JPH0543389A - Production of substrate having diamond thin film on surface - Google Patents

Abstract

PURPOSE:To provide a process for producing a substrate having a diamond thin film on the surface. CONSTITUTION:The objective substrate having a diamond thin film on the surface can be produced by irradiating a target composed of diamond fine powder with an ion beam to effect the sputtering of the diamond fine powder, passing the sputtered fine diamond powder through an inert gas plasma and implanting the powder into the surface of the substrate.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a substrate having a diamond thin film on its surface. The base material having a diamond thin film on the surface is, for example, a cutting tool,
A wide range of applications are expected as parts for precision mechanisms, wear-resistant parts, etc. In addition, since a plate-shaped substrate provided with a diamond thin film on its surface absorbs far infrared rays well,
It is used as a quick thaw plate.

[0002]

2. Description of the Related Art As a method for producing a substrate having a diamond thin film on its surface, there is a plasma vapor deposition method. This is a method in which a raw material gas such as methane gas mixed with hydrogen is irradiated with microwaves to form a plasma state, and the surface of a heated substrate is gradually crystallized. This method
Generally, at low temperatures, diamond crystals grow poorly, and amorphous carbon appears as impurities.
750-9 to obtain high-purity diamond crystals
It was necessary to set the temperature to 50 ° C and 400 to 500 ° C even if the purity was sacrificed.

However, since the base material such as ceramic or metal has a different thermal expansion coefficient from that of diamond, the diamond thin film formed on the high temperature base material as described above adheres when it is cooled and returned to room temperature. There is a drawback that stress is generated on the surface and the adhesion strength becomes small.

[0004]

SUMMARY OF THE INVENTION It is an object of the present invention to solve the above problems and to provide a method for forming a diamond thin film having high adhesion strength on the surface of a substrate.

[0005]

[Means for Solving the Problems]

The method for producing a base material having a diamond thin film on the surface according to the present invention is as follows: A target made of diamond fine powder is irradiated with an ion beam to sputter the diamond fine powder, and the sputtered diamond fine powder is treated with an inert gas. It is characterized in that it is passed through the plasma of and then driven into the surface of the substrate.

This will be described with reference to the accompanying drawings. A target made of diamond fine powder 2 housed in a target holder 1 is irradiated with an ion beam 4 generated from an ion source 3 to sputter the diamond fine powder 2 and sputter it. The diamond fine powder is passed through the plasma 7 of the inert gas generated between the plus electrode 5 and the minus electrode 6, and then is injected onto the surface of the base material 8.

As fine diamond powder, it is desirable to use one having a particle diameter of 1 micron (μm) or less, preferably 0.5 micron or less.

A commercially available device can be used as the ion beam generator.

The plasma of the inert gas is 5 to 1 in the apparatus.
An inert gas such as Ne (neon), CO ₂ (carbon dioxide gas), N ₂ (nitrogen), Ar (argon) having a pressure of about 0 mmHg is filled, and the distance between the electrodes is 1 to 2 KV / cm (distance between the electrodes). It is generated by applying a certain voltage. The distance between the electrodes may be determined according to the size of the base material, and thus the voltage between the electrodes is also determined. Among the above gases, Ne is most preferable because it can lower the processing temperature.

As the base material, ceramics such as silica and alumina, stainless steel and the like, which have heat resistance to the processing temperature, are used.

A treatment temperature of 400 to 1000 ° C. is suitable.

A voltage of about 30 to 50 KV is applied with the target as a positive electrode and the substrate as a negative electrode.

The diamond fine powder sputtered from the target impinges on the base material together with the ion beam in the state of being converted into plasma by passing through the plasma of the inert gas, so the diamond fine powder is merely the base material. Since the thin film is formed not in a state of being attached to the surface but in a state of being partially embedded in the substrate, the adhesive strength is remarkably improved.

[0015]

EFFECTS OF THE INVENTION It is possible to manufacture a substrate having a diamond thin film with high adhesion strength on the surface.

[Brief description of drawings]

FIG. 1 is a diagram for explaining a basic device configuration for carrying out the present invention.

Claims (1)

[Claims] 1. A target made of fine diamond powder is irradiated with an ion beam to sputter the fine diamond powder, and the sputtered fine diamond powder is passed through a plasma of an inert gas and then implanted into the surface of the base material. A method for producing a base material having a diamond thin film on the surface thereof.