JPS61271049A - Film forming device - Google Patents

Film forming device

Info

Publication number
JPS61271049A
JPS61271049A JP60112065A JP11206585A JPS61271049A JP S61271049 A JPS61271049 A JP S61271049A JP 60112065 A JP60112065 A JP 60112065A JP 11206585 A JP11206585 A JP 11206585A JP S61271049 A JPS61271049 A JP S61271049A
Authority
JP
Japan
Prior art keywords
film
substrate
liq
tank
tanks
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP60112065A
Other languages
Japanese (ja)
Inventor
Toshihiko Miyazaki
俊彦 宮崎
Kunihiro Sakai
酒井 邦裕
Yoshinori Tomita
佳紀 富田
Hiroyuki Sugata
裕之 菅田
Hiroshi Matsuda
宏 松田
Yukio Nishimura
征生 西村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP60112065A priority Critical patent/JPS61271049A/en
Publication of JPS61271049A publication Critical patent/JPS61271049A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To carry out easily necessary chemical and physical reactions by providing a treating vessel adjacent to a liq. tank and alternately transferring a substrate supported by a holder between the liq. tank and the treating vessel with a substrate control part. CONSTITUTION:With respect to a film forming device in the fields of semiconductor techniques, optical techniques, etc., rectangular liq. tanks 1a and 1b are provided in parallel and barriers 4a and 4b for controlling the pressure of a monomolecular film and film pressure sensors 10a and 10b are respectively furnished on developed water surfaces 3a and 3b. Besides, a towery substrate control part 12 is vertically provided on intermediate stands of the two liq. tanks 1a and 1b and substrates 7a-7d are supported on the leading end part of an armlike substrate holder 8 which is almost horizontally extended from the top end. The control part 12 is rotated and moved up and down, the holder 8 is successively arranged, the substrates 7a-7d are lowered into the liq. tanks 1a and 1b and treating vessels 11a and 11b and a film is formed.

Description

【発明の詳細な説明】 [産業上の利用分野] 木発門は、例えば半導体技術分野並びに光学技術分野等
において、デバイスの主要な構成要素となる有機薄膜の
成膜装置に関し、特に、分子層が秩序正しく並んだ単分
子膜又はその累積膜の基板への移し取り並びにそれに付
随する処理を効率的に行うことのできる成膜装置に関す
る。
[Detailed Description of the Invention] [Industrial Field of Application] Kiwamon relates to film forming equipment for organic thin films, which are the main components of devices, for example in the semiconductor technology field and the optical technology field, and particularly in the field of molecular layer The present invention relates to a film forming apparatus that can efficiently transfer a monomolecular film or a cumulative film thereof arranged in an orderly manner to a substrate and perform the accompanying processing.

[従来の技術] 従来、半導体技術分野並びに光学技術分野における素材
利用は、もっばら比較的取扱いが容易な無機物を対象に
して進められて来た。
[Prior Art] Conventionally, the use of materials in the semiconductor technology field and the optical technology field has mainly focused on inorganic materials that are relatively easy to handle.

しかしながら、最近の有機化学分野の技術進歩は目覚ま
しく、無機物を凌ぐ新しい機能素材として、論理素L、
メモリー素子、光電変換素子等の集積回路デバイスや、
マイクロレンズ・アレイ、光導波路等の光学デバイスの
機能を荷う部分(主として薄膜部分)の一部又は全部を
従来の無機薄膜に代えて、有機薄膜で構成しようとする
提案がなされている。
However, recent technological progress in the field of organic chemistry has been remarkable, and the logical element L,
Integrated circuit devices such as memory elements and photoelectric conversion elements,
There have been proposals to construct part or all of the functional parts (mainly thin film parts) of optical devices such as microlens arrays and optical waveguides with organic thin films instead of conventional inorganic thin films.

