JPS61214420A - 電解コンデンサ用陰極材料 - Google Patents
電解コンデンサ用陰極材料Info
- Publication number
- JPS61214420A JPS61214420A JP60055543A JP5554385A JPS61214420A JP S61214420 A JPS61214420 A JP S61214420A JP 60055543 A JP60055543 A JP 60055543A JP 5554385 A JP5554385 A JP 5554385A JP S61214420 A JPS61214420 A JP S61214420A
- Authority
- JP
- Japan
- Prior art keywords
- base material
- film
- capacitance
- average
- less
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010406 cathode material Substances 0.000 title claims description 15
- 239000003990 capacitor Substances 0.000 title claims description 10
- 239000000463 material Substances 0.000 claims description 29
- 229910052751 metal Inorganic materials 0.000 claims description 18
- 239000002184 metal Substances 0.000 claims description 18
- 229910052782 aluminium Inorganic materials 0.000 claims description 14
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 14
- 239000011888 foil Substances 0.000 claims description 11
- 230000000694 effects Effects 0.000 description 8
- 238000005530 etching Methods 0.000 description 8
- 229910052719 titanium Inorganic materials 0.000 description 6
- 239000010936 titanium Substances 0.000 description 6
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 239000011261 inert gas Substances 0.000 description 3
- 238000007788 roughening Methods 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 239000010405 anode material Substances 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- -1 3 i Inorganic materials 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000000866 electrolytic etching Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 210000004955 epithelial membrane Anatomy 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- WYXIGTJNYDDFFH-UHFFFAOYSA-Q triazanium;borate Chemical compound [NH4+].[NH4+].[NH4+].[O-]B([O-])[O-] WYXIGTJNYDDFFH-UHFFFAOYSA-Q 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
- Primary Cells (AREA)
- Secondary Cells (AREA)
- Electric Double-Layer Capacitors Or The Like (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60055543A JPS61214420A (ja) | 1985-03-19 | 1985-03-19 | 電解コンデンサ用陰極材料 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60055543A JPS61214420A (ja) | 1985-03-19 | 1985-03-19 | 電解コンデンサ用陰極材料 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61214420A true JPS61214420A (ja) | 1986-09-24 |
| JPH0263284B2 JPH0263284B2 (enExample) | 1990-12-27 |
Family
ID=13001624
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60055543A Granted JPS61214420A (ja) | 1985-03-19 | 1985-03-19 | 電解コンデンサ用陰極材料 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61214420A (enExample) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63160323A (ja) * | 1986-12-24 | 1988-07-04 | 昭和アルミニウム株式会社 | 電解コンデンサ用アルミニウム電極材料の製造方法 |
| JPS63160322A (ja) * | 1986-12-24 | 1988-07-04 | 昭和アルミニウム株式会社 | 電解コンデンサ用アルミニウム電極材料 |
| US4970626A (en) * | 1987-07-30 | 1990-11-13 | Matsushita Electric Industrial Co., Ltd. | Electrolytic capacitor and method of preparing it |
| JP2000012400A (ja) * | 1998-06-19 | 2000-01-14 | Nichicon Corp | アルミニウム電解コンデンサ用電極箔 |
| JPWO2016174807A1 (ja) * | 2015-04-28 | 2018-02-22 | パナソニックＩｐマネジメント株式会社 | 電解コンデンサ |
| JPWO2016174806A1 (ja) * | 2015-04-28 | 2018-02-22 | パナソニックＩｐマネジメント株式会社 | 電解コンデンサ |
| JPWO2016189779A1 (ja) * | 2015-05-28 | 2018-03-22 | パナソニックＩｐマネジメント株式会社 | 電解コンデンサ |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4415990B2 (ja) * | 2004-08-05 | 2010-02-17 | パナソニック株式会社 | コンデンサ用アルミニウム電極箔の製造方法およびエッチング用アルミニウム箔 |
-
1985
- 1985-03-19 JP JP60055543A patent/JPS61214420A/ja active Granted
Cited By (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63160323A (ja) * | 1986-12-24 | 1988-07-04 | 昭和アルミニウム株式会社 | 電解コンデンサ用アルミニウム電極材料の製造方法 |
| JPS63160322A (ja) * | 1986-12-24 | 1988-07-04 | 昭和アルミニウム株式会社 | 電解コンデンサ用アルミニウム電極材料 |
| US4970626A (en) * | 1987-07-30 | 1990-11-13 | Matsushita Electric Industrial Co., Ltd. | Electrolytic capacitor and method of preparing it |
| JP2000012400A (ja) * | 1998-06-19 | 2000-01-14 | Nichicon Corp | アルミニウム電解コンデンサ用電極箔 |
| JP2021121037A (ja) * | 2015-04-28 | 2021-08-19 | パナソニックＩｐマネジメント株式会社 | 電解コンデンサおよびその製造方法 |
| JPWO2016174806A1 (ja) * | 2015-04-28 | 2018-02-22 | パナソニックＩｐマネジメント株式会社 | 電解コンデンサ |
| US10896783B2 (en) | 2015-04-28 | 2021-01-19 | Panasonic Intellectual Property Management Co., Ltd. | Electrolytic capacitor |
| JPWO2016174807A1 (ja) * | 2015-04-28 | 2018-02-22 | パナソニックＩｐマネジメント株式会社 | 電解コンデンサ |
| JP2021145135A (ja) * | 2015-04-28 | 2021-09-24 | パナソニックＩｐマネジメント株式会社 | 電解コンデンサおよびその製造方法 |
| US11348739B2 (en) | 2015-04-28 | 2022-05-31 | Panasonic Intellectual Property Management Co., Ltd. | Electrolytic capacitor |
| JP2023053035A (ja) * | 2015-04-28 | 2023-04-12 | パナソニックＩｐマネジメント株式会社 | 電解コンデンサ |
| JPWO2016189779A1 (ja) * | 2015-05-28 | 2018-03-22 | パナソニックＩｐマネジメント株式会社 | 電解コンデンサ |
| US10790098B2 (en) | 2015-05-28 | 2020-09-29 | Panasonic Intellectual Property Management Co., Ltd. | Electrolytic capacitor |
| JP2021145136A (ja) * | 2015-05-28 | 2021-09-24 | パナソニックＩｐマネジメント株式会社 | 電解コンデンサおよびその製造方法 |
| JP2023053037A (ja) * | 2015-05-28 | 2023-04-12 | パナソニックＩｐマネジメント株式会社 | 電解コンデンサ |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0263284B2 (enExample) | 1990-12-27 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| EXPY | Cancellation because of completion of term |