JPS60215531A - Production of quartz glass - Google Patents
Production of quartz glassInfo
- Publication number
- JPS60215531A JPS60215531A JP7056584A JP7056584A JPS60215531A JP S60215531 A JPS60215531 A JP S60215531A JP 7056584 A JP7056584 A JP 7056584A JP 7056584 A JP7056584 A JP 7056584A JP S60215531 A JPS60215531 A JP S60215531A
- Authority
- JP
- Japan
- Prior art keywords
- quartz glass
- sol
- solution
- gel
- glass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
- C03C1/006—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Melting And Manufacturing (AREA)
- Silicon Compounds (AREA)
Abstract
Description
【発明の詳細な説明】
〔技術分野〕
本発明は、ゾル−ゲル法による石英ガラスの製造法に関
する。DETAILED DESCRIPTION OF THE INVENTION [Technical Field] The present invention relates to a method for producing quartz glass by a sol-gel method.
、c:従来技術〕
近年、石英ガラスは、銅、ホウ素等の不純物濃変が、0
.lppm以下の高純度のものが製造され、ゲルマニウ
ム、シリコン、その他の半導体の製造工程におけるルツ
ボやボード、拡散炉の炉心管など幅広く用いられるよう
Kなり、また理化学用機器、光学測定用のセルと1−て
も、よく使用され、さらに水酸基金Illの少ないもの
および光学的均質性に優h−a高品・改なものが開発さ
れ、各種の光学的用途に1史用され、特に光I!ハ信用
の石凋ガラスファイバーは注1コされている。このよう
に用途の広い石英ガラスtar 、現在、−収に次に示
J−る櫨類の方法でlli造されてい、6゜
1) 天然水晶と洗浄し溶融−する方法2)高純度81
0 t4ま友はG i H4を原料として8103を製
造する方法
3)天然珪砂を溶融する方法(泡と含何する石英ガラス
が得られる)
しかし、以上のいすnの製造法も原料費が高価なこと、
高温処理が必要であることなどの12−め製造コストが
高く、石英ガラスは非常VC高価である。, c: Prior art] In recent years, quartz glass has been improved by reducing the concentration of impurities such as copper and boron to 0.
.. Products with a high purity of less than 1 ppm are manufactured, and are widely used in crucibles and boards in the manufacturing process of germanium, silicon, and other semiconductors, and in the core tube of diffusion furnaces.They are also used in physical and chemical equipment, cells for optical measurement, etc. 1-1 is also commonly used, and high-quality and improved products with less hydroxyl base Ill and excellent optical homogeneity have been developed and have been used for various optical applications, especially optical Ill. ! There is a note on the stone glass fiber used for the material. Currently, quartz glass tar, which has a wide range of uses, is manufactured using the following method: 1) Cleaning and melting with natural quartz 2) High purity 81
0 t4 Mayu is a method of manufacturing 8103 using G i H4 as a raw material 3) A method of melting natural silica sand (silica glass containing bubbles is obtained) However, the above method of manufacturing chair n also requires high raw material costs. Things,
The 12-metre manufacturing cost is high, such as the need for high-temperature treatment, and quartz glass is very expensive.
そこで高品質な石英ガラスの安価な製造法としてゾル−
ゲル法が注目され、この方法を用いる石英ガラス製造に
関する研究は、さまざまな所で幅広く行なわれているが
、現状では、種々の問題をかかえ実用化までは至ってい
ない。このゾル−ゲル法による石英ガラス製造の一手法
として次のような方法が考案されている。すなわち、エ
チルシリケー) (Si (002H5)4 ) と塩
酸溶液を混合し、エチルシリケートの加水分解溶液を調
製、この溶液[微粉末シリカを混合1分散させシリカゾ
ルとしアンモニア水等の弱塩基によりゾルpH値の調整
。Therefore, as an inexpensive manufacturing method for high-quality quartz glass, sol-based
The gel method has attracted attention, and research on the production of quartz glass using this method has been widely conducted in various places, but at present it has not been put into practical use due to various problems. The following method has been devised as a method for producing quartz glass using the sol-gel method. That is, ethyl silicate) (Si(002H5)4) is mixed with a hydrochloric acid solution to prepare a hydrolyzed solution of ethyl silicate. Adjustment of.
熱処理などを加え、シリカゲルとする。ここで得られた
塊状のシリカゲルを炉に入れ所定のプログラムで焼結を
行ない石英ガラスとするものであるが、この方法の問題
点の一つとして乾燥ゲル製造の歩留りを向上させること
を目的として行なう。Add heat treatment and make it into silica gel. The resulting lumps of silica gel are placed in a furnace and sintered according to a predetermined program to form quartz glass.One of the problems with this method is that it is necessary to improve the yield of dry gel production. Let's do it.
