JPS61250928A - ガスフエ−ズイオン源 - Google Patents

ガスフエ−ズイオン源

Info

Publication number
JPS61250928A
JPS61250928A JP60091830A JP9183085A JPS61250928A JP S61250928 A JPS61250928 A JP S61250928A JP 60091830 A JP60091830 A JP 60091830A JP 9183085 A JP9183085 A JP 9183085A JP S61250928 A JPS61250928 A JP S61250928A
Authority
JP
Japan
Prior art keywords
emitter
container
ion source
high voltage
lead
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60091830A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0374454B2 (enrdf_load_stackoverflow
Inventor
Yoshizo Sakuma
佐久間　美三
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd filed Critical Jeol Ltd
Priority to JP60091830A priority Critical patent/JPS61250928A/ja
Publication of JPS61250928A publication Critical patent/JPS61250928A/ja
Publication of JPH0374454B2 publication Critical patent/JPH0374454B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/26—Ion sources; Ion guns using surface ionisation, e.g. field effect ion sources, thermionic ion sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/022—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/08—Ion sources
    • H01J2237/0802—Field ionization sources
    • H01J2237/0807—Gas field ion sources [GFIS]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
JP60091830A 1985-04-27 1985-04-27 ガスフエ−ズイオン源 Granted JPS61250928A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60091830A JPS61250928A (ja) 1985-04-27 1985-04-27 ガスフエ−ズイオン源

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60091830A JPS61250928A (ja) 1985-04-27 1985-04-27 ガスフエ−ズイオン源

Publications (2)

Publication Number Publication Date
JPS61250928A true JPS61250928A (ja) 1986-11-08
JPH0374454B2 JPH0374454B2 (enrdf_load_stackoverflow) 1991-11-27

Family

ID=14037518

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60091830A Granted JPS61250928A (ja) 1985-04-27 1985-04-27 ガスフエ−ズイオン源

Country Status (1)

Country Link
JP (1) JPS61250928A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007117850A (ja) * 2005-10-26 2007-05-17 Bruker Daltonics Kk 質量分析用試料スプレー装置
WO2010082466A1 (ja) * 2009-01-15 2010-07-22 株式会社日立ハイテクノロジーズ イオンビーム装置
JP2012142292A (ja) * 2005-12-02 2012-07-26 Arisu Corporation:Kk イオン源、システム及び方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5097823B2 (ja) 2008-06-05 2012-12-12 株式会社日立ハイテクノロジーズ イオンビーム装置

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007117850A (ja) * 2005-10-26 2007-05-17 Bruker Daltonics Kk 質量分析用試料スプレー装置
JP2012142292A (ja) * 2005-12-02 2012-07-26 Arisu Corporation:Kk イオン源、システム及び方法
WO2010082466A1 (ja) * 2009-01-15 2010-07-22 株式会社日立ハイテクノロジーズ イオンビーム装置
US8263943B2 (en) 2009-01-15 2012-09-11 Hitachi High-Technologies Corporation Ion beam device
JP5194133B2 (ja) * 2009-01-15 2013-05-08 株式会社日立ハイテクノロジーズ イオンビーム装置
US8563944B2 (en) 2009-01-15 2013-10-22 Hitachi High-Technologies Corporation Ion beam device
JP2014135291A (ja) * 2009-01-15 2014-07-24 Hitachi High-Technologies Corp イオンビーム装置

Also Published As

Publication number Publication date
JPH0374454B2 (enrdf_load_stackoverflow) 1991-11-27

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