
ので使用できないなど問題が多い。
Bonding of Al and Al alloys in vacuum or in an inert gas atmosphere is difficult to bond with an oxide film (k) because flux is not used.
Bonding is difficult because Lxos1 cannot be removed. Al-8i is used as a brazing filler metal for joining these nine aluminum and aluminum alloys.
-Mg-based alloy is used. Also, special public service 58-2
Al-8i-Qa alloys such as 3197 and special public Sho 5g
-10980, an AL-8i-Mg-I n-based alloy is used as a brazing material. However, when joining Al and Al alloy using the above-mentioned brazing filler metal, the joining temperature is 600°C.
Since the temperature is around C, complex and precise parts are likely to be deformed, which limits the range of use. Furthermore, there are many problems in joining Al alloys, such as the fact that the joining temperature is high enough to melt the base material, making it unusable.

〔発明の目的] 本発明の目的は、酸化度[(Al*Ch)を除去し、真
空中又は不活性ガス雰囲気中での低温接合を可能にし、
かつまた接合欠陥を防止し、高品質、高強度の接合部が
得られるAl及びAl合金の接合用及びCu及びCu合
金とAl及びAl合金の異種接合用ろう材及びその接合
法を提供することにある。
[Object of the invention] The object of the present invention is to remove the oxidation degree [(Al*Ch) and enable low-temperature bonding in vacuum or in an inert gas atmosphere,
Furthermore, to provide a brazing material for joining Al and Al alloys and for joining different types of Cu and Cu alloys to Al and Al alloys, and a joining method thereof, which prevents joining defects and provides a high-quality, high-strength joint. It is in.

〔発明の概要〕[Summary of the invention]

本発明は、あらかじめAlの接合面をドライエツチング
処理によって酸化皮膜(AL鵞Os)を除去した後、ス
パッタ蒸着によって接合面KAl−25〜354Mg−
3〜15%Cu非晶質合金膜を設けた後、接合面同士を
対面させ、真空中又は不活性ガス雰囲気中で接合温度4
80〜520Cで接合を行う接合方法である。
In the present invention, after removing the oxide film (ALOs) from the Al bonding surface by dry etching, the bonding surface KAl-25~354Mg-
After providing the 3-15% Cu amorphous alloy film, the bonding surfaces were made to face each other and the bonding temperature was 4 in a vacuum or an inert gas atmosphere.
This is a joining method in which joining is performed at 80 to 520C.

本発明の接合方法によれば.Al及びAl合金の接合面
にドライエツチング処理(Arイオンビームエツチング
など1を行うことによって酸化度K(Al*Os)や付
着物を除去し、清浄面が形成できる。このためAl及び
A/、合金の接合面が活性化されるので従来困難でめつ
之真空中又は不活性ガス雰囲気中での接合を可能だする
ことができる。
According to the joining method of the present invention. By performing dry etching treatment (such as Ar ion beam etching) on the bonding surface of Al and Al alloy, the degree of oxidation K (Al*Os) and deposits can be removed and a clean surface can be formed. Since the bonding surfaces of the alloy are activated, it is possible to perform bonding in a vacuum or in an inert gas atmosphere, which was previously difficult.

これらのことから従来の化学処理や機械的研磨などの接
合前処理が不用となる。またフラックスを用いないで接
合ができる。
For these reasons, conventional pre-bonding treatments such as chemical treatment and mechanical polishing are no longer necessary. Also, bonding can be performed without using flux.

次にAl及びAl合金の接合面を清浄化した後、スパッ
タ蒸着によってAl−Mg−Cu合金膜を形成すること
は.Al及びAl合金の低温接合が可能になり、高品質
、高強度の接合部が得られ、省エネルギー及び作業性の
向上だつながり、なおかつ変形をきらう精密部品の接合
に適している。
Next, after cleaning the joint surfaces of Al and Al alloy, an Al-Mg-Cu alloy film is formed by sputter deposition. It enables low-temperature joining of Al and Al alloys, yields high-quality and high-strength joints, saves energy and improves workability, and is suitable for joining precision parts that do not want to be deformed.

