JPS61241748A - レジストパタ−ンの形成方法 - Google Patents

レジストパタ−ンの形成方法

Info

Publication number
JPS61241748A
JPS61241748A JP60083069A JP8306985A JPS61241748A JP S61241748 A JPS61241748 A JP S61241748A JP 60083069 A JP60083069 A JP 60083069A JP 8306985 A JP8306985 A JP 8306985A JP S61241748 A JPS61241748 A JP S61241748A
Authority
JP
Japan
Prior art keywords
film
resist pattern
resist
dry etching
alkylbenzene
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60083069A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0342659B2 (OSRAM
Inventor
Yoshio Yamashita
山下　吉雄
Takaharu Kawazu
河津　隆治
Toshio Ito
伊東　敏雄
Takateru Asano
浅野　孝輝
Kenji Kobayashi
健二 小林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Yakuhin Kogyo KK
Oki Electric Industry Co Ltd
Original Assignee
Fuji Yakuhin Kogyo KK
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Yakuhin Kogyo KK, Oki Electric Industry Co Ltd filed Critical Fuji Yakuhin Kogyo KK
Priority to JP60083069A priority Critical patent/JPS61241748A/ja
Publication of JPS61241748A publication Critical patent/JPS61241748A/ja
Publication of JPH0342659B2 publication Critical patent/JPH0342659B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/325—Non-aqueous compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60083069A 1985-04-18 1985-04-18 レジストパタ−ンの形成方法 Granted JPS61241748A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60083069A JPS61241748A (ja) 1985-04-18 1985-04-18 レジストパタ−ンの形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60083069A JPS61241748A (ja) 1985-04-18 1985-04-18 レジストパタ−ンの形成方法

Publications (2)

Publication Number Publication Date
JPS61241748A true JPS61241748A (ja) 1986-10-28
JPH0342659B2 JPH0342659B2 (OSRAM) 1991-06-27

Family

ID=13791887

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60083069A Granted JPS61241748A (ja) 1985-04-18 1985-04-18 レジストパタ−ンの形成方法

Country Status (1)

Country Link
JP (1) JPS61241748A (OSRAM)

Also Published As

Publication number Publication date
JPH0342659B2 (OSRAM) 1991-06-27

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term