このようなデバイスの主要な構成要素である有a薄膜は
単分子累積法を用いて作製される。申分ト累積法(別名
ラングミュア・プロジェット法、LB法)とは、親木基
・疎水基をもった分子の親水性、疎水性を利用して秩序
よく水の1に展開して単分子膜を形成した後、これを基
板表面に移しとる方法で、基板上に中分子膜あるいは単
分子を積層した単分子累積膜(これらをLB膜という〕
の形成が可能である。
The aliphatic thin film that is the main component of such devices is fabricated using a single molecule accumulation method. The perfect accumulation method (also known as the Langmuir-Prodgett method, LB method) is a single molecule that uses the hydrophilicity and hydrophobicity of molecules with parent wood groups and hydrophobic groups to expand into water in an orderly manner. After forming a film, it is transferred to the substrate surface to create a monomolecular cumulative film in which middle molecular films or single molecules are laminated on the substrate (these are called LB films).
It is possible to form

従来この種の装置は、第2図に示すように浅くて広い角
型の液槽1の内側に枠2が水モに水面3を仕切るように
置かれている。枠2は二次元シリンダとして機能し、枠
2の内側には方形の浮子4が浮かべられ、浮子4の幅は
枠2の内寸より僅かに狭く造ってあり、二次元ピストン
として左右に滑らかに移動できるようになっている。浮
子4を左右に移動させるためにワイヤー5を介して浮子
4はモーターなどを利用した巻き取り装置6と結ばれて
いる。
Conventionally, in this type of device, as shown in FIG. 2, a frame 2 is placed inside a shallow and wide rectangular liquid tank 1 so as to partition a water surface 3 into a water tank. The frame 2 functions as a two-dimensional cylinder, and a rectangular float 4 is floated inside the frame 2, and the width of the float 4 is made slightly narrower than the inner dimension of the frame 2, so that it can move smoothly from side to side as a two-dimensional piston. It is possible to move. In order to move the float 4 from side to side, the float 4 is connected to a winding device 6 using a motor or the like via a wire 5.

中分子膜の形成の際には、膜の構成物質をベンゼン、ク
ロロホルム等の揮発性溶媒に溶かし、水面3 、JHに
滴下する。溶媒が揮発した後には、二次元系の挙動を示
す単分子膜が水面3上に残される。分子の面密度が低い
時は、二次元気体の気体膜と呼ばれる。浮子4を右方向
へ移動させることで単分子が展開する水面3の広がりを
縮めて面密度を増加させて行くと、分子間の相互作用が
強まり、二次元液体の液体膜を経て、二次元固体膜へと
変化する。この固体膜になると分子の配列配向はきれい
にそろい、半導体等を構成する材料に要求される高度の
秩序性及び均一な超薄膜性を持つにいたる。
When forming a medium molecular film, the constituent materials of the film are dissolved in a volatile solvent such as benzene or chloroform, and the solution is dropped onto the water surface 3, JH. After the solvent evaporates, a monomolecular film exhibiting the behavior of a two-dimensional system is left on the water surface 3. When the areal density of molecules is low, it is called a gas film of secondary gas. By moving the float 4 to the right, the expanse of the water surface 3 on which single molecules expand is reduced and the surface density is increased. As a result, interactions between molecules become stronger, and two-dimensional liquids pass through a liquid film of two-dimensional liquid. Transforms into a solid film. When this solid film is formed, the molecules are arranged and oriented in a neat manner, resulting in a high degree of order and uniform ultra-thin film properties required for materials constituting semiconductors and the like.

申分を膜を水面3Fから基板7表面トに移し取る方法と
して、水面3Lの中分子膜に累積操作に好適な一定の表
面圧を保持しながら、基板ホルダー8に取付けた基板7
を垂直方向9に上下することにより単分子膜を移しとる
眞直浸漬法がある。この方法では、第3図(a)のよう
に浸漬時だけ単分子膜10が付着するX型、第3図(b
)のように浸漬時にも引きLげ時にも単分子膜10が付
着するY型、第3図(C)のように引きEげ時のみ単分
子膜10が付着するX型の3種類がある。なお、第2図
の分子にて、11は親水性部分、12は疎水性部分であ
る。
As a method of transferring the film from the water surface 3F to the surface of the substrate 7, the substrate 7 is attached to the substrate holder 8 while maintaining a constant surface pressure suitable for cumulative operation on the middle molecular film of the water surface 3L.
There is a direct dipping method in which a monomolecular film is transferred by moving the monolayer up and down in the vertical direction 9. In this method, as shown in FIG. 3(a), the monomolecular film 10 is attached only during immersion, and
There are three types: Y type, in which the monomolecular film 10 adheres both during immersion and during pulling, as shown in ), and X type, in which the monomolecular film 10 adheres only during pulling, as shown in Figure 3 (C). . In the molecule shown in FIG. 2, 11 is a hydrophilic portion and 12 is a hydrophobic portion.

