JPS61227973A - Silicon carbide ceramics-metal joined body - Google Patents

Silicon carbide ceramics-metal joined body

Info

Publication number
JPS61227973A
JPS61227973A JP6753485A JP6753485A JPS61227973A JP S61227973 A JPS61227973 A JP S61227973A JP 6753485 A JP6753485 A JP 6753485A JP 6753485 A JP6753485 A JP 6753485A JP S61227973 A JPS61227973 A JP S61227973A
Authority
JP
Japan
Prior art keywords
silicon carbide
carbide ceramic
bonded body
metal
metal bonded
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6753485A
Other languages
Japanese (ja)
Inventor
俊一郎 田中
常治 亀田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP6753485A priority Critical patent/JPS61227973A/en
Publication of JPS61227973A publication Critical patent/JPS61227973A/en
Pending legal-status Critical Current

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  • Pressure Welding/Diffusion-Bonding (AREA)
  • Ceramic Products (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 [発明の技術分野] 本発明は接合性の優れた炭化ケイ素セラミックス−金属
接合体に関する。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a silicon carbide ceramic-metal bonded body with excellent bonding properties.

[発明の技術的背景とその問題点] 炭化ケイ素(Si C)を主成分とする高密度焼結体は
セラミックスの中でも熱伝導性が良く、耐熱強度が高い
とともに、熱膨張係数がケイ素のそれとほぼ同じである
という特徴をもち、特にジャイアントトランジ゛スタモ
ジュール用回路基板や■C用回路基板等の半導体装に非
常に有利である。
[Technical background of the invention and its problems] High-density sintered bodies mainly composed of silicon carbide (SiC) have good thermal conductivity among ceramics, have high heat resistance strength, and have a coefficient of thermal expansion comparable to that of silicon. It has the characteristic that they are almost the same, and is very advantageous especially for semiconductor devices such as circuit boards for giant transistor modules and circuit boards for C.

また現在開発実験が進められている核融合炉のリミタ、
ダイバータ等は特に高温強度、高熱伝導性が要求される
とともにプラズマ汚染の少ない原子器の小さな物質で構
成することが必要とされており、炭化ケイ素セラミック
スはこれらの条件にかなう数少ない材料の1つとして有
望視され゛ている。
In addition, limiters for fusion reactors, which are currently being developed and tested,
Divertors and the like are required to have particularly high temperature strength and high thermal conductivity, and they also need to be constructed of small atomic materials with little plasma contamination, and silicon carbide ceramics are one of the few materials that meet these conditions. It is seen as promising.

ところで炭化ケイ素セラミックスを半導体装用の構造材
に用いるにしても、核融合炉部材として用いるにしても
導電性付与のため、あるいは強制冷部構造付与のために
は金属と接合させることが不可欠である。
By the way, whether silicon carbide ceramics are used as structural materials for semiconductor devices or as components for nuclear fusion reactors, it is essential to bond them with metal in order to provide conductivity or to provide a forced cooling section structure. .

近年この炭化ケイ素セラミックスと金属との接合方法と
して銅・マンガン合金をろう材として接合する方法、あ
るいはさらに金属と炭化ケイ素セラミックスとの熱膨張
差によって生じる熱応力破壊を防ぐために銅と炭素II
Iとの複合材を中間接合部材として用いる方法が開発さ
れた。
In recent years, methods for joining silicon carbide ceramics and metals include using a copper-manganese alloy as a brazing material, or using copper and carbon II to prevent thermal stress fracture caused by the difference in thermal expansion between the metal and silicon carbide ceramics.
A method was developed to use a composite material with I as an intermediate joining member.

しかしこの方法では、金属とセラミックスとを直接的に
接合することはできず、必ずろう材を必要とするので工
程が煩雑になるという欠点があった。
However, this method has the disadvantage that it is not possible to directly join metal and ceramics, and that a brazing filler metal is always required, making the process complicated.

[発明の目的1 本発明者等は反応焼結によって得られたケイ素を含む炭
化ケイ素セラミックスをCuまたはCu合金と接触させ
加熱するとセラミックス中に残存する遊離金属ケイ素と
C(Iの間で液相が生じ界面での反応が促進され、強固
な接合体が得られることを見出した。
[Objective of the Invention 1 The present inventors have discovered that when a silicon carbide ceramic containing silicon obtained by reaction sintering is brought into contact with Cu or a Cu alloy and heated, a liquid phase is formed between the free metallic silicon remaining in the ceramic and C(I). It was discovered that the reaction at the interface was promoted and a strong bonded body was obtained.

