JPS6126524A - Production of quartz glass - Google Patents

Production of quartz glass

Info

Publication number
JPS6126524A
JPS6126524A JP14729284A JP14729284A JPS6126524A JP S6126524 A JPS6126524 A JP S6126524A JP 14729284 A JP14729284 A JP 14729284A JP 14729284 A JP14729284 A JP 14729284A JP S6126524 A JPS6126524 A JP S6126524A
Authority
JP
Japan
Prior art keywords
quartz glass
sol
sintering
added
metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14729284A
Other languages
Japanese (ja)
Other versions
JPH0582331B2 (en
Inventor
Satoru Miyashita
悟 宮下
Sadao Kanbe
貞男 神戸
Motoyuki Toki
元幸 土岐
Tetsuhiko Takeuchi
哲彦 竹内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP14729284A priority Critical patent/JPS6126524A/en
Publication of JPS6126524A publication Critical patent/JPS6126524A/en
Publication of JPH0582331B2 publication Critical patent/JPH0582331B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • C03C1/006Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route

Abstract

PURPOSE:To produce quartz glass of high quality without cracking, foaming nor crystallizing in a sintering step, by adding a very small amount of a metal compond to the process before gelation in production of the quartz glass by the sol- gel method. CONSTITUTION:At least an alkyl silicate and ultrafine powdery silica are used as raw materials to produce quartz glass by the sol-gel method. In the process, a metal element in an amount of <=50ppm based on the weight of the quartz glass after the sintering is added thereto before gelation. The element to be added is preferably an inexpensive alkali metal or alkaline earth metal having great effect is preferred, and, e.g. NaCl, is used. Thus, the aimed quartz glass of high quality is produced without cracking, foaming nor crystallizing in the sintering step. The amount of the metal element to be added is very small, and the metal element tends to be unevenly ditributed in the surface. The element can be removed by grinding, etc. and the quality can be improved. Therefore, the resultant quartz glass can be applied to quartz substrates for photomasking, quartz glass fibers for optical communication, various optical cells, etc.

Description

【発明の詳細な説明】 〔技術分野〕 本発明はゾル−ゲル法による石英ガラスの製造1餠に関
する。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field] The present invention relates to the production of quartz glass by a sol-gel process.

〔従来技術〕[Prior art]

石英ガラスはIC製造行程中でるつぼやボード、拡散炉
等に使用されるようになり、その有用性がしめられ、更
に水酸基の少ないものや光学的均一性の良いものが開発
されたことによって、各種の光学的用途に使用されるよ
うになシ、特に光通信用の石英ガラスファイバーが最近
注目されている。
Quartz glass began to be used in crucibles, boards, diffusion furnaces, etc. during the IC manufacturing process, and its usefulness was demonstrated, and with the development of products with fewer hydroxyl groups and better optical uniformity, BACKGROUND OF THE INVENTION Recently, quartz glass fibers have been attracting attention as they are used for various optical applications, especially for optical communications.

このように石英ガラスは種々の分野で使用され。In this way, quartz glass is used in various fields.

その利用範囲も広がっている。しかし、石英ガラスの製
造コストは高く、高価なことが問題になっている。安価
で高品質の石英ガラスを製造する方法として、ゾル−ゲ
ル法が試みられている。
Its scope of use is also expanding. However, the manufacturing cost of quartz glass is high, and the high price has become a problem. A sol-gel method has been attempted as a method for manufacturing inexpensive, high-quality quartz glass.

ゾル−ゲル法を用いて歩留シ良(1,大型の石英ガラス
を得る方法として、アルキルシリケートを加水分解した
ゾル中に超微粉末シリカを加え、更にPHを3〜6に調
整した後、50〜90℃で乾燥し、焼結する方法がある
。ドライゲル作製中の割れの問題と、焼結中の割れやク
ラックの間[−同時に解決したものであり、かなり大き
な石英ガラス(41nchφ以上)が低コストで製造で
きるようになった。
As a method for obtaining large-sized quartz glass using the sol-gel method, ultrafine powdered silica was added to the sol obtained by hydrolyzing alkyl silicate, and after adjusting the pH to 3 to 6, There is a method of drying at 50 to 90°C and sintering.The problems of cracking during dry gel production and cracking during sintering [- were solved at the same time, and quite large quartz glass (41 nchφ or more)] can now be manufactured at low cost.

