JPS61178711A - Thin film magnetic head - Google Patents

Thin film magnetic head

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Publication number
JPS61178711A
JPS61178711A JP2051585A JP2051585A JPS61178711A JP S61178711 A JPS61178711 A JP S61178711A JP 2051585 A JP2051585 A JP 2051585A JP 2051585 A JP2051585 A JP 2051585A JP S61178711 A JPS61178711 A JP S61178711A
Authority
JP
Japan
Prior art keywords
magnetic
thin film
magnetic core
film
film magnetic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2051585A
Other languages
Japanese (ja)
Other versions
JP2551749B2 (en
Inventor
Kazuhiro Sato
和洋 佐藤
Hideji Orihara
秀治 折原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Victor Company of Japan Ltd
Original Assignee
Victor Company of Japan Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Victor Company of Japan Ltd filed Critical Victor Company of Japan Ltd
Priority to JP60020515A priority Critical patent/JP2551749B2/en
Publication of JPS61178711A publication Critical patent/JPS61178711A/en
Application granted granted Critical
Publication of JP2551749B2 publication Critical patent/JP2551749B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

PURPOSE:To cause a structure which can easily make a magnetic core into a multilayer and to form a thin film magnetic head with high recording efficiency by constituting a thin film core in such away that a thin film magnetic core film and a thin film conductive coil are embedded in the prescribed groove part (removal part) drilled on a nonmagnetic insulating film. CONSTITUTION:A nonmagnetic electric insulating material 3 made of glass etc., lies on the groove part 2 of the magnetic substrate 1, and a coil conductor 4 is embedded on the surface of said material 3. On the entire surface of the substrate 1 a nonmagnetic electric insulating film 5 is piled up, and some part of said film 5 (part where the coil conductor 4 is embedded) is removed as a magnetic core part 6 and a through hole part 7. Then the latter 7 is masked to pile up a nonmagnetic electrical insulating film 8, and thereon a metallic magnetic film 9 is accumulated (namely, it is embedded as the magnetic core part 6 in the removed part) and ground up to a line A-A'. The nonmagnetic electric insulating film 5 can remove a part becoming the magnetic core part 6 by the appropriate taper angle.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は薄膜磁気ヘッドに係り、特に磁性基板と薄膜磁
気コア(磁性薄膜コア)とにより磁気回路を形成し、前
記磁性薄膜コアに薄膜導体コイルを捲線してなる磁気銹
導型薄膜磁気ヘッド、特にディジタル磁気記録再生に用
いる多トラツク磁気ヘッドに関する。
Detailed Description of the Invention (Field of Industrial Application) The present invention relates to a thin film magnetic head, and in particular, a magnetic circuit is formed by a magnetic substrate and a thin film magnetic core (magnetic thin film core), and a thin film conductor is attached to the magnetic thin film core. The present invention relates to a magnetic thin film magnetic head formed by winding a coil, and particularly to a multi-track magnetic head used for digital magnetic recording and reproduction.

(従来の技術とその問題点) 近年、ディジタル磁気記録再生システムの高密度化の!
!請に沿って、従来のICプロセス技術、特に蒸着、ス
パッタリング、CVO<ケミカル・ベーパ・デポジショ
ン)などのWI膜作成技術とドライエツチングなどの微
細加工技術を用いた薄膜磁気ヘッドが注目され、一部に
は実用化されている。
(Conventional technology and its problems) In recent years, the density of digital magnetic recording and reproducing systems has increased!
! In line with this trend, thin-film magnetic heads using conventional IC process technologies, especially WI film fabrication technologies such as evaporation, sputtering, and CVO (Chemical Vapor Deposition), and microfabrication technologies such as dry etching, have been attracting attention and are rapidly gaining attention. It has been put into practical use in some areas.

