JPH02120741A - Aligner and marking method using such device - Google Patents

Abstract

PURPOSE:To facilitate desired pattern marking without replacing a reticle by providing a liquid crystal display board being a reticle, and a system controller for sending a display signal to this display board. CONSTITUTION:A work 25 is placed on a table 3 which can move in the X-Y directions, a table controller 23 is driven by a command of a system controller 22, and the work 25 is moved to a prescribed position. Simultaneously, by driving a liquid crystal driving circuit 21, a pattern to be brought to marking is formed on a liquid crystal display board 20, and in accordance with this pattern, transmission of a light beam from a lamp 13 is controlled. Simultaneously, the developing the aligned work 25, marking is executed. When the work 25 is a printed board, etc., the marking pattern is aligned before or after an aligning process for forming a circuit pattern, and as soon as the circuit pattern is formed, marking is executed.

Description

DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an exposure device for pattern transfer and a marking method for marking numerals 9, etc. using this exposure device.

[Prior Art] Various apparatuses and methods for exposing a pattern to an object to be marked have been used in the past.

FIG. 2 is a diagram schematically showing the main parts of a conventional exposure apparatus for marking semiconductor wafers.

The exposure method for the exposure apparatus shown in FIG. 2 will be explained below.

First, a wafer 1 coated with a photosensitive agent 2 at a position to be marked is placed on a table 3 that is movable in the X-Y axis directions. in place. Next, according to a command from the system controller 5, the pulse motor 6 is driven to rotate the rotary mask 7 on which a pattern such as one character, one number, one figure, etc. is punched out, and a pattern such as a character to be marked is selected. . Then, in response to a command from the system controller 5, the shutter 9 is opened, and the light from the lamp 13 is transmitted from the elliptical condenser mirror 12 to the lens 11.
It is irradiated via a reflecting mirror IO. Then, the selected pattern is exposed and the shutter 9 is closed. When the exposure of one character is completed, the cheatle 3 and the rotary mask 7 are driven again by the table controller 4 and the pulse motor 6, respectively, according to a command from the system controller 5, and then the shutter 9 is opened to expose the next character. Thereafter, the same operation is repeated to expose necessary characters at the marking positions. After exposure, the wafer 1 is removed from the table 3, carried out, and subjected to a developing process and an etching process to form markings.

Further, FIG. 3 is a diagram schematically showing the main parts of a conventional exposure apparatus for marking a bar code or the like on a substrate.

In FIG. 3, a roll film 32 on which a barcode pattern has been punched is moved to a gear wheel 3 by a pulse motor 34 in order to expose a predetermined location of a substrate 31 made of liquid crystal or the like.
5.36, and arrange it so that the predetermined location on the substrate 31 to be marked and the barcode pattern on the roll film 32 overlap. Then, light is irradiated from the exposure lens barrel 37 to expose a predetermined location of the substrate 31 through the punched hole of the barcode 33.

[Problems to be Solved by the Invention] The conventional exposure apparatus and method using the apparatus described above have the following drawbacks.

That is, when using a rotary mask, the patterns that can be marked are limited because a specific rotary mask is used, and as a result, it is not convenient for transferring patterns such as a wider variety of characters. Furthermore, there is also the problem that the control mechanism for the rotary mask is complicated and expensive.

Further, when using a roll film, there is a drawback that only the arranged characters and patterns of the film can be transferred. Therefore, for high-mix, low-volume production, a large number of films must be prepared, resulting in an increase in cost.

Particularly, when marking different patterns on each workpiece (object to be marked), such as lot number marking, etc., whether using a rotary mask or a roll film.

In any case, it takes time to select a pattern, and it is a slow process.

In addition, in the case of circuit patterns such as printed circuit boards or objects to be marked, the reticle must be replaced for different types of production, which is cumbersome, and furthermore, it is costly to prepare different reticles for each type. The problem is that the cost is high.

The present invention has been made to solve these problems, and it is an object of the present invention to provide an exposure device for pattern transfer that is suitable for high-mix low-volume production, has good throughput, and is low in cost, and a marking method using this exposure device. purpose.