本発明のAl接合用ろう材は、25〜35%Mg。The brazing filler metal for Al bonding of the present invention contains 25 to 35% Mg.

3〜151Cuを含有するAl−Mg−Cu合金又は2
5〜351Mg、3〜15%Cu、3〜548 i、0
.5〜1.0%Znを含有するAl−Mg−Cu−8i
 −7,n合金である真空中又は不活性ガス雰囲気中で
の低温接合ろう材である。
Al-Mg-Cu alloy containing 3-151Cu or 2
5-351 Mg, 3-15% Cu, 3-548 i, 0
.. Al-Mg-Cu-8i containing 5-1.0% Zn
-7,n alloy, which is a low-temperature bonding brazing material in vacuum or in an inert gas atmosphere.

本発明の接合用ろう材は非晶質合金であり、その溶融温
度は450℃〜480Cである。非晶質合金とする利点
は、このため、低温での接合が可能となり真空中でのM
gの蒸発が抑制される。成分が均質だ分散していること
からろう材の溶融を均一にし、さらに母材とろう材の反
応を強力圧しぬれ性を向上させる。ろう材の溶融温度領
域が450t:’〜480Cであることから、接合温度
は480℃〜520Cとすることができ.Al及びAl
合金の低温接合ができる。またろう材の溶融温度領域が
450℃〜480Cであることから、Al−Cu共晶温
度(約548C)以下で接合が可能なため共晶反応を抑
制することができる。このため本発明ろう材を用いるこ
とによりCu及びCu合金とAl及びAl合金の異種接
合ができる。
The brazing filler metal for joining of the present invention is an amorphous alloy, and its melting temperature is 450°C to 480°C. The advantage of using an amorphous alloy is that it can be joined at low temperatures and M
Evaporation of g is suppressed. Because the components are homogeneously dispersed, the melting of the brazing filler metal is uniform, and the reaction between the base metal and the brazing filler metal is strongly compressed, improving wettability. Since the melting temperature range of the brazing filler metal is 450t:' to 480C, the joining temperature can be set to 480C to 520C. Al and Al
Alloys can be joined at low temperatures. Furthermore, since the melting temperature range of the brazing material is 450° C. to 480° C., bonding can be performed below the Al-Cu eutectic temperature (approximately 548° C.), thereby suppressing eutectic reactions. Therefore, by using the brazing material of the present invention, dissimilar joining of Cu and Cu alloys and Al and Al alloys can be performed.

次に接合用ろう材の各成分の機能について述べる。Next, we will discuss the functions of each component of the joining brazing filler metal.

Mgは接合用ろう材の溶融温度を低下させ、人L * 
Os を還元しろう材と母材のぬれ性を向上させる。し
かし25俤未満の場合では、溶融温度の低下させる効果
が認められず、35俤以上になると化合物が生成しやす
くなるとともに接合時に炉内を汚染してしまうおそれが
ある。
Mg lowers the melting temperature of the brazing filler metal for joining, and
Reduces Os and improves the wettability of the brazing filler metal and base metal. However, if it is less than 25 degrees, no effect of lowering the melting temperature is observed, and if it is more than 35 degrees, compounds are likely to be generated and there is a risk of contaminating the inside of the furnace during bonding.

Cuは接合用ろう材の溶融温度を低下させ、ろう材の非
晶質化に効果がある。またろう材の流動性を高め、ぬれ
性を改善させる。31未満ではその効果が認められず、
とくにろう材の非晶質化がそこなわれる。15俤より多
くなると金属間化合物が生成しやすく、接合部が劣化す
る。
Cu lowers the melting temperature of the joining brazing material and is effective in making the brazing material amorphous. It also increases the fluidity of the brazing filler metal and improves its wettability. If it is less than 31, the effect is not recognized,
In particular, the amorphization of the brazing filler metal is damaged. If the amount exceeds 15, intermetallic compounds are likely to be formed and the joint will deteriorate.