このi’ig!磁気ヘッドは、従来のモノリシック型磁
気ヘッドに比して狭トラツク化、多トラツク化が可能で
あり、又記録漏洩磁束が急峻で、短波長の記録特性に優
れているのでa@度化に適している。また更に、生産性
においても、ウェハー・プロセスをもちいるので量産性
に優れた均質な磁気ヘッドを提供することができる。こ
のような理由から、例えば、オーディオPCM録音用の
磁気ヘッドとして多素子磁気ヘッドが用いられており、
記録用として磁気誘導型ii!膜磁気ヘッドを用い、又
再生用として磁気抵抗型f111!磁気ヘッドが用いら
れている。
This i'ig! Compared to conventional monolithic magnetic heads, the magnetic head can have narrower tracks and more tracks, has steep recording leakage flux, and has excellent short wavelength recording characteristics, making it suitable for use in ing. Furthermore, in terms of productivity, since a wafer process is used, a homogeneous magnetic head with excellent mass productivity can be provided. For these reasons, for example, multi-element magnetic heads are used as magnetic heads for audio PCM recording.
Magnetic induction type II for recording! A film magnetic head is used, and a magnetoresistive type f111! is used for reproduction. A magnetic head is used.

従来の記録用薄膜磁気ヘッドは、平面に1〜2層の金属
導体をスパイラル状にバターニングしたものであり、ト
ラック・ピッチと加工上の制限から、捲線数を多くする
ことが出来ず、従って、記録電流が大きくなり、放熱が
回能でIC回路との結合も難しく、同時に誘導起電圧も
小さいので、再生ヘッドは別の原理を用いた、全く別の
プロセスによる薄Ill fa気ヘッドとなっていた。
Conventional thin-film recording magnetic heads are made by patterning one or two layers of metal conductor into a spiral pattern on a flat surface, and due to track pitch and processing limitations, it is not possible to increase the number of windings. , recording current is large, heat dissipation is slow, coupling with IC circuit is difficult, and at the same time induced electromotive force is small, so the reproducing head becomes a thin Illfa head using a different principle and a completely different process. was.

一方、捲線数を大とすることのできる捲線構造の薄膜磁
気ヘッドとしては、1ilW41i1気コアの上部と下
部に1111導体コイルをそれぞれ電気絶縁膜を介して
バターニングするもので、この構造(以下、立体ヘリカ
ル型と称する)では、平面スパイラル型のIF!線構造
に比して、m線数はトラック・ピッチに制限されないの
で、平面スパイラル型が、約10巻(ターン)以下であ
ったのに比し、数10〜数1000ターンが可能であり
、磁気誘導型で微小記録m流で記録可能で、かつ再生出
力も大きいので同一プロセスによって記録再生ヘッドが
できる。
On the other hand, a thin film magnetic head with a winding structure that can increase the number of windings is one in which 1111 conductor coils are patterned on the upper and lower parts of a 1ilW41i1 core through electrical insulation films, and this structure (hereinafter referred to as (referred to as a three-dimensional helical type), a planar spiral type IF! Compared to the wire structure, the number of m-wires is not limited by the track pitch, so it is possible to have several tens to several thousand turns, compared to about 10 turns or less in the flat spiral type. Since it is of the magnetic induction type and can record with a minute recording current, and has a large reproduction output, a recording/reproduction head can be made using the same process.

ところが、上記のような従来のsmm気ヘッドは、次の
ような問題点がある。
However, the conventional SMM head as described above has the following problems.

■fil膜磁気コアの断面積が小さいので、薄膜導体コ
イルによって、記録ギャップに十分な磁束を与えること
ができず、従って、記録レベルが小さい。
(2) Since the cross-sectional area of the fil film magnetic core is small, sufficient magnetic flux cannot be applied to the recording gap by the thin film conductor coil, and therefore the recording level is small.

■また、同様に#膜磁気コアの捲線部の磁気抵抗が高い
ので、十分な再生出力が得られない。
(2) Similarly, since the magnetic resistance of the winding portion of the # film magnetic core is high, sufficient reproduction output cannot be obtained.

