JPS61234021A - Manufacture of magnetic material - Google Patents
Manufacture of magnetic materialInfo
- Publication number
- JPS61234021A JPS61234021A JP7443785A JP7443785A JPS61234021A JP S61234021 A JPS61234021 A JP S61234021A JP 7443785 A JP7443785 A JP 7443785A JP 7443785 A JP7443785 A JP 7443785A JP S61234021 A JPS61234021 A JP S61234021A
- Authority
- JP
- Japan
- Prior art keywords
- atmosphere
- sputtering
- coercive force
- magnetic material
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Physical Vapour Deposition (AREA)
- Thin Magnetic Films (AREA)
Abstract
Description
【発明の詳細な説明】
〔概 要〕
磁性材料のスパッタ中に炭化水素ガスを導入することに
よって磁性薄膜の保磁力を制御することができる。DETAILED DESCRIPTION OF THE INVENTION [Summary] The coercive force of a magnetic thin film can be controlled by introducing a hydrocarbon gas during sputtering of a magnetic material.
本発明は磁性材料の製造方法、特に保磁力を制御できる
磁性薄膜の製造方法に係る。The present invention relates to a method of manufacturing a magnetic material, particularly a method of manufacturing a magnetic thin film whose coercive force can be controlled.
鉄、鉄−ニッケル合金、鉄−コバルト合金等の磁性材料
薄膜は基板上にこれらの金属（合金）を真空蒸着、スパ
ッタ、イオンブレーティング等によって堆積して作成さ
れている。これらの方法のうな、スパッタ法による磁性
薄膜の作成では、従来、不活性雰囲気、特に純アルゴン
ガス雰囲気が利用されている。Thin films of magnetic materials such as iron, iron-nickel alloys, and iron-cobalt alloys are created by depositing these metals (alloys) on substrates by vacuum evaporation, sputtering, ion blasting, or the like. In the production of magnetic thin films by sputtering, which is one of these methods, an inert atmosphere, particularly a pure argon gas atmosphere, has conventionally been used.
上記の如き方法で磁性薄膜を作成すると、保磁力が一定
値となり、制御できないという問題がある。When a magnetic thin film is produced by the method described above, there is a problem in that the coercive force remains at a constant value and cannot be controlled.
本発明の目的は保磁力の制御を可能とした磁性材料のス
パッタ法を提供することである。An object of the present invention is to provide a method for sputtering magnetic materials that allows control of coercive force.
上記目的を達成するために、本発明は、磁性材料をスパ
ッタする際に雰囲気中に炭化水素ガスを導入する。磁性
材料としては、例えば、鉄、鉄−〔作 用〕
スパッタ雰囲気中に炭化水素ガスを導入することによっ
て磁性材料の保磁力が制御できることは実験的に示され
たもので、その理由は必ずしも明らかではないが、スパ
ッタ雰囲気中の炭化水素ガスが分解して炭素が磁性薄膜
中に混入することによると考えられる。In order to achieve the above object, the present invention introduces hydrocarbon gas into the atmosphere when sputtering a magnetic material. Examples of magnetic materials include iron and iron. [Function] It has been experimentally shown that the coercive force of magnetic materials can be controlled by introducing hydrocarbon gas into the sputtering atmosphere, and the reason for this is not always clear. However, it is considered that the hydrocarbon gas in the sputtering atmosphere is decomposed and carbon is mixed into the magnetic thin film.
第１図に本発明の実施例に用いたスパッタ装置を示す。 FIG. 1 shows a sputtering apparatus used in an embodiment of the present invention.
同図中、１はスパッタ装置、２は基板、３は基板ホルダ
ー、４はターゲット、５は真空ポンプ、６はアルゴンガ
スボンベ、７はメタンガスボンベ、８．９はパルプであ
る。In the figure, 1 is a sputtering device, 2 is a substrate, 3 is a substrate holder, 4 is a target, 5 is a vacuum pump, 6 is an argon gas cylinder, 7 is a methane gas cylinder, and 8.9 is a pulp.