この他に、図示していない別な方法としては、基板の中
分子膜付着面を水面に対してほぼ平行にして、その基板
を上下動させることにより単分子膜を移しとる水平付着
法がある。
In addition to this, another method not shown is a horizontal adhesion method in which the monomolecular film is transferred by moving the substrate up and down with the medium molecular film adhesion surface of the substrate approximately parallel to the water surface. .

[発明が解決しようとする問題点] 上記の如き従来の装置では、基板の板面上に単分子膜又
はその累積膜を付着させる手段のみで、これに付随する
単分子膜又はその累積膜の乾燥や重合処理等は、全く別
個の装置で行われている。
[Problems to be Solved by the Invention] In the conventional apparatus as described above, only the means for depositing the monomolecular film or the cumulative film thereof on the plate surface of the substrate is used, and the attached monomolecular film or the cumulative film thereof is not deposited. Drying, polymerization, etc. are performed in completely separate equipment.

従って、これらの処理を行うためにはいちいち基板を持
ち運んだリセットし直さなければならず、作業効率が悪
い問題がある。
Therefore, in order to perform these processes, it is necessary to carry and reset the board each time, which poses a problem of poor work efficiency.

[問題点を解決するためのL段] 上記問題点を解決するために講じられた手段を、本発明
の一実施例に対応する第1図で説明すると、液槽1a、
lbに隣接して処理槽11a。
[L Stage for Solving the Problems] Measures taken to solve the above problems will be explained with reference to FIG. 1, which corresponds to an embodiment of the present invention.
A processing tank 11a is adjacent to lb.

11bが設けられており、基板ホルダー8に保持された
基板7a〜7dを液槽1a  、lbと処理槽11a 
 、 llb間で相互移送する基板コントロール部12
を有する成膜装置とすることである。
11b is provided, and the substrates 7a to 7d held on the substrate holder 8 are transferred to the liquid tank 1a, lb and the processing tank 11a.
, a substrate control unit 12 for mutually transferring between
The purpose of the present invention is to provide a film forming apparatus having the following features.

本発明において処理槽11a 、 llbとは、例えば
基板7a〜7dに移し取られた単分子膜又はその累積膜
の乾燥、重合等を行うものをいう、また、液槽1a、l
bと処理槽11a 、 llbは、各々単数としてもよ
い。また、複数の液槽1a、lbを設ける場合、成膜分
子群を展開させる水面が複数に区分されていれば液槽1
a、lb自体を別個にする必要はない。
In the present invention, the processing tanks 11a and 11b refer to, for example, those for drying and polymerizing the monomolecular film or the accumulated film thereof transferred to the substrates 7a to 7d.
b and the processing tanks 11a and llb may each be singular. In addition, when providing a plurality of liquid tanks 1a and lb, if the water surface on which the film-forming molecule group is developed is divided into multiple parts, the liquid tank 1
There is no need to separate a and lb themselves.

「作 用」 基板コントロール部12によって、基板7a〜7dは液
槽La、lbから処理槽11a 、 llb ヘ、また
処理槽11a  、 llbから液槽1a、lbへと移
送される。従って、いちいち基板7a〜7dを持ち運ん
だリセットし直すことなく、単分子膜又はその累積膜の
基板78〜7dへの移し取りとそれに付随する処理を行
うことができるものである。
"Function" The substrate control unit 12 transfers the substrates 7a to 7d from the liquid tanks La and lb to the processing tanks 11a and llb, and from the processing tanks 11a and llb to the liquid tanks 1a and lb. Therefore, the monomolecular film or its cumulative film can be transferred to the substrates 78 to 7d and the associated processing can be performed without having to carry and reset the substrates 7a to 7d one by one.

[実施例] 以ド、本発明を、実施例を示す図面を参照して詳細に説
明する。
[Examples] Hereinafter, the present invention will be described in detail with reference to drawings showing examples.