本発明は以上のような知見に基づいてなされたもので、
接合性の優れた炭化ケイ素セラミックスとCuまたはC
u合金との接合体を提供することを目的とする。
The present invention was made based on the above findings, and
Silicon carbide ceramics with excellent bondability and Cu or C
The purpose is to provide a bonded body with u alloy.

[発明の概要] すなわち本発明の炭化ケイ素セラミックス−金属接合体
は、ケイ素を含む炭化ケイ素セラミックスとCuまたは
Cu合金とが接合されてなるこ、とを特徴とする。
[Summary of the Invention] That is, the silicon carbide ceramic-metal bonded body of the present invention is characterized in that a silicon carbide ceramic containing silicon and Cu or a Cu alloy are bonded.

本発明におけるケイ素を含む炭化ケイ素セラミックスは
、たとえば反応焼結法によって製造され2〜20%のケ
イ素を含む炭化ケイ素セラミックス焼結体を意味する。
The silicon carbide ceramic containing silicon in the present invention means a silicon carbide ceramic sintered body containing 2 to 20% silicon, for example, produced by a reaction sintering method.

反応焼結法による炭化ケイ素セラミックスの場合には大
型品の製造が可能でしかもコストが安いので好都合であ
る。
Silicon carbide ceramics produced by the reaction sintering method are advantageous because large products can be manufactured and the cost is low.

で 炭化ケイ素セラミックス焼結体とCIまたはCu合金と
の接合はたとえば次のようにして行なう。炭化ケイ素セ
ラミックス焼結体の表面に、たとえばタフピッチ鋼を接
触させた状態で真空または不活性ガス雰囲気中、加圧ま
たは無加圧状態で約900〜1000℃に加熱して接合
させる。
The silicon carbide ceramic sintered body and the CI or Cu alloy are bonded, for example, as follows. For example, tough pitch steel is brought into contact with the surface of the silicon carbide ceramic sintered body and heated to about 900 to 1000° C. in a vacuum or an inert gas atmosphere with or without pressure to bond them.

本発明においては、炭化ケイ素セラミックスとCuを主
成分とする金属部材とをろう材なしに直接接合すること
ができるが、一層または二層以上のCuまたはNiを主
構成元素とする物質で構成された中間接合層を介して両
者を接合させてもよい。
In the present invention, silicon carbide ceramics and a metal member mainly composed of Cu can be directly joined without a brazing material, but it is possible to directly bond silicon carbide ceramics to a metal member mainly composed of Cu, but it is possible to directly bond silicon carbide ceramics to a metal member mainly composed of Cu. The two may be bonded via an intermediate bonding layer.

中間接合層を介する場合、この中間接合層は少なくとも
一層が熱応力緩衝材として作用する非連続接触体である
ことが好ましい。ここで非連続接触体とは被接触体と点
状あるいは線状接触をなしており、その結果接触面積が
接合面積よりも小さいものを意味する。またその形態と
しては粉体、発泡体、多孔質焼結体、箔、繊維または強
化複合体があげられる。
When an intermediate bonding layer is used, it is preferable that at least one layer of the intermediate bonding layer is a discontinuous contact member that acts as a thermal stress buffer. Here, the term "discontinuous contact body" refers to a body that is in point or linear contact with the body to be contacted, and as a result, the contact area is smaller than the bonding area. Examples of the form include powder, foam, porous sintered body, foil, fiber, and reinforced composite.

本発明による炭化ケイ素セラミックス−金属接合体とし
ては、たとえば次のようなものがあげられる。ここでS
 i−8i Cはケイ素を含む炭化ケイ素セラミックス
焼結体を示す。
Examples of the silicon carbide ceramic-metal bonded body according to the present invention include the following. Here S
i-8i C indicates a silicon carbide ceramic sintered body containing silicon.

