JPS61272961A - 半導体装置のトリミング方法 - Google Patents

半導体装置のトリミング方法

Info

Publication number
JPS61272961A
JPS61272961A JP60114874A JP11487485A JPS61272961A JP S61272961 A JPS61272961 A JP S61272961A JP 60114874 A JP60114874 A JP 60114874A JP 11487485 A JP11487485 A JP 11487485A JP S61272961 A JPS61272961 A JP S61272961A
Authority
JP
Japan
Prior art keywords
trimming
semiconductor device
temperature
chip
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60114874A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0315344B2 (enExample
Inventor
Minoru Odajima
稔 小田嶋
Michiaki Yamagata
通昭 山県
Yukikiyo Ando
進清 安藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Yokogawa Electric Corp
Original Assignee
Yokogawa Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Yokogawa Electric Corp filed Critical Yokogawa Electric Corp
Priority to JP60114874A priority Critical patent/JPS61272961A/ja
Publication of JPS61272961A publication Critical patent/JPS61272961A/ja
Publication of JPH0315344B2 publication Critical patent/JPH0315344B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/80—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple passive components, e.g. resistors, capacitors or inductors
    • H10D86/85—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple passive components, e.g. resistors, capacitors or inductors characterised by only passive components

Landscapes

  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Semiconductor Integrated Circuits (AREA)
JP60114874A 1985-05-28 1985-05-28 半導体装置のトリミング方法 Granted JPS61272961A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60114874A JPS61272961A (ja) 1985-05-28 1985-05-28 半導体装置のトリミング方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60114874A JPS61272961A (ja) 1985-05-28 1985-05-28 半導体装置のトリミング方法

Publications (2)

Publication Number Publication Date
JPS61272961A true JPS61272961A (ja) 1986-12-03
JPH0315344B2 JPH0315344B2 (enExample) 1991-02-28

Family

ID=14648843

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60114874A Granted JPS61272961A (ja) 1985-05-28 1985-05-28 半導体装置のトリミング方法

Country Status (1)

Country Link
JP (1) JPS61272961A (enExample)

Also Published As

Publication number Publication date
JPH0315344B2 (enExample) 1991-02-28

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