JPH0562736B2 - - Google Patents

Info

Publication number
JPH0562736B2
JPH0562736B2 JP60073748A JP7374885A JPH0562736B2 JP H0562736 B2 JPH0562736 B2 JP H0562736B2 JP 60073748 A JP60073748 A JP 60073748A JP 7374885 A JP7374885 A JP 7374885A JP H0562736 B2 JPH0562736 B2 JP H0562736B2
Authority
JP
Japan
Prior art keywords
developer
present
exposed
weight
quaternary ammonium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60073748A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61232454A (ja
Inventor
Hatsuyuki Tanaka
Naoki Ito
Shingo Asaumi
Akira Yokota
Hisashi Nakane
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP60073748A priority Critical patent/JPS61232454A/ja
Publication of JPS61232454A publication Critical patent/JPS61232454A/ja
Publication of JPH0562736B2 publication Critical patent/JPH0562736B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP60073748A 1985-04-08 1985-04-08 ポジ型ホトレジスト用現像液 Granted JPS61232454A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60073748A JPS61232454A (ja) 1985-04-08 1985-04-08 ポジ型ホトレジスト用現像液

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60073748A JPS61232454A (ja) 1985-04-08 1985-04-08 ポジ型ホトレジスト用現像液

Publications (2)

Publication Number Publication Date
JPS61232454A JPS61232454A (ja) 1986-10-16
JPH0562736B2 true JPH0562736B2 (enExample) 1993-09-09

Family

ID=13527177

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60073748A Granted JPS61232454A (ja) 1985-04-08 1985-04-08 ポジ型ホトレジスト用現像液

Country Status (1)

Country Link
JP (1) JPS61232454A (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2543348B2 (ja) * 1986-07-30 1996-10-16 住友化学工業株式会社 ポジ形レジスト用現像液
JP4080784B2 (ja) 2002-04-26 2008-04-23 東京応化工業株式会社 レジスト用現像液及びそれを用いたレジストパターン形成方法、並びにレジスト用現像原液

Also Published As

Publication number Publication date
JPS61232454A (ja) 1986-10-16

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term