Si −8i C/Cu /St −8t C3i −
8i C/Cu箔/Cu st −st C/C1箔/Si −8i C8i −
8i C/Ni −P粉体/Cu5t −8i C/N
i −P非晶質箔/Cu5t −8t C/Ni −C
r −Fe −8i −B非晶質箔/Cu 5i −8i C/Ni−Cr発泡体/Cus+ −s
t C/Cu箔/Ni−Cr発泡体/QuSi −8t
 C/Cu −CI&IN複合材料/Ni −P非晶質
箔/Cu [発明の実施例] 次に本発明の実施例について説明する。
Si -8i C/Cu /St -8t C3i -
8i C/Cu foil/Cu st -st C/C1 foil/Si -8i C8i -
8i C/Ni-P powder/Cu5t-8i C/N
i-P amorphous foil/Cu5t-8t C/Ni-C
r -Fe -8i -B amorphous foil/Cu 5i -8i C/Ni-Cr foam/Cus+ -s
t C/Cu foil/Ni-Cr foam/QuSi-8t
C/Cu-CI&IN composite material/Ni-P amorphous foil/Cu [Embodiments of the Invention] Next, embodiments of the present invention will be described.

実施例1 Refe1社製の反応焼結法によって製造した10mm
×101璽x20+n(縦×横X厚さ、以下同様)の炭
化ケイ素セラミックス焼結体の金属部材との接合面につ
いて#400の研磨仕上げをしたのち、アセトン洗浄し
た。
Example 1 10 mm manufactured by Refe1 company's reaction sintering method
The joint surface of a silicon carbide ceramic sintered body measuring 101×20+n (length×width×thickness, hereinafter the same) with a metal member was polished to #400 and then washed with acetone.

一方、10n X 10n x 0.5nのタフピッチ
電解銅板の両面を希硝酸で洗浄した。
On the other hand, both sides of a 10n x 10n x 0.5n tough pitch electrolytic copper plate were washed with dilute nitric acid.

次にこの銅板の両面に炭化ケイ素セラミック、スを接触
させて3X10−5T Or rの真空中で、50kg
/Cノの加圧下、890℃で5分間加熱した。
Next, silicon carbide ceramics were brought into contact with both sides of this copper plate, and 50 kg was
The mixture was heated at 890° C. for 5 minutes under a pressure of /C.

このようにして得られた接合体は炭化ケイ素セラミック
ス焼結体と銅板とが緻密に密着し、接合状態の優れたも
のであった。
In the thus obtained bonded body, the silicon carbide ceramic sintered body and the copper plate were in close contact with each other, and the bonded state was excellent.

実施例2 実施例1における銅板の代りに銅箔を用いた他は実施例
1と同様にして炭化ケイ素セラミックス−金属接合体を
製造した。
Example 2 A silicon carbide ceramic-metal bonded body was manufactured in the same manner as in Example 1 except that copper foil was used instead of the copper plate in Example 1.

実施例3 実施例2における炭化ケイ素セラミックス焼結体の一方
を銅板とした他は実施例2と同様にして炭化ケイ素セラ
ミックス−金属接合体を製造した。
Example 3 A silicon carbide ceramic-metal bonded body was produced in the same manner as in Example 2, except that one of the silicon carbide ceramic sintered bodies in Example 2 was a copper plate.

実施例4〜6 実施例1と同じ物を実施例1と同様に前処理した10n
 X Ion X 3nの炭化ケイ素セラミックス焼結
体と12n x 22n X 5nの銅板とを、12n
 X 12關×約0,05 nのそれぞれ第1表に示す
ニッケル系合金の中間接合材を介してかさねあわせ、第
1表に示す条件で接合した。
Examples 4 to 6 10n of the same material as Example 1 pretreated in the same manner as Example 1
A silicon carbide ceramic sintered body of X Ion X 3n and a copper plate of 12n x 22n X 5n were
They were stacked together via intermediate bonding materials of nickel-based alloys shown in Table 1, each having a size of 12 mm x about 0.05 nm, and bonded under the conditions shown in Table 1.

*1・・・N 189wt%−pHwt%合金、粉体(
福田金属株式会社製商品名) *2・・・N 189vt%−P11wt%合金、非晶
質箔(日本非晶質金属株式会社製商品名) * 3− N i53.5wt%−(:、 r7wt%
−1” e3wt%−3i4.5wt%−332wt%
合金、非合金箔(日本非晶質金属株式会社製商品名) 実施例1〜6のいずれの場合も焼結体と銅板との接合が
良好になされており、接合層近傍では炭化ケイ素セラミ
ックス焼結体中のケイ素と被着金属との液晶相互拡散が
観察された。またニッケル系合金をろう材として用いた
ものは炭化ケイ素との反応が一部品められた。
*1...N 189wt%-pHwt% alloy, powder (
Fukuda Metal Co., Ltd. product name) *2...N 189vt%-P11wt% alloy, amorphous foil (Japan Amorphous Metal Co., Ltd. product name) *3-Ni53.5wt%-(:, r7wt %
-1" e3wt% -3i4.5wt% -332wt%
Alloy, non-alloy foil (trade name manufactured by Japan Amorphous Metal Co., Ltd.) In all of Examples 1 to 6, the sintered body and the copper plate were well bonded, and the sintered silicon carbide ceramics were bonded in the vicinity of the bonding layer. Liquid crystal interdiffusion between the silicon in the compact and the deposited metal was observed. In addition, some reactions with silicon carbide were expected in those using nickel-based alloys as brazing filler metals.

実施例7〜10 実施例1と同じ物を実施例1と同様に前処理した10m
m X 10mm X 4.5nの炭化ケイ素セラミッ
クス焼結体と12n X 14n X 5mmの銅板と
を、それぞれ第2表に示す中間接合剤を介してかさねあ
わせ、第2表に示す条件で接合した。なお雰囲気は5〜
10x 10’ T orrの真空中である。  (以
下余白)* 4−4−1l x Ilu X 1.6m
mのN%−Cr合金、発泡体   (住友電工株式会社
製商品名)*5・・・11n X 11m1 X O,
07uのタフピッチ銅*6・・・1111 X 11m
1 X 005Mのタフピッチ鋼* 7−11ni X
 11n X O,5nのCIJ+C繊lll35vo
1%のIM?11合材料 (株式会社日立製作所製商品名) * 8 ’−12mm x 12m1 X 0805 
x*のN i89 wt%−P11wt%合金、非晶質
箔 (日本非晶質金属株式会社製商品名) [発明の効果] 本発明によれば炭化ケイ素セラミックス焼結体とCuま
たはCu合金とをろう材なしに直接接合させることがで
き、また中間接合材を用いることによって高温強度のよ
り大きな接合体が得られる。
Examples 7 to 10 10 m of the same material as in Example 1 pretreated in the same manner as in Example 1
A silicon carbide ceramic sintered body of m x 10 mm x 4.5 mm and a copper plate of 12 n x 14 n x 5 mm were stacked together via the intermediate bonding agent shown in Table 2, and bonded under the conditions shown in Table 2. The atmosphere is 5~
It is in a vacuum of 10 x 10' Torr. (Margin below) * 4-4-1l x Ilu x 1.6m
m N%-Cr alloy, foam (trade name manufactured by Sumitomo Electric Industries, Ltd.) *5...11n X 11m1 X O,
07u tough pitch copper *6...1111 x 11m
1 X 005M tough pitch steel* 7-11ni X
11n X O, 5n CIJ+C fiberll35vo
1% IM? 11 compound material (product name manufactured by Hitachi, Ltd.) *8'-12mm x 12m1 x 0805
Ni89 wt%-P11 wt% alloy of x*, amorphous foil (trade name manufactured by Japan Amorphous Metal Co., Ltd.) [Effects of the invention] According to the present invention, a silicon carbide ceramic sintered body, Cu or Cu alloy, can be joined directly without a brazing material, and by using an intermediate joining material, a joined body with greater high-temperature strength can be obtained.

さらに反応焼結法による炭化ケイ素セラミックスを用い
た場合には大型品の%造が容易でかつコストが安いとい
う利点をも有する。
Furthermore, when silicon carbide ceramics produced by the reaction sintering method are used, it has the advantage that it is easy to manufacture large products and the cost is low.

Claims (1)

【特許請求の範囲】 (1)ケイ素を含む炭化ケイ素セラミックスとCuまた
はCu合金とが接合されてなることを特徴とする炭化ケ
イ素セラミックス−金属接合体。 (2)ケイ素を含む炭化ケイ素セラミックスは反応焼結
法によつて製造された炭化ケイ素セラミックスである特
許請求の範囲第1項記載の炭化ケイ素セラミックス−金
属接合体。(3)炭化ケイ素セラミックスとCuまたは
Cu合金とがCuまたはNiを主構成元素とする物質で
構成された中間接合層を少なくとも一層介して接合され
ている特許請求の範囲第1項記載の炭化ケイ素セラミッ
クス−金属接合体。 (4)中間接合層は少なくとも一層が非連続接触体であ
る特許請求の範囲第3項記載の炭化ケイ素セラミックス
−金属接合体。 (5)非連続接触体が粉体、発泡体、多孔質焼結体、箔
、繊維または強化複合体である特許請求の範囲第4項記
載の炭化ケイ素セラミックス−金属接合体。 (6)炭化ケイ素セラミックス−金属接合体は半導体用
回路基板である特許請求の範囲第1項記載の炭化ケイ素
セラミックス−金属接合体。 (7)炭化ケイ素セラミックス−金属接合体は核融合炉
第1壁またはリミタ、ダイバータ用部材である特許請求
の範囲第1項記載の炭化ケイ素セラミックス−金属接合
体。
Claims: (1) A silicon carbide ceramic-metal bonded body, characterized in that it is formed by bonding a silicon carbide ceramic containing silicon and Cu or a Cu alloy. (2) The silicon carbide ceramic-metal bonded body according to claim 1, wherein the silicon carbide ceramic containing silicon is a silicon carbide ceramic manufactured by a reaction sintering method. (3) The silicon carbide according to claim 1, wherein the silicon carbide ceramic and Cu or Cu alloy are bonded through at least one intermediate bonding layer made of a substance whose main constituent element is Cu or Ni. Ceramics-metal joint. (4) The silicon carbide ceramic-metal bonded body according to claim 3, wherein at least one of the intermediate bonding layers is a discontinuous contact member. (5) The silicon carbide ceramic-metal bonded body according to claim 4, wherein the discontinuous contact body is a powder, a foam, a porous sintered body, a foil, a fiber, or a reinforced composite. (6) The silicon carbide ceramic-metal bonded body according to claim 1, wherein the silicon carbide ceramic-metal bonded body is a semiconductor circuit board. (7) The silicon carbide ceramic-metal bonded body according to claim 1, wherein the silicon carbide ceramic-metal bonded body is a member for the first wall of a nuclear fusion reactor, a limiter, or a diverter.
JP6753485A 1985-03-30 1985-03-30 Silicon carbide ceramics-metal joined body Pending JPS61227973A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6753485A JPS61227973A (en) 1985-03-30 1985-03-30 Silicon carbide ceramics-metal joined body

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6753485A JPS61227973A (en) 1985-03-30 1985-03-30 Silicon carbide ceramics-metal joined body

Publications (1)

Publication Number Publication Date
JPS61227973A true JPS61227973A (en) 1986-10-11

Family

ID=13347739

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6753485A Pending JPS61227973A (en) 1985-03-30 1985-03-30 Silicon carbide ceramics-metal joined body

Country Status (1)

Country Link
JP (1) JPS61227973A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0375277A (en) * 1989-04-28 1991-03-29 Hitachi Ltd Method and device for bonding
JP2005015317A (en) * 2003-06-30 2005-01-20 Sumitomo Electric Ind Ltd Bonded body of ceramic-metal composite, bonding method, and apparatus for manufacturing liquid crystal or semiconductor using the bonded body
CN101890590A (en) * 2010-07-01 2010-11-24 哈尔滨工业大学 Composite soldering material for soldering titanium alloy and ceramic or ceramic matrix composition material and method for soldering by using same

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0375277A (en) * 1989-04-28 1991-03-29 Hitachi Ltd Method and device for bonding
JP2005015317A (en) * 2003-06-30 2005-01-20 Sumitomo Electric Ind Ltd Bonded body of ceramic-metal composite, bonding method, and apparatus for manufacturing liquid crystal or semiconductor using the bonded body
JP4556389B2 (en) * 2003-06-30 2010-10-06 住友電気工業株式会社 Bonded body and bonding method of ceramic-metal composite and semiconductor or liquid crystal manufacturing apparatus using the bonded body
CN101890590A (en) * 2010-07-01 2010-11-24 哈尔滨工业大学 Composite soldering material for soldering titanium alloy and ceramic or ceramic matrix composition material and method for soldering by using same

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