Siは接合用ろう材の溶融温度を低下させ、ろう材の流
動性を高めるために3〜51添加した。
3-51 Si was added in order to lower the melting temperature of the joining brazing material and increase the fluidity of the brazing material.

7、nは防食効果を向上させるために0.5〜1.01
添加した。
7. n is 0.5 to 1.01 to improve anticorrosion effect
Added.

本発明の接合方法によって製作されたkt製部品は、ボ
イド及び接合不良などの欠陥の発生もなく、母材と同等
の接合強度が得られる。また接合時に圧力を加えてもk
t製部品は変形することなく製作される。
The KT parts manufactured by the joining method of the present invention do not have defects such as voids and poor joining, and can have a joining strength equivalent to that of the base material. Also, even if pressure is applied during joining,
T-made parts are manufactured without deformation.

〔発明の実施例〕[Embodiments of the invention]

以下本発明の実施例について説明する。 Examples of the present invention will be described below.

実施例1 供試材としてAl100材及びA3052材を使用した
。アセトン中で超音波洗浄を約5分間行った後、供試材
の接合面にドライエツチング処理(Arイオンビーム処
理)を施こした。表1はArイオンビーム処理条件を示
す。表1に示すような処理条件によってAl合金の接合
面を約200人削って酸化皮膜(Al*Ox)及び付着
物を除去した。
Example 1 Al100 material and A3052 material were used as test materials. After performing ultrasonic cleaning in acetone for about 5 minutes, dry etching treatment (Ar ion beam treatment) was performed on the joint surfaces of the test materials. Table 1 shows Ar ion beam processing conditions. The bonding surface of the Al alloy was shaved by about 200 people under the treatment conditions shown in Table 1 to remove the oxide film (Al*Ox) and deposits.

次にスパッタ蒸着法によって清浄面にされたht金合金
接合面に本発明のAl接合用ろう材としてのAL−Mg
−Cu系合金膜を形成した。表2はスパッタ蒸着条件を
示す。スパッタ出力は約700Wであり、合金膜形成速
度は約0.22μm/―である。表3は本発明のろう材
組成及び性質を示す。比較の合金膜として用Aた&1の
Al−35%Mg共晶合金膜(膜厚11μm)は結晶質
であり、その溶融温度は約450Cである。一方、本発
明のろう材として屋2〜A5の合金膜は、表31C示す
ように全て非晶質膜であり、その溶融温度は約455℃
〜470Cである。本発明の非晶質合金膜は、溶融温度
に達すると急激かつ全体均一に溶融し、母材との反応も
良好でぬれ性も向上する。これに対しAIの結晶質合金
膜は、徐々にかつ部分的に溶融する念め合金中のMgが
蒸発し、接合性に問題がある。
Next, the AL-Mg as a brazing material for Al bonding of the present invention was applied to the bonding surface of the ht gold alloy, which had been made clean by sputter vapor deposition.
-A Cu-based alloy film was formed. Table 2 shows sputter deposition conditions. The sputtering power was about 700 W, and the alloy film formation rate was about 0.22 μm/−. Table 3 shows the composition and properties of the brazing filler metal of the present invention. As a comparative alloy film, the Al-35% Mg eutectic alloy film (thickness: 11 μm) of A&1 is crystalline and its melting temperature is about 450C. On the other hand, as shown in Table 31C, the alloy films of A2 to A5 as brazing materials of the present invention are all amorphous films, and their melting temperature is about 455°C.
~470C. When the amorphous alloy film of the present invention reaches the melting temperature, it melts rapidly and uniformly throughout, and reacts well with the base material, improving wettability. On the other hand, in the case of an AI crystalline alloy film, the Mg in the alloy that melts gradually and partially evaporates, resulting in a problem in bondability.