ところが焼結が終了し完全に透明化する以前に、既に発
泡や結晶化が始まってしまい、高品質の石英ガラスを望
めないのが現状である。また焼結雰囲気を変えたり、過
密状態で焼結する場合、クラックが生成しやすぐなる現
象が観察されている。
However, before sintering is complete and the glass becomes completely transparent, foaming and crystallization have already begun, making it impossible to produce high-quality quartz glass. Furthermore, it has been observed that when the sintering atmosphere is changed or when sintering is performed in an overcrowded state, cracks are more likely to form.

これらの焼結過程で発生する諸問題を、侶(結プログラ
ムによる操作では完全に削除することができない。超微
粉末シリカの分散条件やゲルの乾燥条件によっても、効
果的な方法は研立されていない。
These problems that occur during the sintering process cannot be completely eliminated by using a sintering program.Effective methods may vary depending on the dispersion conditions of the ultrafine powder silica and the drying conditions of the gel. Not yet.

〔目的〕〔the purpose〕

本発明はこのような問題点を解決するもので、焼結過程
でクラックが生成したり、発泡や結晶化することなく、
高品質の石英ガラスも製造する方法を樺供することにあ
る。
The present invention solves these problems and eliminates cracks, foaming, and crystallization during the sintering process.
Our goal is to provide a method for producing high quality quartz glass.

〔概要〕〔overview〕

本発明の石英ガラスの製造方法は、少くともアルキルシ
リケートおよび超微粉末シリカを原料とするゾル−ゲル
法による石英ガラスの製造方法において、ゲル化前に金
属元素を焼結後の石英ガラス重量に対し50ppm以下
添加し、均一に分散させることを特徴とする。
The method for producing quartz glass of the present invention is a method for producing quartz glass by a sol-gel method using at least alkyl silicate and ultrafine powder silica as raw materials, in which metal elements are added to the weight of the quartz glass after sintering before gelation. It is characterized by adding 50 ppm or less to the water and uniformly dispersing it.

添加元素は効果が太きく安価なN s、 、 K 、 
Ca等のアルカリ金属、及びアルカリ土金属が適当であ
る。添加量は石英ガラスの純度や結晶化を考慮すると、
焼結後の石英ガラス重量に対し0.5〜5ppmが適当
である。添加方法は、塩化物等の金属塩を純水に溶解さ
せイオン状態としてからゾル中に滴下し、撹拌すると計
算量の元素を均一に添加でき、PHへの影響もほとんど
ない為有効である。
The additive elements are effective and inexpensive Ns, , K,
Alkali metals such as Ca and alkaline earth metals are suitable. The amount added is determined by considering the purity and crystallization of quartz glass.
A suitable amount is 0.5 to 5 ppm based on the weight of quartz glass after sintering. The addition method is effective because a metal salt such as a chloride is dissolved in pure water to form an ion state, and then dropped into the sol and stirred, so that the calculated amount of the element can be uniformly added, and there is almost no effect on the pH.

〔実施例〕〔Example〕

以下、本発明について実施例に基づき詳細に説明する。 Hereinafter, the present invention will be described in detail based on examples.