■磁性膜のエツチング再現性が小さく、歩留りが小さい
■Etching reproducibility of magnetic film is low and yield is low.

■段差配線部で配線切れが生じ、歩留りが小さい。■Wiring breakage occurs at stepped wiring sections, resulting in low yield.

そこで、本発明は上記の従来の技術の問題点を解決して
、薄膜磁気コアの捲線部の断面積が大になり、しかも歩
留りの大きいi1m!磁気ヘッドを提供することを目的
とする。
Therefore, the present invention solves the above-mentioned problems of the conventional technology, and the cross-sectional area of the winding portion of the thin film magnetic core is increased, and the yield is high. The purpose is to provide a magnetic head.

(問題点を解決するための手段及び作用)本発明は上記
の目的を達成するために、1m膜磁気コアを、従来のよ
うに磁気コア膜をエツチングすることによって形成する
のではなく、非磁性絶縁膜に施した所定の溝部(除去部
)に、薄膜磁気コア膜及び薄膜導体コイルを埋め込んで
構成することにより、膜堆積及び加工面が常に段差の小
さい平面にでき、従って、磁気コアの多層化が容易な構
造になり、それによって、磁気コアの、待に捲線部の断
面積が大になり記録効率の良い薄膜磁気ヘッドを提供す
るものである。
(Means and effects for solving the problems) In order to achieve the above object, the present invention forms a 1 m film magnetic core by using a non-magnetic film instead of etching the magnetic core film as in the conventional method. By embedding a thin film magnetic core film and a thin film conductor coil in a predetermined groove (removed part) formed in an insulating film, the film deposition and processing surface can always be flat with small steps, and therefore the multilayer magnetic core can be The present invention provides a thin-film magnetic head that has a structure that is easy to convert, thereby increasing the cross-sectional area of the winding portion of the magnetic core and providing high recording efficiency.

(実 施 例) 本発明になる簿膜磁気ヘッドの第1の実施例について、
以下に図面と共に説明する。
(Example) Regarding the first example of the film magnetic head according to the present invention,
This will be explained below along with the drawings.

第1図〜第8図は本発明になる薄膜磁気ヘッドの第1の
実施例を説明するための図である。
1 to 8 are diagrams for explaining a first embodiment of a thin film magnetic head according to the present invention.

第1図及び第2図において、磁気!!板1の溝部2には
ガラス等の非磁性電気絶縁材料3があり、その表面には
コイル導体4が埋め込まれている。
In Figures 1 and 2, magnetic! ! A non-magnetic electrically insulating material 3 such as glass is provided in the groove 2 of the plate 1, and a coil conductor 4 is embedded in the surface thereof.

更に、この基板1の全面に、Si 02.3i Nなど
の非磁性電気絶縁!s5を、M着、スパッタリング、あ
るいはCVO<ケミカル・ベーパ・デポジション)など
の形成手段により滞積させ、その後、非磁性電気絶縁膜
5の一部(前記のコイル導体4を埋め込んだ部分)を、
磁気コア部6及びスルー・ホール部7として、フォト・
リソグラフィやドライ・エツチング技術等を用いて除去
する。
Furthermore, the entire surface of this substrate 1 is coated with non-magnetic electrical insulation such as Si 02.3i N! s5 is accumulated by a forming method such as M deposition, sputtering, or CVO (chemical vapor deposition), and then a part of the nonmagnetic electrical insulating film 5 (the part where the coil conductor 4 is buried) is deposited. ,
As the magnetic core part 6 and through hole part 7, photo
It is removed using lithography, dry etching technology, etc.