第1図は、本発明に係る成膜装置の一例を示す斜視図で
ある。第1図において、成膜装置は2つの長方形の液槽
1aおよび1bt−平行に並設し、その展開水面3aお
よび3b上にそれぞれ単分子膜の膜圧制御用のバリア4
aおよび4bと、膜圧センサ10aおよび10bが配設
されている。バリア4aおよび4bは液槽1a、lbの
長手方向へ摺動可能に配設されていて、前記水面3aに
第1の単分子構成物質A、水面3bに第2の単分子構成
物質Bを滴下したのち、それぞれの膜圧センサ10aお
よび10bで表面圧力をモニタしながら、バリア4aお
よび4bを摺動させて所望の表面圧力に設定するもので
ある。2つの液槽1aおよび1bの中間台上には、塔状
の基板コントロール部12がケ設されていて、その頂端
からほぼ水平に四方へ伸ばされた4本のアーム状の基板
ホルダー8の先端部に、成膜を行われる基板7a、7b
FIG. 1 is a perspective view showing an example of a film forming apparatus according to the present invention. In FIG. 1, the film forming apparatus has two rectangular liquid tanks 1a and 1bt which are arranged parallel to each other, and barriers 4 for controlling the film pressure of the monomolecular film are placed on the developed water surfaces 3a and 3b, respectively.
a and 4b, and membrane pressure sensors 10a and 10b are provided. The barriers 4a and 4b are arranged so as to be slidable in the longitudinal direction of the liquid tanks 1a and lb, and the first monomolecular constituent substance A is dropped onto the water surface 3a, and the second monomolecular constituent substance B is dropped onto the water surface 3b. Thereafter, while monitoring the surface pressure with the membrane pressure sensors 10a and 10b, the barriers 4a and 4b are slid to set the desired surface pressure. A tower-shaped substrate control section 12 is installed on the intermediate stand between the two liquid tanks 1a and 1b, and the tips of four arm-shaped substrate holders 8 extend almost horizontally in all directions from the top end of the tower-shaped substrate control section 12. Substrates 7a and 7b on which film formation is performed are shown in FIG.
.

7c、7dを保持している。また、同じ中間台に、基板
コントロール部12を中心とする対称位置で、前記基板
ホルダー8の腕長に対応する距離に、壷状の処理槽11
aおよびllbが設けられて・いる。前記基板コントロ
ール部12は回転および上下動が可能で、80度ずつ回
転することにより4本の基板ホルダー8の先端部を2つ
の液槽1a、lbと2つの処理槽11a 、 llbの
上方へ順次配置することができ、上下動によって各基板
7a、7b。
Holds 7c and 7d. Further, on the same intermediate stand, a pot-shaped processing tank 11 is placed at a distance corresponding to the arm length of the substrate holder 8 at a symmetrical position centering on the substrate control unit 12.
a and llb are provided. The substrate control unit 12 can be rotated and moved up and down, and by rotating 80 degrees at a time, the tips of the four substrate holders 8 are sequentially moved above the two liquid tanks 1a, lb and the two processing tanks 11a, llb. Each substrate 7a, 7b can be placed by vertical movement.

7c、7dをそれらの槽内へ降下させることができる。7c, 7d can be lowered into their tanks.

基板7aが第1の液槽1aに降下させられたとすると、
その対称位置に保持された基板7cが第2の液槽1bに
降下させられることになり、それぞれ中分子膜Aもしく
はBが移しとられ、これを繰り返せば累積膜となる。所
望の累積層を移しとったのち、基板コントロール部12
を反時計方向へ90度回転して、降下させると、基板7
aは第1の処理槽11aへ、基板7cは第2の処理槽1
1bへ降下する。同時に、基板7bおよび7dは液槽l
a、lbに降下する。
Assuming that the substrate 7a is lowered into the first liquid tank 1a,
The substrate 7c held at the symmetrical position is lowered into the second liquid tank 1b, and the middle molecular film A or B is transferred, respectively, and if this is repeated, a cumulative film is formed. After transferring the desired cumulative layer, the substrate control section 12
When rotated 90 degrees counterclockwise and lowered, the board 7
a to the first processing tank 11a, and the substrate 7c to the second processing tank 1.
Descend to 1b. At the same time, substrates 7b and 7d are placed in liquid tank l.
a, descend to lb.