実施例1゜ エチルシリケート440mj!と0.05規定塩酸水溶
液560 mlを激しく撹拌し、無色透明の均一溶液を
得た後、そこにシリカ微粉末(AerOL3j、1゜0
X−5’0 ) 150 S’を徐々に添加し、充分に
撹拌した(以後ゾルAと呼ぶ)。それとは別にN a、
 CI 0.01係水溶液を調整し、ゾルハ中に34m
1(NFI / 5i02 =5 pprn )a下し
た稜、10分間撹拌した。さらにアンモニア水を滴下し
てP H4,5に調整した後、5007秤量して直径、
20Crnのテフロン容器に移した。
Example 1゜Ethyl silicate 440mj! and 560 ml of a 0.05 N hydrochloric acid aqueous solution were vigorously stirred to obtain a colorless and transparent homogeneous solution, and fine silica powder (AerOL3j, 1°0
X-5'0) 150 S' was gradually added and thoroughly stirred (hereinafter referred to as Sol A). Apart from that, N a,
Prepare a CI 0.01 aqueous solution and add 34 m to Zolha.
1 (NFI/5i02 = 5 pprn) and stirred for 10 minutes. Furthermore, after adjusting the pH to 4.5 by dropping ammonia water, we weighed 5007 and determined the diameter.
Transferred to a 20Cr Teflon container.

ピンホールの開いた蓋をし、60℃で乾燥させてドライ
ゲルを得た。焼結炉に移し180℃/hrの昇温速度で
1200℃壕で加熱すると完全に透明化し、直径101
:nnの石英ガラスが製造できた。
A lid with a pinhole was placed on it and dried at 60°C to obtain a dry gel. When transferred to a sintering furnace and heated in a trench at 1200°C at a heating rate of 180°C/hr, it becomes completely transparent and has a diameter of 101 mm.
:nn quartz glass could be manufactured.

1300℃壕で加熱しても発泡や結晶化は見られなかっ
た。
Even when heated in a trench at 1300°C, no foaming or crystallization was observed.

石英ガラスを溶解させ、原子吸光分析を行なったところ
N8の含有率は約4ppmで、添加量より少ない値を示
した。筐たIMA(イオンマイクロアナライ−(J’ 
−)で表面純度を測テしたところ、N8は表面付近に偏
在していることがわかった。
When the quartz glass was melted and atomic absorption analysis was performed, the content of N8 was approximately 4 ppm, which was lower than the amount added. IMA (Ion Micro Analyzer (J')
-), it was found that N8 was unevenly distributed near the surface.

表面から1で研磨した面からは、はとんどN8が検串ジ
れなかった。
From the surface polished in Step 1, N8 could hardly be detected.

実施例2゜ ゾルAにC! RC12n、o 1 %水溶液57me
(Ca/s+n2=5ppm)を滴下し10分間撹拌し
てから、アンモニア水でP H4,5に調整した。
Example 2 Sol A to C! RC12n, o 1% aqueous solution 57me
(Ca/s+n2=5ppm) was added dropwise and stirred for 10 minutes, and the pH was adjusted to 4.5 with aqueous ammonia.

その後実施例1と同様の処理を行ない、ドライゲルを加
熱したところ、1200℃で完全に透明化、した。やは
り1600℃以下では発泡や結晶化が卿られなかった。
Thereafter, the same treatment as in Example 1 was carried out, and when the dry gel was heated, it became completely transparent at 1200°C. Again, foaming and crystallization were not observed at temperatures below 1600°C.

すV 施例 ろ。V example.

ゾルA、 Ic N a、 CI 0.01 %水溶液
7 ml (N a /R102=1 ppm )(r
滴下し10分間撹拌してから、アンモニア水でP H4
,5に調整した。その後実施例1と同様の処理を行ない
、ドライゲルを1200℃贅で加熱し% 30分l¥i
l保持し、たところ完全に透明化した。1300℃筐で
加熱シ、でも発泡や結晶化は見られなかった。
Sol A, Ic Na, CI 0.01% aqueous solution 7 ml (N a /R102=1 ppm) (r
Add dropwise and stir for 10 minutes, then add PH4 with ammonia water.
, 5. Thereafter, the same treatment as in Example 1 was carried out, and the dry gel was heated at 1200°C for 30 minutes.
1, and at some points it became completely transparent. No foaming or crystallization was observed even when heated at 1300°C in an enclosure.