ターゲット４としてコバルト−鉄合金（鉄５゜原子％）
、基板２として４インチ径の結晶化ガラス円板（コーニ
ングガラス社の商品「フォトセラム」）を用い、基板２
を３００’Ｃに加熱し、アルゴンガス圧を５Ｐａとし、
炭化水素ガスとしてメタンガスを約０〜１１０００ｐｐ
の範囲内の量でぃろいろに変えて導入し、高周波電力２
５０ｗにてスパッタを行ない、厚さ約１μｍのコバルト
−鉄磁性薄膜を作成した。得られた磁性薄膜の保磁力を
振動試料型磁束計を用いて測定した。Cobalt-iron alloy (5° atomic percent iron) as target 4
, a 4-inch diameter crystallized glass disk ("Photoceram", a product of Corning Glass Co., Ltd.) was used as the substrate 2;
was heated to 300'C, the argon gas pressure was set to 5 Pa,
Approximately 0 to 11,000 pp of methane gas as hydrocarbon gas
High frequency power 2 is introduced by changing the amount within the range of
Sputtering was performed at 50 W to create a cobalt-iron magnetic thin film with a thickness of about 1 μm. The coercive force of the obtained magnetic thin film was measured using a vibrating sample magnetometer.
第２図はこうして得られた磁性薄膜の保磁力をメタンガ
スの濃度（同図中のメタンガスの濃度はほぼ０〜１１０
００ｐｐに対応する）の関数としてプロットしたもので
ある。この図から、スパッタ雰囲気中のメタンガス濃度
の増加と共に磁性薄膜の保磁力が増加することがわかる
。Figure 2 shows the coercive force of the magnetic thin film obtained in this way at the concentration of methane gas (the concentration of methane gas in the figure is approximately 0 to 110%).
00pp). This figure shows that the coercive force of the magnetic thin film increases as the methane gas concentration in the sputtering atmosphere increases.
分子量の大きい炭化水素であってもスパッタ雰囲気中で
は分解されてメタン、更には炭素と水素が生成するので
、その作用は本質的に同一であると考えられる。Even hydrocarbons with large molecular weights are decomposed in the sputtering atmosphere to produce methane, carbon, and hydrogen, so it is thought that their effects are essentially the same.
本発明により、保磁力が向上した磁性薄膜が得られる。 According to the present invention, a magnetic thin film with improved coercive force can be obtained.
第１図は本発明の実施例で用いたスパッタ装置の模式図
、第２図はスパッタ法で作成した磁性薄膜の保磁力をメ
タンガス濃度の関数としてプロットしたグラフ図である
。
１・・・スパッタ装置、２・・・基板、３・・・基板ホ
ルダー、４・・・ターゲット、５・・・真空ポンプ、６
・・・アルゴンガスボンベ、７・・・メタンガスボンベ
、８．９・・・パルプ。FIG. 1 is a schematic diagram of a sputtering apparatus used in an example of the present invention, and FIG. 2 is a graph plotting the coercive force of a magnetic thin film produced by sputtering as a function of methane gas concentration. DESCRIPTION OF SYMBOLS 1... Sputtering apparatus, 2... Substrate, 3... Substrate holder, 4... Target, 5... Vacuum pump, 6
...Argon gas cylinder, 7...Methane gas cylinder, 8.9...Pulp.
Claims (1)
パッタ雰囲気中に炭化水素ガスを導入することによって
、得られる磁性薄膜の保磁力を制御することを特徴とす
る磁性材料の製造方法。1. A method for producing a magnetic material, which comprises controlling the coercive force of the resulting magnetic thin film by introducing hydrocarbon gas into the sputtering atmosphere when depositing the magnetic material on a substrate by sputtering.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7443785A JPS61234021A (en) | 1985-04-10 | 1985-04-10 | Manufacture of magnetic material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7443785A JPS61234021A (en) | 1985-04-10 | 1985-04-10 | Manufacture of magnetic material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS61234021A true JPS61234021A (en) | 1986-10-18 |
Family
ID=13547197
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7443785A Pending JPS61234021A (en) | 1985-04-10 | 1985-04-10 | Manufacture of magnetic material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61234021A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5149409A (en) * | 1991-01-11 | 1992-09-22 | International Business Machines Corporation | Process for fabricating thin film metal alloy magnetic recording disks to selectively variable coercivities |
-
1985
- 1985-04-10 JP JP7443785A patent/JPS61234021A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5149409A (en) * | 1991-01-11 | 1992-09-22 | International Business Machines Corporation | Process for fabricating thin film metal alloy magnetic recording disks to selectively variable coercivities |
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