JPS61236683A - Crucible for pulling single crystal - Google Patents
Crucible for pulling single crystalInfo
- Publication number
- JPS61236683A JPS61236683A JP7756285A JP7756285A JPS61236683A JP S61236683 A JPS61236683 A JP S61236683A JP 7756285 A JP7756285 A JP 7756285A JP 7756285 A JP7756285 A JP 7756285A JP S61236683 A JPS61236683 A JP S61236683A
- Authority
- JP
- Japan
- Prior art keywords
- crucible
- curvature
- radius
- pbn
- rmax
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は単結晶引上げ用るつぼ、特に熱分解窒化ホウ素
(以下PBNという)から形成された自立型るつぼから
なる■−■族や■−V族の化合物半導体単結晶c以下化
合物半導体用単結晶という)引上げ用るつほに関する。Detailed Description of the Invention (Industrial Application Field) The present invention relates to a crucible for pulling single crystals, particularly a self-supporting crucible made of pyrolytic boron nitride (hereinafter referred to as PBN). This invention relates to a rutsuho for pulling compound semiconductor single crystals (hereinafter referred to as single crystals for compound semiconductors).
(従来技術と問題点)
従来からPBNるつぼは化合物半導体単結晶引上用に使
用されている。(Prior Art and Problems) PBN crucibles have been conventionally used for pulling compound semiconductor single crystals.
従来からこの分野に使用されているるつぼは、例えば口
径4ψ(約100■ψ)で、その厚さが1雪程度の自立
型のものである。しかし、このよりなPBNるつぼを化
合物半導体単結晶引上げに使用すると、るつぼのPBN
層が剥離し、麺
その繰り返し使用回数が10回程度が限度である。通常
化合物半導体単結晶は、抵抗加熱真空炉に化合物半導体
単結晶原料を入れ、さらにその表面がB、0.で被覆し
ながら高温で加熱し、単結晶を引上げる方法で製造され
ている。本発明者はPBNるりぼ使用回数を向上させる
ためいろいろ研究を行った結果、PBNるつぼの内表面
粗さくRmax) と底面コーナ部の曲率半径(R)
がPBNるつほの寿命に影響を与えているとの知見によ
り、本発明に到達したものである。The crucible conventionally used in this field is, for example, a free-standing type with a diameter of 4 ψ (approximately 100 ψ) and a thickness of about 1 snow. However, when this stiff PBN crucible is used to pull a compound semiconductor single crystal, the PBN in the crucible
The layers peel off, and the number of times the noodles can be used repeatedly is limited to about 10 times. Normally, a compound semiconductor single crystal is produced by putting a compound semiconductor single crystal raw material into a resistance heating vacuum furnace, and furthermore, the surface thereof is B, 0. It is produced by heating the crystal at high temperatures while coating it with silica to pull the single crystal. The inventor conducted various studies to improve the number of times PBN crucibles can be used, and found that the inner surface roughness (Rmax) of the PBN crucible and the radius of curvature (R) of the bottom corner
The present invention was arrived at based on the knowledge that this affects the lifespan of PBN rutsuho.
(問題点を解決するだめの手段)
本発明はPBNから形成された自立型るっほであって、
しかもそのるつぼの内表面粗さく Rmax ) が
5〜350μm1かっその底面コーナ部の曲率半径(R
1が15■以上であるII=Vl族及び■−■族の元素
の化合物半導体単結晶引上げ用るつt−fである。(Means for Solving the Problems) The present invention is a self-supporting Ruho made of PBN,
Moreover, the inner surface roughness (Rmax) of the crucible is 5 to 350 μm1, and the radius of curvature (R
This is a crucible t-f for pulling compound semiconductor single crystals of II=Vl group and ■-■ group elements where 1 is 15■ or more.
以下さらに本発明について詳しく説明する。The present invention will be further explained in detail below.
本発明品を製造するには抵抗加熱式真空炉に所望形状の
黒鉛のような耐熱性や耐食性の高純度材料からなる型を
配置する。なおその型の表面粗さけRrnax <、
500 tlm (J I S B、O+601による
)のものが用いられる。この理由はPBNの蒸着膜が容
易に形成されるからである。次に例えば三塩化ホウ素の
ようなハロゲン化ホウ素とアンモニアとを七〇モル比で
それぞれ1:1〜4程度の混合ガスで前記した炉に供給
し、温度1850〜2100℃、圧力50 Torr以
下で処理し所望の厚さ例えば0.5〜5■とする。To manufacture the product of the present invention, a mold made of a heat-resistant and corrosion-resistant high-purity material such as graphite having a desired shape is placed in a resistance heating vacuum furnace. Note that the surface roughness of the mold Rrnax <,
500 tlm (according to JIS B, O+601) is used. The reason for this is that a deposited film of PBN is easily formed. Next, a mixed gas of boron halide such as boron trichloride and ammonia in a 70 molar ratio of about 1:1 to 4, respectively, is supplied to the above-mentioned furnace, and the mixture is heated at a temperature of 1850 to 2100°C and a pressure of 50 Torr or less. The film is processed to a desired thickness, for example, 0.5 to 5 cm.