実施例4 ゾルA Ic N Fl、 Ol O,01%水溶液6
9 tn/ (N a/5ioz=10T1r+m)f
jC@下し10分間摺呻してから、アンモニア水でp 
)l 4.5に調整した。その後実施例1と同様の処理
を行ない、ドライゲルを加熱したところ1150℃で完
全に透明化した。
Example 4 Sol A Ic N Fl, Ol O, 01% aqueous solution 6
9 tn/ (N a/5ioz=10T1r+m)f
jC@ Lower it and rub it for 10 minutes, then wash it with ammonia water.
)l was adjusted to 4.5. Thereafter, the same treatment as in Example 1 was carried out, and when the dry gel was heated, it became completely transparent at 1150°C.

1300℃まで加熱しても発泡や結晶化は見られなかっ
た。
No foaming or crystallization was observed even when heated to 1300°C.

実施例5゜ 実施例1と同様の方法で作製したドライゲル(直径14
m、厚さ0.7α+)5枚を焼結炉内に積み重ね、18
0℃/hrの昇温速度で1200℃まで加熱すると5枚
すべてが完全に透明化し、クラックも全く生成していな
かった。
Example 5 Dry gel (diameter 14
m, thickness 0.7α+) were stacked in a sintering furnace, and 18
When heated to 1200° C. at a temperature increase rate of 0° C./hr, all five sheets became completely transparent and no cracks were generated at all.

品質的にも、1枚のみで焼結した場合と何ら変わりがな
く、発泡や結晶化はみられなかった。
In terms of quality, there was no difference in quality compared to when only one sheet was sintered, and no foaming or crystallization was observed.

実施例6゜ ゾルp、 f、−20℃に保ちながら28KH2の超音
波を2時間照射して分散を良くし、1500Gの遠心力
を10分間かけ、分散が不充分の巨大粒子を沈降させた
。更に10μmのフィルターを通して、極めて均質度の
高いゾルを調整した。そこにNPClo、01%水溶液
20m1(N a / 5ins−3ppm )を滴下
し10分間撹拌した後、アンモニア水を滴下してP H
4,2に調整した。
Example 6゜Sol p, f. While keeping the temperature at -20°C, 28KH2 ultrasonic waves were irradiated for 2 hours to improve dispersion, and 1500G centrifugal force was applied for 10 minutes to sediment insufficiently dispersed giant particles. . The sol was further passed through a 10 μm filter to prepare a highly homogeneous sol. 20 ml of a 1% aqueous solution (N a / 5 ins - 3 ppm) of NPClo was added dropwise thereto and stirred for 10 minutes, and then aqueous ammonia was added dropwise to the solution.
Adjusted to 4.2.

60℃で乾燥させてドライゲルとし、1200℃捷で加
熱すると完全に透明化した。得られた石英ガラスの品質
は極めて高(、気泡や結晶を全く含んでいなかった。集
光ランプを当てても、肉眼では何も検出できず、光学的
特性も極めてすぐれていた。
It was dried at 60°C to form a dry gel, which became completely transparent when heated at 1200°C. The quality of the resulting quartz glass was extremely high (it contained no bubbles or crystals at all. Even when exposed to a condensing lamp, nothing could be detected with the naked eye, and its optical properties were also extremely good.

比較例1゜ ゾルAに金属元素を伺も添加せず、実施例1と同様の処
理で作製したドライゲルを180℃/hrの昇温連間で
1300℃まで加熱したところ、透明化に嫌とんど進行
しておらず、ドライゲル同様白色をしていた。1300
℃で1時間保つと透明化が終了したが、既に気泡が生成
してふ・す、α−クリストバライト結晶も観察された。
Comparative Example 1 A dry gel prepared in the same manner as in Example 1 without adding any metal element to Sol A was heated to 1300°C at a temperature increase rate of 180°C/hr. It had not progressed and was white like dry gel. 1300
After being kept at ℃ for 1 hour, the transparentization was completed, but bubbles were already formed, fuss, and α-cristobalite crystals were also observed.

育た集光ランプを当てると、くもりが観察され、焼結が
完全には終了していないことを示I7た。
When exposed to a condensing lamp, cloudiness was observed, indicating that sintering was not completely completed.