[Means for Solving the Problems] In order to achieve the above object, the exposure apparatus of the first invention includes an exposure light source, a liquid crystal display plate used as a reticle,
This liquid crystal display board is equipped with a system controller that sends a display signal of a pattern to be exposed via a liquid crystal drive circuit, and the second invention uses this exposure device to expose a pattern to be marked, Thereafter, a pattern is marked on the object by developing and etching.

[Operation] By using the above-mentioned apparatus, there is no need to change the reticle even for different types of substrates, and desired pattern marking can be easily performed.

[Embodiment] FIG. 1 is a diagram showing a schematic configuration of the main parts of an exposure apparatus of the present invention.

- In Figure 1, 20 is a liquid crystal display plate (hereinafter referred to as LCD) used as a reticle, 13 is a short arc type ultra-high pressure mercury lamp (hereinafter referred to as lamp), and 14 is a cold mirror that transmits heat rays and reflects only ultraviolet rays. An elliptical condensing mirror; 15 is a first plane reflecting mirror made of a cold mirror; 16 is L as a reticle out of the light from the lamp 13;
17 is an inch crater lens; 18 is a second plane A reflecting mirror, 19 a condenser lens, 21 a liquid crystal drive circuit for driving the LCD 20, 22 a system controller, and 23 a table 3.
24 is a workpiece 25
This is an imaging lens that transmits light through the LCD 20 and forms an image.

In the exposure apparatus of FIG. 1, first, as in FIG. 2, the workpiece 25 is placed on the table 3 movable in the X-Y axis directions,
In response to a command from the system controller 22, the table controller 23 is driven to place the workpiece 25 at a predetermined position. At the same time, the LCD 2 is driven by driving the liquid crystal drive circuit 21.
0, and the transmission of light from the lamp 13 is controlled according to this pattern.

In the case of the photographic method, the workpiece 25 coated with a photosensitive agent is exposed to light that has passed through a pattern formed on the LCD 20, and is developed and marked. Furthermore, if the workpiece 25 is an object to be marked, such as an LCD board or a printed circuit board, or has a circuit pattern forming process, the workpiece 25 coated with resist may be exposed before the exposure process for forming the circuit pattern. Alternatively, later, the marking pattern formed on the LCD 20 is exposed to transmitted light, and then marking is performed along with the formation of the circuit pattern through a development and etching process performed as a post-processing of the exposure process for forming the circuit pattern.

The exposure apparatus of the present invention is not necessarily suitable for exposure for forming circuit patterns of ICs, LSIs, etc. However, Twisted N (Twisted N
If you use an LCD (ematic) type LCD etc. as a reticle,
This exposure device can be used to form circuit patterns on printed circuit boards by blurring the intervals between the dots on the LCD as a reticle using an imaging lens, making it effective in the prototyping stage for high-mix, low-volume production. It is.

[Effects of the Invention] As explained above, according to the present invention, various patterns can be freely exposed using one reticle, and marking can be performed at high throughput and at low cost using this apparatus. , ideal for producing a wide variety of products.

[Brief explanation of the drawing]

FIG. 1 is a diagram showing a schematic configuration of the main parts of the exposure apparatus of the present invention, FIG. 2 is a diagram showing the outline of the main parts of a conventional exposure apparatus for marking semiconductors and wafers, and FIG. 3 is a diagram showing the outline of the main parts of the exposure apparatus of the present invention. 1 is a diagram schematically showing the main parts of a conventional exposure apparatus for marking barcodes and the like on objects. In the figure. 3: Table l-coni lamp 14: Elliptical condensing mirror 15.18: Plane reflecting mirror 16:
Filter 17: Inch crater lens 19: Condenser lens 20: LCD 21: Liquid crystal drive circuit 22: 23= 24: 25 system controller table controller imaging lens work agent patent attorney 1) Haru Kitatake Diagram

Claims (2)

[Claims] (1) An exposure apparatus comprising an exposure light source, a liquid crystal display plate used as a reticle, and a system controller that sends a display signal of a pattern to be exposed to the liquid crystal display plate via a liquid crystal drive circuit. (2) For the object to be marked coated with resist,
A marking method, comprising: exposing a pattern to be marked using the exposure apparatus according to claim 1, and then developing and etching the pattern to mark the object to be marked.