JPS61219954A - Formation of pattern by liquid crystal panel - Google Patents

Formation of pattern by liquid crystal panel

Info

Publication number
JPS61219954A
JPS61219954A JP60061234A JP6123485A JPS61219954A JP S61219954 A JPS61219954 A JP S61219954A JP 60061234 A JP60061234 A JP 60061234A JP 6123485 A JP6123485 A JP 6123485A JP S61219954 A JPS61219954 A JP S61219954A
Authority
JP
Japan
Prior art keywords
liquid crystal
pattern
substrate
crystal unit
pattern image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP60061234A
Other languages
Japanese (ja)
Inventor
Masao Watanabe
正夫 渡辺
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP60061234A priority Critical patent/JPS61219954A/en
Publication of JPS61219954A publication Critical patent/JPS61219954A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Liquid Crystal (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE:To form a pattern image in a short time by drawing the pattern image on a liquid crystal surface of a liquid crystal unit by supplying a plotting data to a control device, and executing an exposure by making a photoresist substrate adhere closely, and printing the pattern image onto the substrate. CONSTITUTION:A pattern plotting data 1 is inputted to a liquid crystal unit 10 through a control device 9. Subsequently, a pattern image is drawn on a liquid crystal surface of a liquid crystal unit 10. A substrate 7 coated with a photoresist is made to adhere closely to this liquid crystal surface, a light 8 is irradiated through the liquid crystal unit 10 from the opposite side of the substrate adherence surface, and a pattern is exposed on the substrate 7. Accordingly, the pattern is formed by using the liquid crystal unit 10 as a photomask, therefore, it is unnecessary to make an art work film, and it can be executed in a short time to plot the pattern.

Description

【発明の詳細な説明】 〔概要〕 液晶パネルをフォトマスクとして使用してパターンを形
成する方法であって、液晶ユニットにプリント板のパタ
ーン作図データを入力し、液晶面にパターン画像を描写
することにより、アートワークのフォトマスクとして直
接基板上にパターン画像を焼付ける。
[Detailed Description of the Invention] [Summary] A method of forming a pattern using a liquid crystal panel as a photomask, which involves inputting pattern drawing data of a printed board to a liquid crystal unit and drawing a pattern image on the liquid crystal surface. The pattern image is printed directly onto the substrate as a photomask for the artwork.

〔産業上の利用分野〕[Industrial application field]

本発明はプリント基板の画像焼付等に用いられるパター
ン形成方法に係り、特にアートワークフィルムの代わり
に液晶ユニットを用い、作図データにより描画された液
晶面のパターン画像を、直接プリント基板上に露光可能
ならしめる液晶パネルによるパターン形成方法に関する
The present invention relates to a pattern forming method used for printing images on printed circuit boards, etc., and in particular uses a liquid crystal unit instead of an artwork film, making it possible to directly expose a pattern image drawn on the liquid crystal surface based on drawing data onto the printed circuit board. The present invention relates to a pattern forming method using a liquid crystal panel.

一般に電子機器はプリント配線板に回路部品が搭載され
て構成されている。プリント配線板は絶縁基板上に回路
部品を接続する電気配線を、回路設計に基づいて配線図
形に表現したものである。
Generally, electronic devices are constructed by mounting circuit components on a printed wiring board. A printed wiring board is a wiring diagram that represents electrical wiring that connects circuit components on an insulating substrate based on a circuit design.

上記プリント配線板を製造する為には、まず設計図から
回路パターンのフィルム原版を作製する。
In order to manufacture the above-mentioned printed wiring board, first, a film original of a circuit pattern is prepared from a design drawing.

このフィルム原版は通常DA方式では、電子計算機を用
いて自動的に作成された自動製図用テープによりパター
ンをフィルム化する。次ぎに、このフィルムを用いて感
光剤を塗った銅張積層板を露光焼付し、エツチング等の
処理を行いプリント配線板を作る。
In the DA method, this film original plate is usually made into a film by using an automatic drafting tape that is automatically created using an electronic computer. Next, using this film, a copper-clad laminate coated with a photosensitizer is exposed and baked and subjected to etching and other treatments to produce a printed wiring board.