アンモニア水等の滴下によるゾルpH値の調整に伴なう
中オロ反応生成物が、焼結において悪影響を及ばし得ら
れ次石英ガラス中に種々の欠陥(気泡など)が存在し、
均質なガラスが得難いことがあげられる。The silica reaction products caused by adjusting the sol pH value by dropping aqueous ammonia etc. have an adverse effect on sintering, resulting in the presence of various defects (bubbles, etc.) in the quartz glass.
One of the reasons is that it is difficult to obtain homogeneous glass.
本発明の目的は、前述のごとき問題点を解決するもので
、pH値副調整際の中和反応生成物の生成量をできる限
シ少畦に押え、透明均質な石英ガラスの製造方法を提供
することである。The purpose of the present invention is to solve the above-mentioned problems, and to provide a method for producing transparent homogeneous quartz glass by minimizing the amount of neutralization reaction products produced during sub-adjustment of the pH value. It is to be.
エチルシリケート([31(002H5)4) の加水
分解反応を、原料組成5i(002H,)4: T(、
O:口ot=1:2:(1072(モル化)で行ない、
混合、攪拌し溶液が透明均一な状態になったところで、
以後のゾル調整に必快なH2Oを添加混合し、さらに微
粉末シリカを添加該溶液中に分散さ忙ゾルを調整し、ア
ンモニア水によりゾルpHI直を五〇〜5.0程度に上
昇させ、ゲル化、乾燥し得友乾燥ゲルを焼結し石英ガラ
スとする方法であり、この方法で行なうとpH値の調整
による中和反応生成・吻が従来の40チになる。以下、
実施1シリに従い本発明の内容をさら匹詳細に説明する
。The hydrolysis reaction of ethyl silicate ([31(002H5)4) is carried out using raw material composition 5i(002H,)4: T(,
O: mouth = 1:2: (1072 (molization)),
After mixing and stirring until the solution becomes transparent and homogeneous,
Add and mix H2O, which is necessary for subsequent sol preparation, and further add fine powder silica. Adjust the sol by dispersing it in the solution, and raise the sol pHI to about 50 to 5.0 with ammonia water. This is a method of gelling, drying, and sintering the dried gel to form quartz glass. If this method is used, the neutralization reaction produced by adjusting the pH value will be reduced to 40 cm compared to the conventional method. below,
The contents of the present invention will be explained in more detail according to the first embodiment.
市販のエチルシリケート5i(O[!;t)4264−
と0.02NHO6Ai2ゴとを混合し、激しく攪拌し
たところ、1時間程で外見上は均一透明な溶液となった
該溶液にH2O172,8m7!を徐々に添加した、籾
量にはやや白濁したものの、しばらく攪拌すると均一透
明な加水分解溶液となつ友。ただし、前述の原料(Si
(Offit )4264ゴ、α02NHO445,
2nt 、 H20172,8ml )を同時に混合し
たのでは、反応が起こらず、相分離してしまった。該加
水分解溶液に、微粉末シリカ(商品名:Aθrosil
oxs。Commercially available ethyl silicate 5i(O[!;t)4264-
When mixed with 0.02NHO6Ai2 and stirred vigorously, 172,8 m7 of H2O was added to the solution, which became an apparently homogeneous and transparent solution in about 1 hour. Gradually added to the rice, the amount of rice became slightly cloudy, but after stirring for a while, the hydrolyzed solution became homogeneous and transparent. However, the aforementioned raw material (Si
(Offit) 4264go, α02NHO445,
2nt, H20172, 8ml) at the same time, no reaction occurred and the phases separated. Finely powdered silica (trade name: Aθrosil) is added to the hydrolyzed solution.
oxs.
(DiguSSa社))901Fを攪拌しながら添加し
た。添加終了後、さらに微粉末の分散性を高めるために
、攪拌を6時間、超音波を3時間照射した後、遠心分離
(1500F、 10m1n )および(LINアンモ
ニア水を滴下し、ゾルのpH値を4.0程度Vc L、
友。(1娯序は関係ない) 該ゾルを濾過(200me
shのフィルター)し、ポリプロピレン製容器(27X
22X1t5cm)K入れ、ふitして密閉状態でゲル
化させfc。この状態で2〜3日間静置した後、蓋を乾
燥速度の調節可能なものに取り替え、乾燥機に入れ30
℃から昇温速度 5−
3℃7nrKで60℃まで温度を上昇させ、以後60℃
に保持、し乾燥を行ないほぼ5日間で、大きさ1115
X14.5X[L6cInの板状の乾燥ゲルを得た。こ
の乾燥ゲルを焼結炉に入れ、昇温速度1801117n
rで、加熱、焼結を行ない1260℃にて、大きさ1五
0XIQ、OXo、4zの透明な石英ガラスを得た。(DiguSSa)) 901F was added with stirring. After the addition, in order to further improve the dispersibility of the fine powder, the mixture was stirred for 6 hours and irradiated with ultrasonic waves for 3 hours, then centrifuged (1500F, 10ml) and (LIN) aqueous ammonia was added dropwise to adjust the pH value of the sol. Approximately 4.0 Vc L,
friend. (1 entertainment order is irrelevant) Filter the sol (200me
sh filter) and a polypropylene container (27X
22X1t5cm) Pour K, fit it, and let it gel in a sealed state. After leaving it in this state for 2 to 3 days, replace the lid with one that can adjust the drying speed and put it in the dryer for 30 minutes.
