JPS61281100A - シリコン単結晶の製造方法 - Google Patents
シリコン単結晶の製造方法Info
- Publication number
- JPS61281100A JPS61281100A JP12172785A JP12172785A JPS61281100A JP S61281100 A JPS61281100 A JP S61281100A JP 12172785 A JP12172785 A JP 12172785A JP 12172785 A JP12172785 A JP 12172785A JP S61281100 A JPS61281100 A JP S61281100A
- Authority
- JP
- Japan
- Prior art keywords
- crucible
- silicon
- single crystal
- raw material
- cylinder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 47
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 47
- 239000010703 silicon Substances 0.000 title claims abstract description 47
- 239000013078 crystal Substances 0.000 title claims abstract description 32
- 238000004519 manufacturing process Methods 0.000 title claims description 11
- 239000002994 raw material Substances 0.000 claims abstract description 31
- 238000010438 heat treatment Methods 0.000 claims description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 abstract description 18
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract description 11
- 229910052799 carbon Inorganic materials 0.000 abstract description 8
- 230000001012 protector Effects 0.000 abstract description 5
- 239000010453 quartz Substances 0.000 abstract description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 4
- 229910002804 graphite Inorganic materials 0.000 abstract description 3
- 239000010439 graphite Substances 0.000 abstract description 3
- 230000000694 effects Effects 0.000 abstract description 2
- 239000012535 impurity Substances 0.000 abstract description 2
- 239000011261 inert gas Substances 0.000 abstract description 2
- 230000008018 melting Effects 0.000 abstract 1
- 238000002844 melting Methods 0.000 abstract 1
- 229920005591 polysilicon Polymers 0.000 description 17
- 238000000034 method Methods 0.000 description 13
- 238000007796 conventional method Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12172785A JPS61281100A (ja) | 1985-06-05 | 1985-06-05 | シリコン単結晶の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12172785A JPS61281100A (ja) | 1985-06-05 | 1985-06-05 | シリコン単結晶の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61281100A true JPS61281100A (ja) | 1986-12-11 |
JPH0566351B2 JPH0566351B2 (enrdf_load_stackoverflow) | 1993-09-21 |
Family
ID=14818382
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12172785A Granted JPS61281100A (ja) | 1985-06-05 | 1985-06-05 | シリコン単結晶の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61281100A (enrdf_load_stackoverflow) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5069741A (en) * | 1987-03-20 | 1991-12-03 | Mitsubishi Kinzoku Kabushiki Kaisha | Method of manufacturing quartz double crucible assembly |
KR101209118B1 (ko) | 2010-04-20 | 2012-12-06 | 주식회사 윈젠 | 폴리실리콘 제조용 전극, 폴리실리콘 제조용 전극의 용접 장치 및 그 용접 방법 |
JP2019199374A (ja) * | 2018-05-16 | 2019-11-21 | 住友金属鉱山株式会社 | 粉末状原料の充填方法 |
-
1985
- 1985-06-05 JP JP12172785A patent/JPS61281100A/ja active Granted
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5069741A (en) * | 1987-03-20 | 1991-12-03 | Mitsubishi Kinzoku Kabushiki Kaisha | Method of manufacturing quartz double crucible assembly |
KR101209118B1 (ko) | 2010-04-20 | 2012-12-06 | 주식회사 윈젠 | 폴리실리콘 제조용 전극, 폴리실리콘 제조용 전극의 용접 장치 및 그 용접 방법 |
JP2019199374A (ja) * | 2018-05-16 | 2019-11-21 | 住友金属鉱山株式会社 | 粉末状原料の充填方法 |
Also Published As
Publication number | Publication date |
---|---|
JPH0566351B2 (enrdf_load_stackoverflow) | 1993-09-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN110983429A (zh) | 单晶炉及单晶硅制备方法 | |
JP2002517366A (ja) | 結晶成長装置用電気抵抗ヒータ | |
JPH02133389A (ja) | シリコン単結晶の製造装置 | |
US4936949A (en) | Czochraski process for growing crystals using double wall crucible | |
JP5163386B2 (ja) | シリコン融液形成装置 | |
JPH11255588A (ja) | 単結晶原料供給装置及び単結晶原料供給方法 | |
JPS6153187A (ja) | 単結晶成長装置 | |
JP3907727B2 (ja) | 単結晶引き上げ装置 | |
JP6853445B2 (ja) | ヒータ断熱構造体および単結晶製造装置 | |
JPS61281100A (ja) | シリコン単結晶の製造方法 | |
CN116516466A (zh) | 一种制造磷掺杂单晶硅棒的籽晶、装置及方法 | |
CN211036174U (zh) | 一种晶体生长装置 | |
JP3642174B2 (ja) | シリコン単結晶の引上げ装置及びその引上げ方法 | |
JPH10287488A (ja) | 単結晶引き上げ方法 | |
JP2927065B2 (ja) | 化合物半導体単結晶成長方法および装置 | |
JPS61261288A (ja) | シリコン単結晶引上装置 | |
JP2990661B2 (ja) | 単結晶成長方法 | |
JPH026382A (ja) | 単結晶引上げ装置 | |
JPH03265593A (ja) | 結晶成長装置 | |
JP2600944B2 (ja) | 結晶成長方法 | |
JPH03193694A (ja) | 結晶成長装置 | |
JPH0259494A (ja) | シリコン単結晶の製造方法及び装置 | |
JPS5950627B2 (ja) | 単結晶シリコン引上装置 | |
JPH09208360A (ja) | 単結晶の成長方法 | |
JPH03215384A (ja) | 結晶成長装置 |