次に、第3図に示すように、第2図示のスルー・ホール
部7をマスキングして、ギャップ長となる厚さの分だけ
Aj 203.Si 02などの非磁性型気絶1i11
Bを1WliL、、その上に更に、パーマロイなどの金
属磁性膜9を滞積しくすなわち、前記の磁気コア部6と
して除去した部分に埋め込むン、その後、第3図のA−
A’線まで研磨する。第4図は上記で説明したようにし
て最終的に研磨した基板の表面を示す斜視図であり、同
図中、7aはスルー・ホール部7の研磨面、9aは金属
磁性膜9の研磨面である。
Next, as shown in FIG. 3, the through hole portion 7 shown in FIG. 2 is masked, and Aj 203. Non-magnetic type stun 1i11 such as Si 02
A metal magnetic film 9 made of permalloy or the like is then buried in the portion that was removed as the magnetic core portion 6, and then, as shown in FIG.
Polish to line A'. FIG. 4 is a perspective view showing the surface of the substrate finally polished as explained above, in which 7a is the polished surface of the through-hole portion 7, and 9a is the polished surface of the metal magnetic film 9. It is.

第5図は第4図のB−8’線における断面図、第6図は
第4図のc−c’線における断面図をそれぞれ示したも
のであり、この第6図は磁気ヘッドを構成した時の磁気
テープ摺動面から見た記録ギャップ近傍の形状を示して
いる。
5 is a sectional view taken along line B-8' in FIG. 4, and FIG. 6 is a sectional view taken along line cc' in FIG. 4. This figure shows the structure of the magnetic head. The figure shows the shape of the vicinity of the recording gap when viewed from the magnetic tape sliding surface.

第5図及び第6図に示すように、s+ 02などよりな
る非磁性電気絶縁膜5は、磁気コア部6の部分の断面形
状から明らかなように、磁気コア部6となる部分を異方
性プラズマ・エツチング等の手段により適当なテーバ角
(図では、磁気コア部6が逆台形状になっている)をも
って除去できる。
As shown in FIGS. 5 and 6, the nonmagnetic electrical insulating film 5 made of s+02 or the like has an anisotropic shape in the portion that will become the magnetic core portion 6, as is clear from the cross-sectional shape of the magnetic core portion 6. The magnetic core 6 can be removed at an appropriate Taber angle (in the figure, the magnetic core 6 has an inverted trapezoidal shape) by means such as plasma etching.

また、第4図に示すように、ここまでの製造プロセスで
は表面に段差のない平面の基板が得られるので、その上
に同様の製造プロセスを繰り返すことができ、その場合
の第6図に相当する断面図を第7図に示す。
In addition, as shown in Figure 4, the manufacturing process up to this point yields a flat substrate with no steps on the surface, so the same manufacturing process can be repeated on it, and in that case, Figure 6 corresponds to A cross-sectional view is shown in FIG.

第7図は上記と同様の製造プロセスを3回繰り返して3
層の磁気コア部6.6’ 、6″を形成した場合を示す
ものであるが、その際、非磁性電気絶縁15.5’ 、
5”のそれぞれの磁気コア部6゜5/、5//となる部
分の除去を、上記のように異方性プラズマ・エツチング
により、テーバ角をもたせた方法に基づいて行なうこと
が型費である。
Figure 7 shows the same manufacturing process as above repeated three times.
This figure shows the case where the magnetic core portions 6.6', 6'' of the layers are formed, and in this case, the non-magnetic electrical insulation 15.5',
It is possible to remove the portions of the 5" magnetic core parts 6°5/, 5// based on the method of creating a Taber angle using anisotropic plasma etching as described above, which reduces mold costs. be.

そして、第7図において、磁気コア部6のエツチング底
面幅W1は、常にエツチング上面幅W2に比して小さい
ので、磁気コア部6となるパーマロイなどの金属磁性膜
の層が、その研磨面10及び11において、非磁性電気
絶縁膜5′及び5″のストッパとなり、よって、エツチ
ングは、この面において完全に終了する。従って、オー
バ・エツチングによるウェハーの゛破壊は生じない。
In FIG. 7, the etched bottom width W1 of the magnetic core portion 6 is always smaller than the etched top width W2, so that the layer of metal magnetic film such as permalloy that becomes the magnetic core portion 6 is and 11 serve as stoppers for the non-magnetic electrical insulating films 5' and 5'', and etching is therefore completely completed on these surfaces.Therefore, no damage to the wafer due to over-etching occurs.