Raise the temperature from ℃ to 60℃ at a heating rate of 5-3℃7nrK, and then increase the temperature to 60℃
After holding and drying for about 5 days, it reached a size of 1115 mm.
A plate-shaped dry gel of X14.5X[L6cIn was obtained. This dry gel was placed in a sintering furnace, and the heating rate was 1801117n.
The glass was heated and sintered at 1260° C. to obtain a transparent quartz glass having a size of 150×IQ, OXo, and 4z.
このガラスを光学顕微鏡で覗祭したところ、以前原料中
のHCl瞼が多かったものに比べ、ガラス中に存在する
異物(気泡など)は、大きさ、数ともにかなり少なくな
り、10μm以上の異物はなかった。ま交、このガラス
に関する諸物性分析の結果は、ビッカース硬度800
V4/J、比重2.2、赤外吸収スペクトル、近赤外吸
収スペクトル、および屈折率など、溶融石英ガラスと一
致し、ここで得九石英ガラスは、非常に高品質な石英ガ
ラスであることが明らかになつ皮。When this glass was inspected with an optical microscope, compared to the previous case where there were many HCl particles in the raw material, the size and number of foreign objects (such as air bubbles) present in the glass were considerably smaller, and there were no foreign objects larger than 10 μm. There wasn't. The results of various physical property analyzes regarding this glass are that it has a Vickers hardness of 800.
V4/J, specific gravity 2.2, infrared absorption spectrum, near-infrared absorption spectrum, and refractive index, etc., are consistent with fused silica glass, and the 9 quartz glass obtained here is a very high quality silica glass. It's clearly Natsu's skin.
このようにして、本発明により製造される石英ガラスは
、従来の方法(溶融法)よりも、低コストでできる等の
大きな利点により、これまで石英 6 −
ガラスを使用していた分野ではもちろんのこと、品質的
にも良好な石英ガラスが容易Kmm造詣能なるために、
光学的用途などさらにその応用は広範囲に広がってゆく
ものと考える。In this way, the quartz glass produced by the present invention has great advantages such as being able to be produced at a lower cost than the conventional method (melting method), and is of course used in fields where quartz glass has been used up until now. In particular, since quartz glass of good quality can be easily manufactured in Kmm,
We believe that its applications, including optical uses, will continue to expand over a wide range of areas.
以 上 出願人 株式会社諏訪精工舎 代理人 弁理士最上 務 7−that's all Applicant: Suwa Seikosha Co., Ltd. Agent: Patent Attorney Mogami 7-
Claims (1)
ご用いるゾル−ゲル法による石英ガラスの製造方法にお
いて、アルキルシリケートとしてエチルシリケー) (
5t(oa2Hs)4)を用い、この加水分解反応全化
学着論量の%のH20(HO/!、溶液)で進行させ、
以後、ゾル調整に必要な口20を祭加することを特徴と
する石英ガラスの製造方法。Alkyl silicate and finely powdered silica are used as raw materials.
In the silica glass manufacturing method using the sol-gel method, the alkyl silicate is ethyl silicate (ethyl silicate) (
5t(oa2Hs)4), this hydrolysis reaction is proceeded with % of the total stoichiometric amount of H20 (HO/!, solution),
Thereafter, a method for producing quartz glass is characterized in that a hole 20 necessary for sol adjustment is added.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59070565A JPH0637310B2 (en) | 1984-04-09 | 1984-04-09 | Quartz glass manufacturing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59070565A JPH0637310B2 (en) | 1984-04-09 | 1984-04-09 | Quartz glass manufacturing method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60215531A true JPS60215531A (en) | 1985-10-28 |
JPH0637310B2 JPH0637310B2 (en) | 1994-05-18 |
Family
ID=13435186
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59070565A Expired - Lifetime JPH0637310B2 (en) | 1984-04-09 | 1984-04-09 | Quartz glass manufacturing method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0637310B2 (en) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5019520A (en) * | 1973-05-31 | 1975-03-01 |
-
1984
- 1984-04-09 JP JP59070565A patent/JPH0637310B2/en not_active Expired - Lifetime
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5019520A (en) * | 1973-05-31 | 1975-03-01 |
Also Published As
Publication number | Publication date |
---|---|
JPH0637310B2 (en) | 1994-05-18 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |