JPH0374454B2 - - Google Patents
Info
- Publication number
- JPH0374454B2 JPH0374454B2 JP60091830A JP9183085A JPH0374454B2 JP H0374454 B2 JPH0374454 B2 JP H0374454B2 JP 60091830 A JP60091830 A JP 60091830A JP 9183085 A JP9183085 A JP 9183085A JP H0374454 B2 JPH0374454 B2 JP H0374454B2
- Authority
- JP
- Japan
- Prior art keywords
- emitter
- container
- extraction electrode
- high voltage
- tip
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000605 extraction Methods 0.000 claims description 27
- 239000003507 refrigerant Substances 0.000 claims description 15
- 230000005684 electric field Effects 0.000 claims description 11
- 238000001816 cooling Methods 0.000 claims description 5
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims description 3
- 239000001307 helium Substances 0.000 description 16
- 229910052734 helium Inorganic materials 0.000 description 16
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 15
- 239000007789 gas Substances 0.000 description 14
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 14
- 239000007788 liquid Substances 0.000 description 13
- 239000002184 metal Substances 0.000 description 9
- 229910052751 metal Inorganic materials 0.000 description 9
- 230000001133 acceleration Effects 0.000 description 8
- 150000002500 ions Chemical class 0.000 description 8
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- 238000010884 ion-beam technique Methods 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 239000012212 insulator Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 229910001873 dinitrogen Inorganic materials 0.000 description 3
- 239000004677 Nylon Substances 0.000 description 2
- 239000002826 coolant Substances 0.000 description 2
- -1 helium ions Chemical group 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 229920001778 nylon Polymers 0.000 description 2
- 239000002470 thermal conductor Substances 0.000 description 2
- 239000012141 concentrate Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000002164 ion-beam lithography Methods 0.000 description 1
- 230000000116 mitigating effect Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/26—Ion sources; Ion guns using surface ionisation, e.g. field effect ion sources, thermionic ion sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/022—Details
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/08—Ion sources
- H01J2237/0802—Field ionization sources
- H01J2237/0807—Gas field ion sources [GFIS]
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Electron Sources, Ion Sources (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60091830A JPS61250928A (ja) | 1985-04-27 | 1985-04-27 | ガスフエ−ズイオン源 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60091830A JPS61250928A (ja) | 1985-04-27 | 1985-04-27 | ガスフエ−ズイオン源 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61250928A JPS61250928A (ja) | 1986-11-08 |
| JPH0374454B2 true JPH0374454B2 (enrdf_load_stackoverflow) | 1991-11-27 |
Family
ID=14037518
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60091830A Granted JPS61250928A (ja) | 1985-04-27 | 1985-04-27 | ガスフエ−ズイオン源 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61250928A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9508521B2 (en) | 2008-06-05 | 2016-11-29 | Hitachi High-Technologies Corporation | Ion beam device |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4806246B2 (ja) * | 2005-10-26 | 2011-11-02 | ブルカー・ダルトニクス株式会社 | 質量分析用試料スプレー装置 |
| WO2007067296A2 (en) * | 2005-12-02 | 2007-06-14 | Alis Corporation | Ion sources, systems and methods |
| DE112010000799B4 (de) * | 2009-01-15 | 2020-12-17 | Hitachi High-Tech Corporation | Ionenstrahlvorrichtung |
-
1985
- 1985-04-27 JP JP60091830A patent/JPS61250928A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9508521B2 (en) | 2008-06-05 | 2016-11-29 | Hitachi High-Technologies Corporation | Ion beam device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61250928A (ja) | 1986-11-08 |
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