JPS61232454A - ポジ型ホトレジスト用現像液 - Google Patents

ポジ型ホトレジスト用現像液

Info

Publication number
JPS61232454A
JPS61232454A JP60073748A JP7374885A JPS61232454A JP S61232454 A JPS61232454 A JP S61232454A JP 60073748 A JP60073748 A JP 60073748A JP 7374885 A JP7374885 A JP 7374885A JP S61232454 A JPS61232454 A JP S61232454A
Authority
JP
Japan
Prior art keywords
developer
positive
positive photoresist
quaternary ammonium
organic base
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60073748A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0562736B2 (enExample
Inventor
Hatsuyuki Tanaka
初幸 田中
Naoki Ito
直樹 伊藤
Shingo Asaumi
浅海　慎五
Akira Yokota
晃 横田
Hisashi Nakane
中根　久
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP60073748A priority Critical patent/JPS61232454A/ja
Publication of JPS61232454A publication Critical patent/JPS61232454A/ja
Publication of JPH0562736B2 publication Critical patent/JPH0562736B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60073748A 1985-04-08 1985-04-08 ポジ型ホトレジスト用現像液 Granted JPS61232454A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60073748A JPS61232454A (ja) 1985-04-08 1985-04-08 ポジ型ホトレジスト用現像液

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60073748A JPS61232454A (ja) 1985-04-08 1985-04-08 ポジ型ホトレジスト用現像液

Publications (2)

Publication Number Publication Date
JPS61232454A true JPS61232454A (ja) 1986-10-16
JPH0562736B2 JPH0562736B2 (enExample) 1993-09-09

Family

ID=13527177

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60073748A Granted JPS61232454A (ja) 1985-04-08 1985-04-08 ポジ型ホトレジスト用現像液

Country Status (1)

Country Link
JP (1) JPS61232454A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6334542A (ja) * 1986-07-30 1988-02-15 Sumitomo Chem Co Ltd ポジ形レジスト用現像液
US7407739B2 (en) 2002-04-26 2008-08-05 Tokyo Ohka Kogyo Co., Ltd. Resist developer and resist pattern formation method using same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6334542A (ja) * 1986-07-30 1988-02-15 Sumitomo Chem Co Ltd ポジ形レジスト用現像液
US7407739B2 (en) 2002-04-26 2008-08-05 Tokyo Ohka Kogyo Co., Ltd. Resist developer and resist pattern formation method using same

Also Published As

Publication number Publication date
JPH0562736B2 (enExample) 1993-09-09

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term