JPS6122626A - 投影露光装置 - Google Patents

投影露光装置

Info

Publication number
JPS6122626A
JPS6122626A JP59143465A JP14346584A JPS6122626A JP S6122626 A JPS6122626 A JP S6122626A JP 59143465 A JP59143465 A JP 59143465A JP 14346584 A JP14346584 A JP 14346584A JP S6122626 A JPS6122626 A JP S6122626A
Authority
JP
Japan
Prior art keywords
wafer
light
projection
image
point
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59143465A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0510815B2 (enrdf_load_stackoverflow
Inventor
Masao Kosugi
小杉 雅夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP59143465A priority Critical patent/JPS6122626A/ja
Priority to US06/753,258 priority patent/US4682037A/en
Publication of JPS6122626A publication Critical patent/JPS6122626A/ja
Publication of JPH0510815B2 publication Critical patent/JPH0510815B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59143465A 1984-07-10 1984-07-10 投影露光装置 Granted JPS6122626A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP59143465A JPS6122626A (ja) 1984-07-10 1984-07-10 投影露光装置
US06/753,258 US4682037A (en) 1984-07-10 1985-07-09 Projection exposure apparatus having an alignment light of a wavelength other than that of the exposure light

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59143465A JPS6122626A (ja) 1984-07-10 1984-07-10 投影露光装置

Publications (2)

Publication Number Publication Date
JPS6122626A true JPS6122626A (ja) 1986-01-31
JPH0510815B2 JPH0510815B2 (enrdf_load_stackoverflow) 1993-02-10

Family

ID=15339335

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59143465A Granted JPS6122626A (ja) 1984-07-10 1984-07-10 投影露光装置

Country Status (1)

Country Link
JP (1) JPS6122626A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63107139A (ja) * 1986-10-24 1988-05-12 Nikon Corp 感光基板のアライメント方法
WO2007020951A1 (ja) 2005-08-12 2007-02-22 Jfe Steel Corporation 2ピ−ス缶用ラミネート鋼板、2ピ−ス缶の製造方法および2ピ−スラミネート缶
WO2007020948A1 (ja) 2005-08-12 2007-02-22 Jfe Steel Corporation 2ピ−ス缶の製造方法および2ピ−スラミネ−ト缶
US8365570B2 (en) 2005-08-12 2013-02-05 Jfe Steel Corporation Can body for laminated steel sheet two-piece can and method for manufacturing can body

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63107139A (ja) * 1986-10-24 1988-05-12 Nikon Corp 感光基板のアライメント方法
WO2007020951A1 (ja) 2005-08-12 2007-02-22 Jfe Steel Corporation 2ピ−ス缶用ラミネート鋼板、2ピ−ス缶の製造方法および2ピ−スラミネート缶
WO2007020948A1 (ja) 2005-08-12 2007-02-22 Jfe Steel Corporation 2ピ−ス缶の製造方法および2ピ−スラミネ−ト缶
US8286459B2 (en) 2005-08-12 2012-10-16 Jfe Steel Corporation Method for producing two-piece can and two-piece laminated can
US8365570B2 (en) 2005-08-12 2013-02-05 Jfe Steel Corporation Can body for laminated steel sheet two-piece can and method for manufacturing can body

Also Published As

Publication number Publication date
JPH0510815B2 (enrdf_load_stackoverflow) 1993-02-10

Similar Documents

Publication Publication Date Title
JP3275575B2 (ja) 投影露光装置及び該投影露光装置を用いたデバイスの製造方法
US20080165368A1 (en) Position detection apparatus and exposure apparatus
US6278514B1 (en) Exposure apparatus
US20070019176A1 (en) Exposure apparatus and method
KR20110016400A (ko) 측정 장치, 노광 장치 및 디바이스 제조 방법
US7826044B2 (en) Measurement method and apparatus, and exposure apparatus
TW200841003A (en) Measurement apparatus, exposure apparatus, and semiconductor device fabrication method
JP5473350B2 (ja) 照明光学系、露光装置及びデバイスの製造方法
JPS6122626A (ja) 投影露光装置
JPH07130636A (ja) 位置検出装置及びそれを用いた半導体素子の製造方法
JP2579416B2 (ja) リソグラフィ用の光学系
JP4730712B2 (ja) 照明光学装置、露光装置、および露光方法
JP3673731B2 (ja) 露光装置及び方法
JPH04348019A (ja) 焦点位置検出装置及び投影露光装置
US4682037A (en) Projection exposure apparatus having an alignment light of a wavelength other than that of the exposure light
TW201013326A (en) Exposure apparatus and method of manufacturing device
JP4055471B2 (ja) 光学装置、位置検出装置、露光装置及びマイクロデバイスの製造方法
JP3313932B2 (ja) 投影露光装置
JP4337149B2 (ja) 位置検出装置、露光装置及びデバイス製造方法
JP2897085B2 (ja) 水平位置検出装置及びそれを備えた露光装置
JP4581743B2 (ja) 照明光学装置、露光装置及びマイクロデバイス製造方法
JPH0922868A (ja) 投影露光装置及びそれを用いた半導体デバイスの製造方法
JPH04139715A (ja) 投影露光装置及び素子製造方法
JP2004354230A (ja) 位置検出装置、露光装置および露光方法
JP2006128550A (ja) 露光装置及びマイクロデバイスの製造方法。