第8図は、第7図のような3層の磁気コア部(14i気
コア説)6.6’ 、6”を有する基板の上にコイル部
及びリード部(引出線)を形成したウェハーの一部を示
す斜視図である。同図に示すように、非磁性電気絶縁膜
5 (5’ 、5“)の上に絶縁層12を介してコイル
導体(上部コイル導体)13及びリード部14をsl!
堆積し、更にバターニングして形成する。そして、スル
ー・ホール部7によってコイル導体(下部コイル導体)
4(第1図〜第3図に示す)とコイル導体(上部コイル
導体)13及びリード部14が電気的に接続(導通)さ
れる。
Figure 8 shows a wafer in which coil parts and lead parts (outgoing wires) are formed on a substrate having a three-layer magnetic core part (14i core theory) 6.6', 6'' as shown in Fig. 7. FIG. 2 is a perspective view showing a part of the coil conductor (upper coil conductor) 13 and the lead portion 14 on the non-magnetic electrical insulating film 5 (5', 5'') via the insulating layer 12. sl!
It is formed by depositing and further buttering. Then, the coil conductor (lower coil conductor) is connected by the through hole part 7.
4 (shown in FIGS. 1 to 3), the coil conductor (upper coil conductor) 13, and the lead portion 14 are electrically connected (conducted).

次に、本発明の第2の実施例について説明する。Next, a second embodiment of the present invention will be described.

第9図及び第10図は本発明になる薄膜磁気ヘッドの第
2の実施例を説明するための図である。なお、前出の図
と同一部分には同一符号を付して、その説明を省略する
FIGS. 9 and 10 are diagrams for explaining a second embodiment of the thin film magnetic head according to the present invention. Note that the same parts as those in the previous figure are given the same reference numerals, and the explanation thereof will be omitted.

第9図は記録ギャップを構成する磁性材料を飽和磁束密
度の大なる金属磁性膜で構成したものである。すなわち
、この実施例の場合には第111の磁気コア部を記録ギ
ャップ部61とコイル捲線部62とに分離し、第2層の
磁気コア部63を堆積する前に、ギャップとなる絶縁層
15を形成しておく。そして、前記と同様にして、この
第2層63及び第3層6″を形成し、更にコイル導体(
上部コイル導体)13及びリード部(図示せず)を形成
する。
In FIG. 9, the magnetic material constituting the recording gap is a metal magnetic film having a high saturation magnetic flux density. That is, in the case of this embodiment, the 111th magnetic core section is separated into the recording gap section 61 and the coil winding section 62, and before depositing the second layer of the magnetic core section 63, the insulating layer 15 serving as the gap is separated. Form it. Then, in the same manner as above, the second layer 63 and the third layer 6'' are formed, and the coil conductor (
An upper coil conductor) 13 and a lead portion (not shown) are formed.

このように構成することにより、第9図のD−D′線に
おける断面図を示すと共に記録ギャップ部の近傍の断面
図でもある第10図のように、隣接トラックと磁気的に
良く分離された薄膜磁気ヘッドが得られる。
With this configuration, as shown in FIG. 10, which shows a cross-sectional view taken along the line D-D' in FIG. A thin film magnetic head is obtained.

第11図及び第12図は本発明の第3の実施例を説明す
るための図である。な43.前出の図と同一部分には同
一符号を付して、その説明を省略する。
FIGS. 11 and 12 are diagrams for explaining a third embodiment of the present invention. 43. The same parts as those in the previous figure are given the same reference numerals, and the explanation thereof will be omitted.