最近は電算機の高性能化に伴い、プリント基板は高密度
化、大型化されいる。それに伴いプリント板の積層数の
増加、パターンも微細化され、その為、回路設計に基づ
いた配線も複雑になり、プリント板各層のアートワーク
フィルム(プリント基板フォトマスク)のパターン作図
に長時間を要すると云う問題があり、パターン作図が短
時間にできるようなパターン形成方法が要望されている
Recently, as computers have become more sophisticated, printed circuit boards have become denser and larger. Along with this, the number of laminated layers of printed circuit boards has increased and patterns have become finer. As a result, wiring based on circuit design has become more complex, and it takes a long time to draw patterns for artwork films (printed circuit board photomasks) for each layer of printed circuit boards. There is a need for a pattern forming method that allows pattern drawing to be performed in a short time.

〔従来の技術〕[Conventional technology]

従来、■プリント基板上へパターン画像を焼付ける場合
、第2図に示すようにパターン作図データ1を制御装置
2を経由して、XYプロッタ方式の専用作図機3に入力
し、光ヘッド4の機械式シャッタの0N10FFにより
フィルム5上にパターンを順次露光作図する。
Conventionally, when printing a pattern image onto a printed circuit board, as shown in FIG. Patterns are sequentially exposed and drawn on the film 5 using a mechanical shutter of 0N10FF.

■上記作図したフィルム5 (アートワークフィルム)
を現像、焼付、編集し、修正等の工程を経て原図フィル
ムを得る。そして実際の作業には、この原図フィルムを
コピーし作業用フィルム6として用いる。
■Film 5 drawn above (artwork film)
The original film is obtained through processes such as developing, printing, editing, and corrections. In the actual work, this original film is copied and used as the work film 6.

■上記作業用フィルム6に7オトレジストをコーティン
グした基板7を密着し、光源8の光り照射により基板上
にパターン画像を露光する。
(2) A substrate 7 coated with 7-photoresist is closely attached to the working film 6, and a pattern image is exposed on the substrate by light irradiation from a light source 8.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

最近は電算機の高性能化に伴い、プリント板は高密度化
、大型化され、それに伴いプリント基板の積層数の増加
、パターンの微細化がされている。
Recently, as computers have become more sophisticated, printed circuit boards have become denser and larger, and accordingly, the number of laminated layers of printed circuit boards has increased and patterns have become finer.

プリント板の製造に用いられる従来のアートワークフィ
ルムは、回路設計に基づいたパターン作図データにより
XYブロック方式の専用作図機3の光ヘッド4を動かし
、光ヘラ、ドの機械式シャッタを0N10FF して、
フィルム5上にパターンを順次露光しアートワークフィ
ルムを作成している。その為に、アートワークフィルム
のパターン作図に長時間を要する。
Conventional artwork films used in the manufacture of printed circuit boards are produced by moving the optical head 4 of a dedicated drawing machine 3 using an XY block method using pattern drawing data based on circuit design, and by using an optical spatula and a mechanical shutter of 0N10FF. ,
Patterns are sequentially exposed on the film 5 to create an artwork film. Therefore, it takes a long time to draw patterns for artwork films.

また、アートワークフィルムの現像、編集、修正等の作
成工程及び検査の為に高度の専用設備が必要であり、さ
らに手番、費用を要する。
In addition, highly specialized equipment is required for the creation process such as developing, editing, and correcting the artwork film, as well as for inspection, which further requires additional steps and costs.

本発明はこのような点にかんがみて創作されたもので、
アートワークフィルムの作成工程が省略され、アートワ
ーク専用設備の削減、製造工程が短縮出来るような液晶
パネルによるパターン形成方法を提供することを目的と
している。
The present invention was created in view of these points.
The purpose of the present invention is to provide a pattern forming method using a liquid crystal panel that can omit the step of creating an artwork film, reduce the need for artwork-specific equipment, and shorten the manufacturing process.

〔問題点を解決するための手段〕[Means for solving problems]

第1図は本発明の詳細な説明する実施例図を示す。 FIG. 1 shows a detailed illustration of an embodiment of the invention.

第1図において、1はパターン作図データで、回路設計
に基づいた配線図形データである。9は制御装置で、人
力したパターン作図データ(プリント板各層のパターン
画像)を液晶ユニット10に入力し、液晶ユニット10
上に表示制御する。
In FIG. 1, numeral 1 indicates pattern drawing data, which is wiring diagram data based on circuit design. 9 is a control device that inputs manually generated pattern drawing data (pattern images of each layer of the printed board) to the liquid crystal unit 10;
Control the display on top.