Al合金の接合面にスパッタリングによって本発明のろ
う材の合金膜を形成し接合を行った。表4は接合条件を
示す。入を合金(AIloo。
An alloy film of the brazing material of the present invention was formed on the bonding surface of the Al alloy by sputtering, and bonding was performed. Table 4 shows the bonding conditions. AIloo.

A3052 )の接合は、接合温度500 C,接合時
間1h、加圧力0.2 K41 f /ms+” 、真
空[lX1O−sTOrrで行った。        
             )表5はAl100接合部
の接合強度を、表6はA3052接合部の接合強度を示
す。比較材として用いたAl−35優Mg合金膜(A1
)によるAl合金(AIloo及びA3052 )の接
合部の接合率が低Aのは、ボイド及び未接合などの接合
不良欠陥が発生しているためでこれは接合時に合金膜中
に含まれるMgが合金膜のゆっくりを溶融の間に蒸発す
ることに起因する。これに対し本発明のA2〜颯5の合
金膜によるA/、合金の接合部には、ボイド及び未接合
などの接合不良欠陥の発生もなく、良好な接合部が得ら
れているがこれは合金膜が非晶質であり急激かつ均一に
溶融するためである。
A3052) was bonded at a bonding temperature of 500 C, a bonding time of 1 h, a pressing force of 0.2 K41 f/ms+'', and a vacuum [lX1O-sTOrr.
) Table 5 shows the joint strength of the Al100 joint, and Table 6 shows the joint strength of the A3052 joint. Al-35 superior Mg alloy film (A1
) The reason why the bonding rate of Al alloys (AIloo and A3052) is low is that poor bonding defects such as voids and non-bonding occur, and this is because Mg contained in the alloy film during bonding is This is due to the slow evaporation of the film during melting. On the other hand, in the A/ and alloy joints made of alloy films A2 to A5 of the present invention, good joints were obtained without occurrence of poor joint defects such as voids and non-joints. This is because the alloy film is amorphous and melts rapidly and uniformly.

表5に示すようにAl100母材の引張強さは約10、
2 Kff /W”である。比較材として用いたAl−
35優Mg合金膜(41)による接合部の接合率は70
優であり、その接合強度は約5.3Kif/■2であり
、素材の約52優で接合部破断である。これに対し本発
明の墓2〜&50合金膜によるA1100接合部の接合
強度は約7.6〜7.0Klf/wa2であり、素材強
度の約804であるが、全て母材破断である。表6に示
すようにA3052接合部の接合強度は、本発明の42
〜煮5の合金膜を用いることにより約16.5 Kg 
f 、/ fl”で素材強度の約85チで全て母材破断
である。これは接合用合金膜が非晶質であるため急激か
つ均一に溶融するため、接合不良欠陥のない均質な接合
部が得られたためである。以上のように本発明のろう材
及び接合法でAl合金の接合を行うことによって、高品
質、高強度の接合部を得ることができた。
As shown in Table 5, the tensile strength of the Al100 base material is approximately 10,
2 Kff /W”.Al-
The bonding rate of the bonded area using the 35% Mg alloy film (41) is 70
The bonding strength is approximately 5.3 Kif/■2, and the joint portion breaks at approximately 52 Kif of the material. On the other hand, the bonding strength of the A1100 joint using the Grave 2-&50 alloy film of the present invention is about 7.6-7.0 Klf/wa2, which is about 804 of the material strength, but all of them are base material fractures. As shown in Table 6, the joint strength of the A3052 joint is 42
~ Approximately 16.5 Kg by using the alloy film of boiling 5
f, / fl", the base material fractured at approximately 85 degrees of material strength. This is because the bonding alloy film is amorphous and melts rapidly and uniformly, resulting in a homogeneous joint with no bonding defects. As described above, by joining Al alloys using the brazing filler metal and joining method of the present invention, a high-quality, high-strength joint could be obtained.