この実施例では、前記の第2層及び第311の非磁性電
気絶縁1151.52を除去する際に、第11図に示す
ように、磁気コア部となる部分の除去パターンを前記の
実施例のものと変えて、磁気ヘッドのテープ摺動面(第
11図のE−E’線における断面)における磁気コア部
の断面積を小さくして、もって記録効率を向上させたも
のである。
In this embodiment, when removing the second layer and the 311th non-magnetic electrical insulator 1151.52, the removal pattern of the portion that will become the magnetic core portion is changed from that of the above embodiment, as shown in FIG. Instead, the cross-sectional area of the magnetic core on the tape sliding surface of the magnetic head (cross section taken along line EE' in FIG. 11) is reduced, thereby improving recording efficiency.

すなわち、第1層の磁気コア部61と第2INの磁気コ
ア部6′だけがテープ摺動面(E−E’線)となるよう
にし、第3!!lの磁気コア部6″はテープ摺動面にな
らないよう第3層の磁気コア部6″の形成位置を変える
。なお、第11図では寿命寸法を規定するために非磁性
膜16を付加しである。
That is, only the magnetic core part 61 of the first layer and the magnetic core part 6' of the second IN are made to be the tape sliding surface (line E-E'), and the third! ! The formation position of the third layer magnetic core portion 6'' is changed so that the third layer magnetic core portion 6'' does not become the tape sliding surface. In addition, in FIG. 11, a nonmagnetic film 16 is added in order to define the life dimension.

また、第12図は第11図のE−E’線における断面図
である。
Moreover, FIG. 12 is a sectional view taken along the line EE' in FIG. 11.

なお、以上の説明は、金属磁性膜がJ!線ココイル一部
を兼ねるような構成で行なったが、磁気的に、及びコイ
ル抵抗値の関係から別の製造プロセスによったものでも
良く、これらは本発明の内容を規定するものではない。
Note that the above explanation is based on the case where the metal magnetic film is J! Although the structure is such that it also serves as a part of the wire cocoil, other manufacturing processes may be used in view of magnetic and coil resistance values, and these do not define the content of the present invention.

以上のように本発明の実施例によれば、■sm磁気コア
のmva部の断面積が大きくなるので、記録再生効率が
良いヘッドが得られる。
As described above, according to the embodiment of the present invention, since the cross-sectional area of the mva portion of the sm magnetic core is increased, a head with good recording and reproducing efficiency can be obtained.

■非磁性電気絶縁膜の磁気コア部の部分やスルー・ホー
ル部を除去するためのフォト・リソグラフィやエツチン
グ等の処理は、段差の小さい平面(基板面)で行なわれ
るので、段差部での断線などの問題がない。
■Processes such as photolithography and etching to remove the magnetic core part and through-hole part of the non-magnetic electrical insulating film are performed on a flat surface (substrate surface) with small steps, so disconnections at steps may occur. There are no such problems.

■磁性体の形状を決めるのに、磁性膜のエツチングでは
なく、5i02などの絶縁物を精度の良いプラズマ・エ
ツチング等しているので、磁性体のエツヂフグ時に生じ
る下地ス1〜ツバあるいは異常エツチングなどによるパ
ターン乱れ、欠損などの問題がなくなり歩留りが向上す
る。
■To determine the shape of the magnetic material, we do not etch the magnetic film, but perform precise plasma etching of the insulator such as 5i02, so there may be problems such as underlayer spots or abnormal etching that occur when etching the magnetic material. This eliminates problems such as pattern disturbances and defects, and improves yield.

■薄膜磁気コアを多層構造にしていることにより、記録
ギャップ先端を絞れるようになるので、記録効率が良い
■The multilayer structure of the thin-film magnetic core makes it possible to narrow the tip of the recording gap, resulting in good recording efficiency.

■金aSによって記録ギャップを構成しているので、記
録効率が良い。
■Since the recording gap is made of gold aS, recording efficiency is good.