この描画された液晶ユニット10をプリント基板フォト
マスクとして、フォトレジストをコーティングした基板
7と密着し、光源8の光り照射により液晶ユニット10
に描画されたパターン画像Aが基板7上に露光し焼き付
けられる。
The drawn liquid crystal unit 10 is used as a printed circuit board photomask, and is brought into close contact with the substrate 7 coated with photoresist, and the liquid crystal unit 10 is exposed by light irradiation from the light source 8.
The pattern image A drawn on the substrate 7 is exposed and printed on the substrate 7.

〔作用〕[Effect]

即ち、パターン作図データ1を制御装置9を経由して液
晶ユニットに10に入力し、液晶ユニット10の液晶面
にパターン画像を描画する。この液晶ユニット10の描
画された液晶面とフォトレジストをコーティングした基
板7を密着し、基板密着面の反対方向より液晶ユニッ目
Oを介して光りを照射し、基板7上にパターン画像を露
光する。
That is, pattern drawing data 1 is input to the liquid crystal unit 10 via the control device 9, and a pattern image is drawn on the liquid crystal surface of the liquid crystal unit 10. The drawn liquid crystal surface of the liquid crystal unit 10 and the substrate 7 coated with photoresist are brought into close contact with each other, and light is irradiated from the opposite direction of the substrate contact surface through the liquid crystal unit eyes O to expose a pattern image on the substrate 7. .

本発明では、液晶ユニット10をフォトマスクとして使
ってパターンを形成することにより、従来のアートワー
クフィルムを必要としない。その結果、フィルムを作る
為のパターン作図とフィルム作成工程がなくなる。
The present invention eliminates the need for conventional artwork films by using the liquid crystal unit 10 as a photomask to form patterns. As a result, pattern drawing and film production steps for making the film are eliminated.

〔実施例〕〔Example〕

第1図は本発明の詳細な説明する実施例斜視図である。 FIG. 1 is a perspective view of an embodiment of the present invention.

なお、全図を通し共通する符号は同一対象物を示す。Note that common symbols throughout all figures indicate the same objects.

図において、1はパターン作図データで、回路設計に基
づいた配線図形データである。9は制御装置で、入力し
たパターン作図データ(プリント板各層のパターン画像
)を液晶ユニット10に入力し、液晶エニン1−10上
に表示制御する。
In the figure, 1 is pattern drawing data, which is wiring diagram data based on circuit design. 9 is a control device which inputs the input pattern drawing data (pattern images of each layer of the printed board) to the liquid crystal unit 10 and controls the display on the liquid crystal unit 1-10.

また、7は各層のフォトレジストをコーティングした基
板である。
Further, 7 is a substrate coated with each layer of photoresist.

液晶ユニット10の液晶画像表示面に上記基板7を密着
する。
The substrate 7 is brought into close contact with the liquid crystal image display surface of the liquid crystal unit 10.

基板密′着面の反対方向より、液晶ユニット10を介し
て光源8の光りを照射し、基板7上にパターン画像を露
光する。
Light from a light source 8 is irradiated through the liquid crystal unit 10 from the opposite direction to the surface in close contact with the substrate to expose a pattern image on the substrate 7.

このようにパターン作図データ1を液晶ユニッ1−10
に描写したパターン画像Aを、アートワークフィルム(
作業用フィルム6)の代わりに用いて基板7を露光する
ことにより、短時間にパターン画像を形成することが出
来る。
In this way, the pattern drawing data 1 is transferred to the liquid crystal unit 1-10.
The pattern image A drawn on the artwork film (
By exposing the substrate 7 to light using the work film 6), a pattern image can be formed in a short time.

液晶ユニット10の大きさを、例えば基板7の大きさく
例えば500 mX500 m)に合わせ、パターン作
図データ1を制御装置9により液晶ユニット10の液晶
面に描画し終わったらクリアして、次の基Vi、7を送
り込み密着露光することによりオートマチックに行うこ
とも可能である。
The size of the liquid crystal unit 10 is adjusted to match the size of the substrate 7 (for example, 500 m x 500 m), and when the pattern drawing data 1 has been drawn on the liquid crystal surface of the liquid crystal unit 10 by the control device 9, it is cleared and the next base Vi , 7 can also be carried out automatically by sending in contact exposure.

なお、液晶ユニット10を介した光りに屈折率の問題が
あれば、それはパターン作図データ1を予め補正してお
けばよい。
Note that if there is a problem with the refractive index of light passing through the liquid crystal unit 10, it is sufficient to correct the pattern drawing data 1 in advance.