なお本発明においてはるつぼ底面コーナ部の曲率半径(
R)が15w以上とするが、るつぼの口径にも関係する
ことからその口径が100−以上のもので、るつぼ底面
コーナ部の曲率半径が口径の1/3以下にすることが望
ましい。In addition, in the present invention, the radius of curvature of the bottom corner of the crucible (
R) should be 15w or more, but since it is also related to the diameter of the crucible, it is desirable that the diameter is 100- or more and the radius of curvature of the bottom corner of the crucible is 1/3 or less of the diameter.
このような構造の型を用いることによって、PBNのコ
ーナ部の応力が緩和されると共に使用後B2O3を除去
する際にもB2O3の応力の集中が少なくなり、PBN
の剥離が少なくなり、使用回数が底面コーナ部の曲率半
径(R1が2〜10mの従来品に比べて2倍以上となる
。次いで炉を冷却し黒鉛型を炉外に取り出L P B
N蒸着膜を黒鉛型から外すとPBNるつぼが得られる。By using a mold with such a structure, the stress at the corner part of PBN is alleviated, and the concentration of stress in B2O3 is also reduced when removing B2O3 after use, and the PBN
The number of times of use is more than twice that of conventional products with a radius of curvature of the bottom corner (R1 of 2 to 10 m).Next, the furnace is cooled and the graphite mold is taken out of the furnace.
When the N-deposited film is removed from the graphite mold, a PBN crucible is obtained.
以下図面に従って本発明の詳細な説明する。The present invention will be described in detail below with reference to the drawings.
第1図は本発明の実施例であるPBNるつぼの説明断面
図、第2図は比較例のPBNるつぼの説明断面図である
。FIG. 1 is an explanatory sectional view of a PBN crucible as an example of the present invention, and FIG. 2 is an explanatory sectional view of a PBN crucible as a comparative example.
何分1はるつぼ、2け底部コーナ部、3は肉厚を示す。The fraction 1 indicates the crucible, 2 indicates the bottom corner, and 3 indicates the wall thickness.
まず第1図に示すように本発明品はPBNるつぼ1から
構成されその底面コーナ部2が曲率半径201RM以上
、肉厚3が1閣、内表面粗さはRmax 200μmの
ものである。First, as shown in FIG. 1, the product of the present invention is composed of a PBN crucible 1, the bottom corner portion 2 of which has a radius of curvature of 201 RM or more, a wall thickness 3 of 1 mm, and an inner surface roughness of Rmax 200 μm.
一方比較品として市販のものけ、底面コーナ部2の曲率
半径は2〜10+m程度のもので、その内表面粗さけR
max 50μm程度である。On the other hand, the radius of curvature of the bottom corner part 2 of the commercially available comparative product is about 2 to 10+ m, and the inner surface roughness R
The maximum thickness is approximately 50 μm.
以上のようなPBNるつt!を用い、液相封止チョコラ
ルスキー法によるGaA、単結晶育成を想定[7た寿命
テストを行ったところ本発明品は使”用回数20回1υ
上、比較品は10回程度であった。PBN Rutsut like the above! Assuming GaA single crystal growth by the liquid-phase sealed Czochralski method using
Above, the comparison product was used about 10 times.
(発明の実施例)
実施例1
1ocrn巾×60ctn長×16n厚の黒鉛板6枚を
使い、直径30cmの黒鉛板(底板)の上面に六角形状
反応室を形成[7た。底板の中央にはガス導入のための
孔をあけ、原料ガス導入管として予めPBN被覆した黒
鉛の管2本を同軸になるように接続し7た。六角形状体
上端から直径96霧、長さ110胡の底面コーナ部の曲
率半径20箭のるつ#Y型の黒鉛基材を吊り下げ、反応
室全体を抵抗加熱方式の真空炉内に装入17た。炉を1
(1”Torr まで排気した後1875℃の温度ま
で加熱した。その時原料ガス導入管の温度は反応炉入口
で200℃、黒鉛反応室入口で1850℃であった。0
.5 Torr の圧力下、窒素ガスで稀釈した三塩
化ホウ素とアンモニアを導入し、所定時間蒸着後冷却し
、生成したPBNを黒鉛基材から取り外し、肉厚1mの
PBNる。(Embodiments of the invention) Example 1 A hexagonal reaction chamber was formed on the top surface of the graphite plate (bottom plate) with a diameter of 30 cm using six graphite plates of 1 ocrn width x 60 ctn length x 16n thickness. A hole for gas introduction was made in the center of the bottom plate, and two graphite tubes coated with PBN in advance were coaxially connected as raw material gas introduction tubes. A #Y-shaped graphite substrate with a radius of curvature of 20 mm at the bottom corner with a diameter of 96 mm and a length of 110 mm is suspended from the upper end of the hexagonal body, and the entire reaction chamber is charged into a resistance heating type vacuum furnace. 17. 1 furnace
(After exhausting to 1" Torr, it was heated to a temperature of 1875°C. At that time, the temperature of the raw material gas introduction pipe was 200°C at the reactor inlet and 1850°C at the graphite reaction chamber inlet.