例えば、単分子構成物質Aとして、 CIIH23CミC−C*C−(CH2)8−COOH
なる式に示したジアセチレン誘導体化合物をクロロホル
ムに3 X 1O−3saR/Rの濃度に溶かした後、
pH6,2テ、塩化カドミウム濃度I X 10−3m
oi’/j)の水面3a上に展開させ、溶媒のクロロホ
ルムを蒸発除去後2表面圧力を20dyne/cmまで
高める。表面圧力を一定に保ちながら、表面が充分に清
浄かつ親木性となっている基板7aを、水面を横切る方
向に上下動速度1.0cm/winで静かにL下動させ
、ジアセチレン単分子膜を基板7a上に複数層移しとれ
ば、ジアセチレン単分子累積膜を形成できる。
For example, as a monomolecular constituent substance A, CIIH23CmiC-C*C-(CH2)8-COOH
After dissolving the diacetylene derivative compound shown in the formula in chloroform to a concentration of 3 X 1O-3saR/R,
pH 6.2, cadmium chloride concentration I x 10-3m
oi'/j) on the water surface 3a, and after the solvent chloroform is removed by evaporation, the surface pressure is increased to 20 dyne/cm. While keeping the surface pressure constant, the substrate 7a, whose surface is sufficiently clean and wood-friendly, is gently moved downward by L at a vertical movement speed of 1.0 cm/win in the direction across the water surface, and diacetylene monomolecules are removed. By transferring a plurality of layers of the film onto the substrate 7a, a diacetylene monomolecular cumulative film can be formed.

この基板7aを前記のように90度移動させ、例えば2
54r+mの紫外線放射ランプを内蔵する光重合槽であ
る処理槽11aへ上下動させると、ジアセチレン累a膜
の光重合を行うことができる。このことはジアセチレン
膜が青色化するので確認できる。なお、紫外線はジアセ
チレン膜に均一かつ充分に照射する必要がある。
This substrate 7a is moved 90 degrees as described above, for example, by 2
When moved up and down to the treatment tank 11a, which is a photopolymerization tank containing a 54r+m ultraviolet radiation lamp, the diacetylene cumulative a film can be photopolymerized. This can be confirmed because the diacetylene film turns blue. Note that it is necessary to irradiate the diacetylene film uniformly and sufficiently with the ultraviolet rays.

このような装置によれば、膜を移しとることと光重合と
を、基板を移動させながら並行できるので、迅速かつ均
一な紫外線照射が可能となる。
According to such an apparatus, film transfer and photopolymerization can be performed in parallel while moving the substrate, so that rapid and uniform ultraviolet irradiation is possible.

処理槽の使用法としては、前記実施例では光重合によっ
て説明したが、処理槽にヒータ等を配設することによる
熱反応でもよい。また、ヒータを使用しての乾燥効果も
利用できる。さらに1反応槽を液槽にして単分子膜と化
学的な反応を行わせてもよい。
As for the method of using the treatment tank, although photopolymerization was explained in the above embodiment, a thermal reaction may also be used by providing a heater or the like in the treatment tank. Additionally, a drying effect using a heater can also be used. Furthermore, one reaction tank may be used as a liquid tank to perform a chemical reaction with the monomolecular film.

7jS3図は1本発明を実施した成膜装置の別な一例を
示す剥視図である。第3図において、成膜装置は、円形
槽を備え、その円形槽が放射状の枠2によって複数の扇
形槽に仕切られている。その扇形槽は、中分子層を展開
する液槽1a 、 lb 。
FIG. 7jS3 is a perspective view showing another example of a film forming apparatus embodying the present invention. In FIG. 3, the film forming apparatus includes a circular tank, which is partitioned by a radial frame 2 into a plurality of fan-shaped tanks. The fan-shaped tanks are liquid tanks 1a and lb in which middle molecular layers are developed.

lc、ldと化学反応液を貯溜した処理槽11a。A processing tank 11a stores lc, ld and a chemical reaction liquid.

11b 、 llc  、 lidとが交互に1つ置き
に配置されている。円形槽の中心位置には、塔状の基板
コントロール部12がt設されていて、その頂端がらほ
ぼ水モに四方へ伸ばされた4本の基板ホルダー8の先端
部に、成膜を行われる基板7a、7b。
11b, llc, and lid are arranged alternately at every other location. A tower-shaped substrate control section 12 is provided at the center of the circular tank, and film formation is performed on the tips of four substrate holders 8 extending in all directions from the top end almost like a water mower. Substrates 7a, 7b.