比較例2゜ ゾルAに金属元素を何も添加せず、実施例1と同様の処
理で作製したドライゲル5枚kv8結炉内に積み重ね、
180℃/hrの昇温速關で1300℃まで加熱すると
、5枚すべてにクラックが入り、特に中間部の3枚は細
かぐ割れていた。比較例1と同様透明化けはとんと進行
していなかった。
Comparative Example 2゜No metal element was added to Sol A, and 5 sheets of dry gel prepared in the same manner as in Example 1 were stacked in a KV8 furnace.
When heated to 1300° C. at a temperature increase rate of 180° C./hr, all five sheets developed cracks, and especially the three sheets in the middle were finely cracked. As in Comparative Example 1, clearing did not progress at all.

〔効果〕〔effect〕

以上述べたように本発明によれば、少くともアルキルシ
リケートおよび超微粉末シリカを原料とするゾル−ゲル
法による石英ガラスの製造方法において、ゲル化前に金
籟元累を焼結後の石英ガラス重量に対し50ppm以下
添加することにより、焼結過程でクラックが生成したり
発泡や結晶化することな(、高品質の石英ガラスを製造
するととができる。
As described above, according to the present invention, in the method for producing quartz glass by the sol-gel method using at least alkyl silicate and ultrafine powder silica as raw materials, sintered quartz By adding 50 ppm or less based on the weight of the glass, it is possible to produce high-quality quartz glass without cracking, foaming, or crystallization during the sintering process.

金属元素を添加するとはいえ、添加量はごく微量であり
、天然石英を溶嚇する方法で製造した石英ガラス中の不
純物濃度と同レベルである。また、添加元素は表面に偏
在する傾向にあシ、研磨技術等により高純度の石英ガラ
スとしても使用できる。
Although metal elements are added, the amount added is extremely small, and is at the same level as the impurity concentration in quartz glass manufactured by a method of melting natural quartz. Additionally, since additive elements tend to be unevenly distributed on the surface, it can also be used as high-purity quartz glass by polishing techniques.

本発明による最大の利点は光学的特性の極めてすぐれた
石英ガラスが製造できることで、フォトマスク用石英基
盤、光通信用石英ガラスファイバー、各種光学用セル等
に応用できる。また焼結過程での割れが皆無となるため
、量産においても極めて有効な手段である。
The greatest advantage of the present invention is that quartz glass with extremely excellent optical properties can be produced, which can be applied to quartz substrates for photomasks, quartz glass fibers for optical communication, various optical cells, etc. Furthermore, since there is no cracking during the sintering process, it is an extremely effective means for mass production.

以上that's all

Claims (1)

【特許請求の範囲】 1)少くともアルキルシリケートおよび超微粉末シリカ
を原料とするゾル−ゲル法による石英ガラスの製造方法
において、ゲル化前に金属元素を焼結後の石英ガラス重
量に対し50ppm以下添加することを特徴とする石英
ガラスの製造方法。 2)好ましい添加元素はNa、K、Ca等のアルカリ全
属、及びアルカリ土金属であることを特徴とする特許請
求の範囲第1項記載の石英ガラスの製造方法。 3)好ましい添加量は焼結後の石英ガラス重量に対し、
0.5〜5ppmであることを特徴とする特許請求の範
囲第1項又は第2項記載の石英ガラスの製造方法。 4)好ましい添加方法は、塩化物等の金属塩を純水に溶
解させイオン状態とし、ゾル中に滴下してから撹拌によ
り均一に分散させる方法であることを特徴とする特許請
求の範囲第1〜第3項のいずれかに記載の石英ガラスの
製造方法。
[Scope of Claims] 1) In a method for producing quartz glass by a sol-gel method using at least an alkyl silicate and ultrafine powdered silica as raw materials, a metal element is added before gelation in an amount of 50 ppm based on the weight of the quartz glass after sintering. A method for producing quartz glass characterized by adding the following: 2) The method for producing quartz glass according to claim 1, wherein preferable additive elements are all alkali metals such as Na, K, and Ca, and alkaline earth metals. 3) The preferred addition amount is based on the weight of quartz glass after sintering,
The method for producing quartz glass according to claim 1 or 2, wherein the content is 0.5 to 5 ppm. 4) A preferred addition method is a method of dissolving a metal salt such as a chloride in pure water to make it into an ionized state, dropping it into a sol, and then uniformly dispersing it by stirring. - The method for producing quartz glass according to any one of Item 3.
JP14729284A 1984-07-16 1984-07-16 Production of quartz glass Granted JPS6126524A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14729284A JPS6126524A (en) 1984-07-16 1984-07-16 Production of quartz glass