.. Under a pressure of 5 Torr, boron trichloride and ammonia diluted with nitrogen gas were introduced, and after being vapor-deposited for a predetermined period of time, it was cooled, and the generated PBN was removed from the graphite base material, and a PBN with a thickness of 1 m was formed.
つぼを得た。このるつほの内面を≠500す・ンドペー
パーで研摩し、Rmax50μm とした。I got a pot. The inner surface of this rutsuho was polished with ≠500 sandpaper to give an Rmax of 50 μm.
比較のために実施例1と同様の方法で作成したるつぼを
す40.のサンドペーパーで研摩したところRmax
370μm のものを得た。For comparison, a crucible prepared in the same manner as in Example 1 was prepared.40. When polished with sandpaper, Rmax
A sample with a thickness of 370 μm was obtained.
これらのるつばを用いてLEC法GaAa単結晶育成を
想定した寿命テストを行った。Using these crucibles, a life test was conducted assuming GaAa single crystal growth using the LEC method.
すなわちるつぼ内に200gのB、O,’iフルゴン雰
囲気中温・度13000で融解し、室tm ”tで冷却
した。るつは内壁にはB、03が固着しているので、全
体をメタノール中につけ、超音波をかけてB、0.とP
BN固着界面にメタノールを浸透させ、固着している殆
んどの部分を分離し、残存するB、03塊を除去した。That is, 200 g of B, O,'i was melted in a fulgon atmosphere at a temperature of 13,000 degrees Celsius in a crucible, and cooled in a room tm "t. Since B and 03 were stuck to the inner wall of the crucible, the whole was placed in methanol. and apply ultrasound to B, 0. and P.
Methanol was permeated into the BN adhesion interface to separate most of the adhering parts and remove the remaining B, 03 lumps.
このサイクルを繰り返し、毎回そのるつぼの消耗状態を
調・べた。その結果を表に示す。(実験尚1〜2は実施
例、実験Na3は比較例を示す。)表
実施例2
使用1.7辷ザンドペーパーを一#−1500のものを
用いて表面粗さnmaxl、0μmとした以外はThis cycle was repeated, and the state of wear and tear on the crucible was checked each time. The results are shown in the table. (Experiments 1 and 2 are examples, and Experiment Na3 is a comparative example.) Table Example 2 Used 1.7 Except for using sandpaper of #1500 and having a surface roughness of nmaxl and 0 μm.
図面はPBNるつほを説明する断面図であって、第1図
は実施例、第2図は比較例のものを示す。
0号1・・・るつ/丘、 2・・・底面コーナ部、3・
・肉厚、 4・・固化B、08゜特許出願人 電気
化学工業株式会社
′$1図
第2図The drawings are cross-sectional views for explaining PBN Rutsuho, and FIG. 1 shows an example, and FIG. 2 shows a comparative example. No. 0 1...Rutsu/hill, 2...Bottom corner part, 3.
・Wall thickness, 4... Solidification B, 08° Patent applicant Denki Kagaku Kogyo Co., Ltd.'$1 Figure 2
Claims (1)
て、しかも、そのるつぼの内表面粗さ(Rmax)が5
〜350μm、かつその底面コーナ部の曲率半径(R)
が15mm以上である化合物半導体単結晶引上げ用るつ
ぼ。A free-standing crucible made of pyrolytic boron nitride, and furthermore, the crucible has an inner surface roughness (Rmax) of 5.
~350 μm, and the radius of curvature (R) of the bottom corner
A crucible for pulling compound semiconductor single crystals having a diameter of 15 mm or more.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7756285A JPS61236683A (en) | 1985-04-13 | 1985-04-13 | Crucible for pulling single crystal |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7756285A JPS61236683A (en) | 1985-04-13 | 1985-04-13 | Crucible for pulling single crystal |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS61236683A true JPS61236683A (en) | 1986-10-21 |
Family
ID=13637453
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7756285A Pending JPS61236683A (en) | 1985-04-13 | 1985-04-13 | Crucible for pulling single crystal |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61236683A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04228500A (en) * | 1990-04-30 | 1992-08-18 | Union Carbide Coatings Service Technol Corp | Boron nitride board and method for preparation thereof |
-
1985
- 1985-04-13 JP JP7756285A patent/JPS61236683A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04228500A (en) * | 1990-04-30 | 1992-08-18 | Union Carbide Coatings Service Technol Corp | Boron nitride board and method for preparation thereof |
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