JPS61255025A - 欠陥検査用ウエハマスク材 - Google Patents

欠陥検査用ウエハマスク材

Info

Publication number
JPS61255025A
JPS61255025A JP60098518A JP9851885A JPS61255025A JP S61255025 A JPS61255025 A JP S61255025A JP 60098518 A JP60098518 A JP 60098518A JP 9851885 A JP9851885 A JP 9851885A JP S61255025 A JPS61255025 A JP S61255025A
Authority
JP
Japan
Prior art keywords
masking material
transparent substrate
substrate
etching
silicide film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60098518A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0528823B2 (cg-RX-API-DMAC10.html
Inventor
Shuichi Matsuda
修一 松田
Yaichiro Watakabe
渡壁　弥一郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP60098518A priority Critical patent/JPS61255025A/ja
Publication of JPS61255025A publication Critical patent/JPS61255025A/ja
Publication of JPH0528823B2 publication Critical patent/JPH0528823B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP60098518A 1985-05-07 1985-05-07 欠陥検査用ウエハマスク材 Granted JPS61255025A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60098518A JPS61255025A (ja) 1985-05-07 1985-05-07 欠陥検査用ウエハマスク材

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60098518A JPS61255025A (ja) 1985-05-07 1985-05-07 欠陥検査用ウエハマスク材

Publications (2)

Publication Number Publication Date
JPS61255025A true JPS61255025A (ja) 1986-11-12
JPH0528823B2 JPH0528823B2 (cg-RX-API-DMAC10.html) 1993-04-27

Family

ID=14221869

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60098518A Granted JPS61255025A (ja) 1985-05-07 1985-05-07 欠陥検査用ウエハマスク材

Country Status (1)

Country Link
JP (1) JPS61255025A (cg-RX-API-DMAC10.html)

Also Published As

Publication number Publication date
JPH0528823B2 (cg-RX-API-DMAC10.html) 1993-04-27

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