(発明の効果) 以上の如く、本発明の薄膜磁気ヘッドによれば、次のよ
うな特長を有する。
(Effects of the Invention) As described above, the thin film magnetic head of the present invention has the following features.

■薄膜磁気コアの捲線部の断面積が大きくなるので、記
録再生効率が良い。
■Since the cross-sectional area of the winding portion of the thin-film magnetic core is large, recording and reproducing efficiency is good.

■fi11磁気コアを多層構造にしていることにより、
記録ギャップ先端を絞れるようになるので、記録効率が
良い。
■By making the fi11 magnetic core a multilayer structure,
Since the leading edge of the recording gap can be narrowed down, recording efficiency is improved.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図〜第8図は本発明になるl膜磁気ヘッドの第1の
実施例を説明するための図であり、第1図及び第3図は
jllの実施例の要部の側断面図、第2図及び第4図は
第1の実施例の斜視図、@5図は第4図のB−8’線に
おける断面図、第6図は第4図のc−c’線における断
面図、第7図は第6図に相当する断面の後の製造プロセ
スの状態を示す断面図、第8図は第1の実施例の最終的
な状態を示す斜視図である。 第9図及び第10図は本発明になる5inW1気ヘツド
の第2の実施例を説明するための図であり、第9図は第
2の実施例の要部の側断面図、第10図は第9図のD−
D’線における断面図である。 第11図及び第12図は本発明になる薄膜磁気ヘッドの
第3の実施例を説明するための図であり、第11図はj
I3の実施例の要部の側断面図、第12図は第11図の
E−E’線における断面図である。 1・・・磁性基板、2・・・溝部、 3・・・非磁性電気絶縁材料、4・・・コイル導体、5
、5’ 、 5” 、 51.52・・・非磁性電気絶
縁膜、6、6’ 、 6” 、 61.62.63・・
・磁気コア部、7・・・スルー・ホール部、 7a・・・スルー・ホール部7の研磨面、8・・・非磁
性電気絶縁膜、9、・・・金属磁性膜、9a・・・金属
磁性膜9の研磨面、 10、11・・・研lI面、12・・・絶縁層、13・
・・コイル導体、14・・・リード部、15.16・・
・絶縁層。 p T q 目 6′ 才10 邑 ’7 12 15
1 to 8 are diagrams for explaining the first embodiment of the l-film magnetic head according to the present invention, and FIGS. 1 and 3 are side sectional views of the main parts of the embodiment of jll. , Figures 2 and 4 are perspective views of the first embodiment, Figure @5 is a cross-sectional view taken along line B-8' in Figure 4, and Figure 6 is a cross-sectional view taken along line c-c' in Figure 4. 7 is a sectional view showing the state of the manufacturing process after the cross section corresponding to FIG. 6, and FIG. 8 is a perspective view showing the final state of the first embodiment. 9 and 10 are diagrams for explaining a second embodiment of the 5inW1 air head according to the present invention, FIG. 9 is a side sectional view of the main part of the second embodiment, and FIG. is D- in Figure 9.
It is a sectional view taken along D' line. 11 and 12 are diagrams for explaining the third embodiment of the thin film magnetic head according to the present invention, and FIG.
FIG. 12 is a side sectional view of a main part of the embodiment I3, and FIG. 12 is a sectional view taken along line EE' in FIG. DESCRIPTION OF SYMBOLS 1...Magnetic board, 2...Groove part, 3...Nonmagnetic electric insulating material, 4...Coil conductor, 5
, 5', 5", 51.52...Nonmagnetic electrical insulating film, 6, 6', 6", 61.62.63...
- Magnetic core part, 7... Through hole part, 7a... Polished surface of through hole part 7, 8... Nonmagnetic electrical insulating film, 9... Metal magnetic film, 9a... Polished surface of metal magnetic film 9, 10, 11... Polished II surface, 12... Insulating layer, 13.
...Coil conductor, 14...Lead part, 15.16...
・Insulating layer. p T q 6' 10 傑7 12 15