実施例2 klとCuの異種材料の接合を行った。供試材はAl1
00材と無酸素鋼を用いた。供試材をアセトン中で超音
波洗浄を約5分間行った後、供試材の接合面にドライエ
ツチング処理(A rイオンビーム処理)を施こした。
Example 2 Different materials of kl and Cu were joined. The sample material is Al1
00 material and oxygen-free steel were used. After the sample material was ultrasonically cleaned in acetone for about 5 minutes, the joint surface of the sample material was subjected to dry etching treatment (Ar ion beam treatment).

表1に示すArイオンビーム処理条件によってAl10
0材の接合面を約20OA及び無酸素鋼の接合面を約4
5OAを削って酸化皮膜及び付着物を除去した。
Under the Ar ion beam processing conditions shown in Table 1, Al10
The joint surface of 0 material is approximately 20OA, and the joint surface of oxygen-free steel is approximately 4
5OA was scraped to remove the oxide film and deposits.

次にスパッタ蒸着法によって清浄面に形成され九Al1
00材及び無酸素銅の接合面に本発明の接合用ろう材と
してkl、−Mg−Cu系合金膜全形成した。スパッタ
蒸着は表2に示す条件で行った。
Next, 9Al1 is formed on the clean surface by sputter deposition method.
A kl, -Mg-Cu alloy film was entirely formed on the bonding surfaces of the 00 material and the oxygen-free copper as the brazing filler metal for bonding of the present invention. Sputter deposition was performed under the conditions shown in Table 2.

本発明の接合用ろう材として表3に示す扁2,3の接合
用合金膜を使用した。
Bonding alloy films of flats 2 and 3 shown in Table 3 were used as the bonding brazing filler metal of the present invention.

Al100材と無酸素鋼の異種材料の接合は、第4表に
示す条件で行った。表7は接合部の接合強度を示す。A
l100材と無酸素鋼の異種材料接合部は、ボイド及び
未接合などの欠陥の発生もなく、また接合部には金属間
化合物の生成もなく、均質で高品質の接合部が得られた
。その接合強度は約7、0〜7.2 K4f / sw
 ”であり、伸び約60係、絞り約60壬でAl側母材
破断である。以上のように本発明のろう材及び接合法に
よってAlとCuの異種材料の接合が可能となり、高品
質、高強度の接合部を得ることができた。
The joining of dissimilar materials, Al100 material and oxygen-free steel, was performed under the conditions shown in Table 4. Table 7 shows the joint strength of the joints. A
In the dissimilar material joint between the l100 material and the oxygen-free steel, there were no defects such as voids or non-joints, and no intermetallic compounds were formed in the joint, resulting in a homogeneous and high-quality joint. Its joint strength is about 7.0~7.2 K4f/sw
”, and the Al side base material breaks at an elongation of about 60 and a reduction of about 60. As described above, the brazing filler metal and joining method of the present invention make it possible to join dissimilar materials of Al and Cu, resulting in high quality, A high-strength joint could be obtained.

〔発明の効果〕〔Effect of the invention〕

本発明のろう材及び接合法によれば、真空中又は不活性
ガス雰囲気中での低温接合ができ、ボイド及び接合不良
などの欠陥の発生がなく高品質。
According to the brazing material and bonding method of the present invention, low-temperature bonding can be performed in vacuum or in an inert gas atmosphere, and high quality is achieved without defects such as voids and poor bonding.

高強度の接合部が得られ、複雑かつ精密なAl製部品及
びkl/Cu複合部品の製造が可能である。
High-strength joints can be obtained, and complex and precise Al parts and kl/Cu composite parts can be manufactured.

本発明の接合用ろう材を用いると、Arイオンビーム処
理を施こさなくとも接合が可能で、高強度の接合部が得
られる。
By using the brazing filler metal for joining of the present invention, joining is possible without performing Ar ion beam treatment, and a high-strength joint can be obtained.

kt及びAl合金を心材として、その表面に本発明の接
合用ろう材を形成することによって低温プレージングシ
ートを製造できる。
A low-temperature plating sheet can be manufactured by using KT and Al alloy as a core material and forming the joining brazing material of the present invention on the surface thereof.

