JPS61255521A - Manufacture of magnetic head - Google Patents

Abstract

PURPOSE:To improve the step shape of magnetic poles without using a special device by forming the lower layer part to the plane shape smaller than the lane shape of the upper layer part in the case of superposing respectively >=2 layers of the upper and lower magnetic poles of a thin film magnetic head. CONSTITUTION:An insulating layer 42 consisting of Al2O3 is formed to 10mum by Rf sputtering on an Al2O3-TiC substrate 41 and further a 'Permalloy(R)' (81% Ni) film 43 is formed thereon to 1,000Angstrom by Rf sputtering to provide a plating conductive film. The 1st lower magnetic pole layer 31 is patterned by photoresist to the shape shown in the figure and is subjected to 'Permalloy(R)' (81% Ni) plating to 2mum to form a soft magnetic layer 45. After the photoresist is stripped, the photoresist is formed to a shape 32 and is subjected to 2mum 'Permalloy(R)' plating, then the photoresist is stripped and the plating conductive film is stripped. The lower magnetic pole 47 of the soft magnetic layer is thus obtd.

Description

DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method of manufacturing a thin film magnetic head, and particularly to a method of manufacturing an upper magnetic pole and a lower magnetic pole.

[Conventional technology]

Conventionally, a single-layer magnetic pole has been used in a thin-film magnetic head. However, in order to improve the recording and reproduction efficiency, it is necessary to make the magnetic poles multilayered, and some of them are being put into practical use. Here, simply as shown in Figure 2, the bottom magnetic pole? When 211 layers are stacked, the resulting step difference is steep and becomes an obstacle to the step coverage of sputtering of a gag forming material such as Al t O3'4 in the subsequent process, resulting in breakage of the gag material. This causes poor insulation between the lower magnetic pole and the coil.
There is a problem in that it reduces productivity. There is also a method of completely improving the step shape by ion milling, etc., but it increases the cost of the process and cannot be said to be an effective method.

Furthermore, with respect to the photoresist used for patterning, sufficient precision cannot be obtained when patterning on steps, which causes a decrease in productivity.

When the magnetic poles of a thin film magnetic head are fully multilayered, the above-mentioned problems are a major factor in reducing the yield of the manufacturing process.

[Problem that the invention seeks to solve]

The present invention compensates for the drawbacks of the prior art as described above, and provides a manufacturing method that alleviates the level difference in the multilayered magnetic pole of a thin film magnetic head, reduces process costs, and improves pattern accuracy.

[Means for solving and resolving problems]

The present invention will be explained below. The upper magnetic pole and lower magnetic pole of the thin film magnetic head are each formed on an inorganic layer or an organic layer such as non-extractable Alt's.

First, a photoresist is patterned with precision, and a first layer soft magnetic film is selectively formed. After peeling off the photoresist, a second magnetic pole layer is further formed with a larger pattern than the first layer using photoresist, and a soft magnetic film 2N1 is selectively formed.
By peeling off the photoresist, it is possible to obtain a magnetic pole shape with a gentle stepped portion. This provides sufficient step coverage of the gag forming material in the subsequent process.

Furthermore, since the photoresist is formed on the same surface, it is possible to prevent pattern accuracy from deteriorating due to multi-layered magnetic poles of the thin film head.

As described above, the present invention makes it possible to compensate for the drawbacks of the prior art and improve the productivity of thin film magnetic heads.

〔Example〕

An example of forming the lower magnetic pole shown in FIG. 4 will be described below.

A 10 μm thick Altos R layer 42 is formed on the Al2O, -TiC substrate 41 by Rf sputtering.

Furthermore, by Rf sputtering, 1oooA permalloy (8
A 1% Ni) film 43 is formed to serve as a plating conductive film. Fifth
The shape shown in FIG. 31 is rehashed using photoresist, and permalloy plating (81% Ni) f 2μ is applied to form a soft magnetic layer 45.

After peeling off the photoresist, the shape shown in Figure 3 32 is
It is made of photoresist, permalloy plated to a thickness of 2μ, and 47 soft magnetic layer lower magnetic poles are obtained by peeling off the photoresist and peeling off the plated conductive film.

It was confirmed that the magnetic pole step shape obtained through the above steps had a gentle shape as shown in FIG.

Further, in order to form a gag, an Al*Os total 0.7 μRf spatula was used, and it was confirmed that the film was formed uniformly on the step.

〔Effect of the invention〕

As described above, according to the present invention, the stepped shape of the magnetic pole of a thin-film magnetic head is improved without using any special equipment, and the cross-sectional shape as shown in FIG. It has become possible to obtain a thin-film magnetic head having the following characteristics, and the industrial value of its production can be said to be extremely large.

[Brief explanation of drawings]

FIG. 1 is a schematic cross-sectional view of the lower magnetic pole of a thin-film magnetic head obtained by the present invention, FIG. 2 is a schematic cross-sectional view of the lower magnetic pole of a conventional thin-film magnetic head, and FIG. 3 is a schematic diagram of the shape of the lower magnetic pole used in the example. 4(a) to 4(e) are process diagrams explaining the present invention, and FIGS. 1, 2, and 4(a) to 4(e) are taken along the line AA' in FIG. FIG. In the figure, 11, 21, 11... substrate, 12°25,
t 5,22,4241#i,Qs,15,23°45
・Lower Shigoku 1st layer permalloy, 14,24°47・・
Lower magnetic pole second layer permalloy, 44.46...photoresist, 43...permalloy sputtered film, 51...
1st layer of the lower magnetic pole, 52... 2nd layer of the lower magnetic pole Figure 1 1

Claims (1)

[Claims] A method for manufacturing a thin film magnetic head, characterized in that when two or more layers each of an upper magnetic pole and a lower magnetic pole are stacked in the thin film magnetic head, the planar shape of the lower layer is smaller than the planar shape of the upper layer in the magnetic pole shape.