7c、7dを保持している。この基板コントロール部1
2は回転および上下動が可能で、45度ずつ回転して上
下動することにより、前記各基板にまず液槽で単分子膜
を移しとったのち隣りの処理槽で化学反応させるという
2工程を繰り返すことができる。もちろん、処理槽は化
学反応だけでなく、光重合や熱反応、乾燥などの設備に
することも任意である。
Holds 7c and 7d. This board control section 1
2 can be rotated and moved up and down, and by rotating in 45 degree increments and moving up and down, the monomolecular film is first transferred to each substrate in a liquid bath and then chemically reacted in an adjacent treatment bath. Can be repeated. Of course, the treatment tank can be used not only for chemical reactions, but also for photopolymerization, thermal reactions, drying, and the like.

また、円形槽の仕切り数にも制限はなく、本実施例では
液槽と処理槽を交尾に配置することとしたが、これも工
程に対応する具合に配置すればよく、さらに基板を保持
する基板ホルダーの本数も円形槽の仕切り数と工程に対
応できる数であれば、所望の本数を備えて差支えない。
Furthermore, there is no limit to the number of partitions in the circular tank, and in this example, the liquid tank and the processing tank were arranged in a mating manner, but this can also be arranged in a way that corresponds to the process. The desired number of substrate holders may be provided as long as the number can correspond to the number of partitions of the circular tank and the process.

[発明の効果] 以上、説明したとおり5本発明によれば、成膜装置に処
理槽を備えることにより、基板上に形成される単分子膜
またはその累積膜に対して、必要な化学・物理反応も簡
単に行うことが可能な成膜装置を提供することができる
[Effects of the Invention] As explained above, according to the present invention, by providing a processing tank in a film forming apparatus, necessary chemical and physical It is possible to provide a film forming apparatus that can easily carry out reactions.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の一実施例の斜視図、第2図は従来例の
斜視図、第3図は本発明の他の実施例の斜視図である。 1a−1d・・・液槽、2・・・枠、3・・・水面、4
a、4b・・・バリア、7a〜7d・・・基板。 8・・・基板ホルダー、10a 、 tub・・・膜圧
センサ、11a N11d・・・反応槽、 12・・・基板コントロール部。 第1図 第2図
FIG. 1 is a perspective view of one embodiment of the present invention, FIG. 2 is a perspective view of a conventional example, and FIG. 3 is a perspective view of another embodiment of the present invention. 1a-1d...Liquid tank, 2...Frame, 3...Water surface, 4
a, 4b... Barrier, 7a-7d... Substrate. 8...Substrate holder, 10a, tube...Membrane pressure sensor, 11a N11d...Reaction tank, 12...Substrate control section. Figure 1 Figure 2

Claims (1)

【特許請求の範囲】[Claims] I )液槽に隣接して処理槽が設けられており、基板ホ
ルダーに保持された基板を液槽と処理槽間で相互移送す
る基板コントロール部を有することを特徴とする成膜装
置。
I) A film forming apparatus characterized in that a processing tank is provided adjacent to the liquid tank, and a substrate control unit that mutually transfers a substrate held in a substrate holder between the liquid tank and the processing tank.
JP60112065A 1985-05-27 1985-05-27 Film forming device Pending JPS61271049A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60112065A JPS61271049A (en) 1985-05-27 1985-05-27 Film forming device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60112065A JPS61271049A (en) 1985-05-27 1985-05-27 Film forming device

Publications (1)

Publication Number Publication Date
JPS61271049A true JPS61271049A (en) 1986-12-01

Family

ID=14577171

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60112065A Pending JPS61271049A (en) 1985-05-27 1985-05-27 Film forming device

Country Status (1)

Country Link
JP (1) JPS61271049A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63141668A (en) * 1986-12-02 1988-06-14 Toshiba Corp Device for forming thin organic film
JPS63162058A (en) * 1986-12-26 1988-07-05 Toshiba Corp Organic thin film forming device
CN104549920A (en) * 2015-02-03 2015-04-29 苏州博众精工科技有限公司 R-shaft mechanism

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63141668A (en) * 1986-12-02 1988-06-14 Toshiba Corp Device for forming thin organic film
JPS63162058A (en) * 1986-12-26 1988-07-05 Toshiba Corp Organic thin film forming device
CN104549920A (en) * 2015-02-03 2015-04-29 苏州博众精工科技有限公司 R-shaft mechanism
CN104549920B (en) * 2015-02-03 2016-10-05 苏州博众精工科技有限公司 A kind of R axis mechanism

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