以上のようにパターン作図データの基板7への露光に、
従来のアートワークフィルム(作業用フィルム6)を必
要としないので、フィルムの作成工程が省略され、アー
トワーク専用設備の削減及び基板製造工程の短縮が図れ
る。
As described above, in exposing the pattern drawing data to the substrate 7,
Since the conventional artwork film (working film 6) is not required, the film production process is omitted, and the need for artwork-dedicated equipment and the board manufacturing process can be shortened.

また、アートワークフィルムの保管の必要がなく、さら
に作図データのデータベース化により基板への焼付が効
率的にオンライン処理される。
In addition, there is no need to store artwork film, and printing on substrates can be efficiently processed online by creating a database of drawing data.

〔発明の効果〕〔Effect of the invention〕

以上説明したように、本発明によれば液晶ユニットの液
晶面にパターン作図データを描画することにより、アー
トワークフィルムの作成工程の省略と専用設備が削減さ
れ、プリント基板製造工程の短縮が図れる。さらに、ア
ートワークフィルム保管の不要とオンライン処理も可能
である。
As described above, according to the present invention, by drawing pattern drawing data on the liquid crystal surface of the liquid crystal unit, the step of creating an artwork film can be omitted, the dedicated equipment can be reduced, and the printed circuit board manufacturing process can be shortened. Furthermore, there is no need for artwork film storage and online processing is possible.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の詳細な説明する実施例斜視図、第2図
は従来のプリント基板フォトマスクによるパターン形成
法の説明図である。 図において、 1はパターン作図データ、 7は基板、 8は光源、 9は制御装置、 、Lel’l’lJJ!ttiJLJJ]f3’j’狂
少1ffl易 I R イ良釆qプリント遵オタフイトマス71二よ5ノ\°タ
ーノ形FE、斌q鋭旦η図%  2  旦ゴ
FIG. 1 is a perspective view of an embodiment of the present invention, and FIG. 2 is an explanatory diagram of a conventional pattern forming method using a printed circuit board photomask. In the figure, 1 is pattern drawing data, 7 is a substrate, 8 is a light source, 9 is a control device, ,Lel'l'lJJ! ttiJLJJ] f3'j' crazy 1ffl easy I R Irako q print Zon Otafitmass 71 2yo 5 no\° turn shape FE, 斌q sharptan η figure % 2 Dango

Claims (1)

【特許請求の範囲】[Claims] 作図データ(1)を制御装置(9)を経由して液晶ユニ
ット(10)に入力し、該液晶面上にパターン画像等を
描写し、該液晶描写面をフォトレジストを塗布した基板
(7)に密着し、該基板密着面の反対方向より液晶ユニ
ット(10)を介し光を照射し、基板(7)上にパター
ン画像等を露光可能ならしめる液晶パネルによるパター
ン形成方法。
Drawing data (1) is input to a liquid crystal unit (10) via a control device (9), a pattern image, etc. is drawn on the liquid crystal surface, and the liquid crystal drawing surface is coated with a photoresist (7). A method of forming a pattern using a liquid crystal panel that is brought into close contact with a substrate (7) and irradiated with light through a liquid crystal unit (10) from a direction opposite to the surface in close contact with the substrate, thereby making it possible to expose a pattern image, etc. onto the substrate (7).
JP60061234A 1985-03-26 1985-03-26 Formation of pattern by liquid crystal panel Pending JPS61219954A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60061234A JPS61219954A (en) 1985-03-26 1985-03-26 Formation of pattern by liquid crystal panel

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60061234A JPS61219954A (en) 1985-03-26 1985-03-26 Formation of pattern by liquid crystal panel

Publications (1)

Publication Number Publication Date
JPS61219954A true JPS61219954A (en) 1986-09-30

Family

ID=13165327

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60061234A Pending JPS61219954A (en) 1985-03-26 1985-03-26 Formation of pattern by liquid crystal panel

Country Status (1)

Country Link
JP (1) JPS61219954A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02120741A (en) * 1988-10-31 1990-05-08 Ushio Inc Aligner and marking method using such device
JPH02273719A (en) * 1989-04-17 1990-11-08 Casio Comput Co Ltd Substrate index forming method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02120741A (en) * 1988-10-31 1990-05-08 Ushio Inc Aligner and marking method using such device
JPH02273719A (en) * 1989-04-17 1990-11-08 Casio Comput Co Ltd Substrate index forming method

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