第1表 第   2   表 第3表 第4表Table 1 Table 2 Table 3 Table 4

Claims (4)

【特許請求の範囲】[Claims] 1.Al及びAl合金の接合法において、接合用ろう材
として25〜35%Mg、3〜15%Cu含み残部Al
からなるAl−Mg−Cu合金を用いることを特徴とす
るAl及びAl合金の接合法。
1. In the method of joining Al and Al alloys, the brazing filler metal contains 25 to 35% Mg, 3 to 15% Cu, and the balance is Al.
A method for joining Al and Al alloys, characterized by using an Al-Mg-Cu alloy consisting of:
2.特許請求の範囲第1項において、接合用ろう材とし
て25〜35%Mg、3〜15%Cu、3〜5%Si、
0.5〜1.0%Znを含み残部AlからなるAl−M
g−Cu−Si−Zn合金を用いることを特徴とするA
l及びAl合金の接合法。
2. In claim 1, the brazing material for joining is 25 to 35% Mg, 3 to 15% Cu, 3 to 5% Si,
Al-M containing 0.5-1.0% Zn and the balance Al
A characterized by using g-Cu-Si-Zn alloy
A method for joining L and Al alloys.
3.特許請求の範囲第1項,第2項において、前記のろ
う材が非晶質合金であることを特徴とするAl及びAl
合金の接合法。
3. Claims 1 and 2, wherein the brazing filler metal is an amorphous alloy;
Alloy joining method.
4.特許請求の範囲第1項,第2項において、あらかじ
めAl及びAl合金の接合面をドライエツチング処理に
より酸化皮膜(Al_2O_3)及び汚れを除去した後
スパツタによつて接合面に非晶質合金膜を設けた後、接
合面同士を対面させ、真空又は不活性ガス雰囲気中で接
合温度480℃〜520℃で接合することを特徴とする
Al及びAl合金の接合法。
4. In claims 1 and 2, after removing the oxide film (Al_2O_3) and dirt from the joint surfaces of Al and Al alloy by dry etching, an amorphous alloy film is formed on the joint surfaces by sputtering. A method for joining Al and Al alloys, which is characterized in that after they are provided, the joining surfaces are faced to each other and joined at a joining temperature of 480° C. to 520° C. in a vacuum or an inert gas atmosphere.
JP12247685A 1985-06-07 1985-06-07 Joining method for al and al alloy Pending JPS61283488A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12247685A JPS61283488A (en) 1985-06-07 1985-06-07 Joining method for al and al alloy

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12247685A JPS61283488A (en) 1985-06-07 1985-06-07 Joining method for al and al alloy

Publications (1)

Publication Number Publication Date
JPS61283488A true JPS61283488A (en) 1986-12-13

Family

ID=14836787

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12247685A Pending JPS61283488A (en) 1985-06-07 1985-06-07 Joining method for al and al alloy

Country Status (1)

Country Link
JP (1) JPS61283488A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1992022398A1 (en) * 1991-06-10 1992-12-23 Allied-Signal Inc. Rapidly solidified aluminum-magnesium base brazing alloys
JP2010186639A (en) * 2009-02-12 2010-08-26 Chin-Chi Yang Fuse unit and high-density conductive alloy wire used for the same
CN104191102A (en) * 2014-08-15 2014-12-10 郑州机械研究所 Low-brittleness medium-temperature aluminum alloy brazing material and preparation process thereof

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1992022398A1 (en) * 1991-06-10 1992-12-23 Allied-Signal Inc. Rapidly solidified aluminum-magnesium base brazing alloys
US5332455A (en) * 1991-06-10 1994-07-26 Alliedsignal Inc. Rapidly solidified aluminum-magnesium base brazing alloys
JP2010186639A (en) * 2009-02-12 2010-08-26 Chin-Chi Yang Fuse unit and high-density conductive alloy wire used for the same
CN104191102A (en) * 2014-08-15 2014-12-10 郑州机械研究所 Low-brittleness medium-temperature aluminum alloy brazing material and preparation process thereof

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