Claims (4)

【特許請求の範囲】[Claims] (1)磁気基板と薄膜磁気コアとにより磁気回路を形成
し、前記薄膜磁気コアに薄膜導体を捲線してなる薄膜磁
気ヘッドにおいて、前記磁気基板上に設けた非磁性絶縁
膜の所定の除去部に、薄膜磁気コア及び薄膜導体コイル
を埋め込んで構成したことを特徴とする薄膜磁気ヘッド
(1) In a thin film magnetic head in which a magnetic circuit is formed by a magnetic substrate and a thin film magnetic core, and a thin film conductor is wound around the thin film magnetic core, a predetermined removed portion of a nonmagnetic insulating film provided on the magnetic substrate is provided. A thin film magnetic head comprising a thin film magnetic core and a thin film conductor coil embedded therein.
(2)前記薄膜磁気コアを少なくとも2層以上に形成し
、そのうち前記磁気基板側の1層をヘッド先端部とコイ
ル捲線部とに分離して構成したことを特徴とする特許請
求の範囲第1項記載の薄膜磁気ヘッド。
(2) The thin film magnetic core is formed in at least two layers, of which one layer on the magnetic substrate side is separated into a head tip portion and a coil winding portion. The thin film magnetic head described in Section 1.
(3)前記薄膜磁気コアを少なくとも2層以上に形成し
、前記薄膜磁気コアの磁気テープ摺動面における層の数
がコイル捲線部における層の数よりも小さくなるよう構
成したことを特徴とする特許請求の範囲第1項記載の薄
膜磁気ヘッド。
(3) The thin film magnetic core is formed in at least two layers, and the number of layers on the magnetic tape sliding surface of the thin film magnetic core is smaller than the number of layers on the coil winding portion. A thin film magnetic head according to claim 1.
(4)前記各薄膜磁気コアの磁気テープ摺動面における
断面形状が、各々逆台形状となるよう構成したことを特
徴する特許請求の範囲第1項記載の薄膜磁気ヘッド。
(4) The thin-film magnetic head according to claim 1, wherein each of the thin-film magnetic cores has an inverted trapezoidal cross-sectional shape on the magnetic tape sliding surface.
JP60020515A 1985-02-05 1985-02-05 Method of manufacturing thin film magnetic head Expired - Lifetime JP2551749B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60020515A JP2551749B2 (en) 1985-02-05 1985-02-05 Method of manufacturing thin film magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60020515A JP2551749B2 (en) 1985-02-05 1985-02-05 Method of manufacturing thin film magnetic head

Publications (2)

Publication Number Publication Date
JPS61178711A true JPS61178711A (en) 1986-08-11
JP2551749B2 JP2551749B2 (en) 1996-11-06

Family

ID=12029290

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60020515A Expired - Lifetime JP2551749B2 (en) 1985-02-05 1985-02-05 Method of manufacturing thin film magnetic head

Country Status (1)

Country Link
JP (1) JP2551749B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0614173A2 (en) * 1993-03-02 1994-09-07 Sony Corporation Magnetic head and method for manufacture thereof

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55128227U (en) * 1979-03-05 1980-09-10
JPS57113409A (en) * 1980-12-30 1982-07-14 Comput Basic Mach Technol Res Assoc Thin-film head

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55128227U (en) * 1979-03-05 1980-09-10
JPS57113409A (en) * 1980-12-30 1982-07-14 Comput Basic Mach Technol Res Assoc Thin-film head

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0614173A2 (en) * 1993-03-02 1994-09-07 Sony Corporation Magnetic head and method for manufacture thereof
EP0614173A3 (en) * 1993-03-02 1995-01-11 Sony Corp Magnetic head and method for manufacture thereof.

Also Published As

Publication number Publication date
JP2551749B2 (en) 1996-11-06

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