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14729284A JPS6126524A (en) 1984-07-16 1984-07-16 Production of quartz glass

Publications (2)

Publication Number Publication Date
JPS6126524A true JPS6126524A (en) 1986-02-05
JPH0582331B2 JPH0582331B2 (en) 1993-11-18

Family

ID=15426905

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14729284A Granted JPS6126524A (en) 1984-07-16 1984-07-16 Production of quartz glass

Country Status (1)

Country Link
JP (1) JPS6126524A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63288919A (en) * 1987-05-20 1988-11-25 Seiko Epson Corp Production of doped silica glass
JPS6414117A (en) * 1987-07-04 1989-01-18 Yamamura Glass Production of glass by sol-gel method
JPH01215728A (en) * 1988-02-22 1989-08-29 Shinetsu Sekiei Kk Production of quartz glass
JPH0354123A (en) * 1989-07-20 1991-03-08 Shin Etsu Chem Co Ltd Quartz glass for ultraviolet ray and production thereof
WO1996022256A1 (en) * 1995-01-20 1996-07-25 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Process for producing glass coatings for anodic bonding purposes

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5404031B2 (en) 2008-12-26 2014-01-29 三菱重工業株式会社 Grand Flare

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5019520A (en) * 1973-05-31 1975-03-01
JPS5992924A (en) * 1982-11-19 1984-05-29 Seiko Epson Corp Preparation of quartz glass

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5019520A (en) * 1973-05-31 1975-03-01
JPS5992924A (en) * 1982-11-19 1984-05-29 Seiko Epson Corp Preparation of quartz glass

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63288919A (en) * 1987-05-20 1988-11-25 Seiko Epson Corp Production of doped silica glass
JPS6414117A (en) * 1987-07-04 1989-01-18 Yamamura Glass Production of glass by sol-gel method
JPH01215728A (en) * 1988-02-22 1989-08-29 Shinetsu Sekiei Kk Production of quartz glass
JPH0354123A (en) * 1989-07-20 1991-03-08 Shin Etsu Chem Co Ltd Quartz glass for ultraviolet ray and production thereof
WO1996022256A1 (en) * 1995-01-20 1996-07-25 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Process for producing glass coatings for anodic bonding purposes

Also Published As

Publication number Publication date
JPH0582331B2 (en) 1993-11-18

Similar Documents

Publication Publication Date Title
JPS6126524A (en) Production of quartz glass
JPS59131538A (en) Production of quartz glass
JPS6054928A (en) Production of quartz glass
Hasdemir et al. Crystallisation of lithium di‐and metasilicate solid solutions from Li2O–SiO2 glasses
JPS6065735A (en) Production of quartz glass
JP2001348220A (en) Spherical leucite crystal and manufacturing method thereof
JPS60215531A (en) Production of quartz glass
JPS6086034A (en) Production of quartz glass
JPS6140825A (en) Preparation of quartz glass
JPS60108324A (en) Production of quartz glass
JPS60215532A (en) Production of quartz glass
JPH0123420B2 (en)
JPS6158818A (en) Manufacture of quartz glass
JPS6144720A (en) Production of quartz glass
JPS643814B2 (en)
JPS5978948A (en) Manufacture of quartz glass
JPS6086035A (en) Production of quartz glass
JPS643813B2 (en)
JPS62278135A (en) Production of glass
JPS6086036A (en) Production of quartz glass
JPS6065733A (en) Production of quartz glass
JPS6126525A (en) Production of quartz glass
JPH08133719A (en) High purity synthetic cristobalite powder, its production and silica glass
JPS6065734A (en) Production of quartz glass
JPS6330335A (en) Production of quartz glass

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees