JPS6122626A - 投影露光装置 - Google Patents
投影露光装置Info
- Publication number
- JPS6122626A JPS6122626A JP59143465A JP14346584A JPS6122626A JP S6122626 A JPS6122626 A JP S6122626A JP 59143465 A JP59143465 A JP 59143465A JP 14346584 A JP14346584 A JP 14346584A JP S6122626 A JPS6122626 A JP S6122626A
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- light
- projection
- image
- point
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59143465A JPS6122626A (ja) | 1984-07-10 | 1984-07-10 | 投影露光装置 |
| US06/753,258 US4682037A (en) | 1984-07-10 | 1985-07-09 | Projection exposure apparatus having an alignment light of a wavelength other than that of the exposure light |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59143465A JPS6122626A (ja) | 1984-07-10 | 1984-07-10 | 投影露光装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6122626A true JPS6122626A (ja) | 1986-01-31 |
| JPH0510815B2 JPH0510815B2 (enrdf_load_stackoverflow) | 1993-02-10 |
Family
ID=15339335
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59143465A Granted JPS6122626A (ja) | 1984-07-10 | 1984-07-10 | 投影露光装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6122626A (enrdf_load_stackoverflow) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63107139A (ja) * | 1986-10-24 | 1988-05-12 | Nikon Corp | 感光基板のアライメント方法 |
| WO2007020951A1 (ja) | 2005-08-12 | 2007-02-22 | Jfe Steel Corporation | 2ピ−ス缶用ラミネート鋼板、2ピ−ス缶の製造方法および2ピ−スラミネート缶 |
| WO2007020948A1 (ja) | 2005-08-12 | 2007-02-22 | Jfe Steel Corporation | 2ピ−ス缶の製造方法および2ピ−スラミネ−ト缶 |
| US8365570B2 (en) | 2005-08-12 | 2013-02-05 | Jfe Steel Corporation | Can body for laminated steel sheet two-piece can and method for manufacturing can body |
-
1984
- 1984-07-10 JP JP59143465A patent/JPS6122626A/ja active Granted
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63107139A (ja) * | 1986-10-24 | 1988-05-12 | Nikon Corp | 感光基板のアライメント方法 |
| WO2007020951A1 (ja) | 2005-08-12 | 2007-02-22 | Jfe Steel Corporation | 2ピ−ス缶用ラミネート鋼板、2ピ−ス缶の製造方法および2ピ−スラミネート缶 |
| WO2007020948A1 (ja) | 2005-08-12 | 2007-02-22 | Jfe Steel Corporation | 2ピ−ス缶の製造方法および2ピ−スラミネ−ト缶 |
| US8286459B2 (en) | 2005-08-12 | 2012-10-16 | Jfe Steel Corporation | Method for producing two-piece can and two-piece laminated can |
| US8365570B2 (en) | 2005-08-12 | 2013-02-05 | Jfe Steel Corporation | Can body for laminated steel sheet two-piece can and method for manufacturing can body |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0510815B2 (enrdf_load_stackoverflow) | 1993-02-10 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3275575B2 (ja) | 投影露光装置及び該投影露光装置を用いたデバイスの製造方法 | |
| US7528966B2 (en) | Position detection apparatus and exposure apparatus | |
| US6278514B1 (en) | Exposure apparatus | |
| US20070019176A1 (en) | Exposure apparatus and method | |
| US7826044B2 (en) | Measurement method and apparatus, and exposure apparatus | |
| TW200841003A (en) | Measurement apparatus, exposure apparatus, and semiconductor device fabrication method | |
| JP5473350B2 (ja) | 照明光学系、露光装置及びデバイスの製造方法 | |
| JPS6122626A (ja) | 投影露光装置 | |
| JPH07130636A (ja) | 位置検出装置及びそれを用いた半導体素子の製造方法 | |
| JP2579416B2 (ja) | リソグラフィ用の光学系 | |
| JP4730712B2 (ja) | 照明光学装置、露光装置、および露光方法 | |
| JP3047983B2 (ja) | 微細パターン転写方法およびその装置 | |
| JP3673731B2 (ja) | 露光装置及び方法 | |
| US4682037A (en) | Projection exposure apparatus having an alignment light of a wavelength other than that of the exposure light | |
| TW201013326A (en) | Exposure apparatus and method of manufacturing device | |
| JP4055471B2 (ja) | 光学装置、位置検出装置、露光装置及びマイクロデバイスの製造方法 | |
| JPH08298238A (ja) | 投影露光装置 | |
| JP2007299891A (ja) | 光源ユニット、照明光学系、露光装置及びデバイスの製造方法 | |
| JP4337149B2 (ja) | 位置検出装置、露光装置及びデバイス製造方法 | |
| JP2897085B2 (ja) | 水平位置検出装置及びそれを備えた露光装置 | |
| JP4581743B2 (ja) | 照明光学装置、露光装置及びマイクロデバイス製造方法 | |
| JPH0922868A (ja) | 投影露光装置及びそれを用いた半導体デバイスの製造方法 | |
| JPH06324472A (ja) | 露光用原板及びそれを用いた投影露光装置 | |
| JPH04139715A (ja) | 投影露光装置及び素子製造方法 | |
| JP2004354230A (ja) | 位置検出装置、露光装置および露光方法 |