JPS61207566A - セラミツク溶射皮膜形成方法 - Google Patents

セラミツク溶射皮膜形成方法

Info

Publication number
JPS61207566A
JPS61207566A JP60047400A JP4740085A JPS61207566A JP S61207566 A JPS61207566 A JP S61207566A JP 60047400 A JP60047400 A JP 60047400A JP 4740085 A JP4740085 A JP 4740085A JP S61207566 A JPS61207566 A JP S61207566A
Authority
JP
Japan
Prior art keywords
alloy
thermal
base material
spray coating
sprayed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60047400A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0515781B2 (enrdf_load_stackoverflow
Inventor
Isamu Asakawa
浅川　勇
Yoshio Machida
町田　芳雄
Katsuyuki Shirai
勝之 白井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Holdings Corp
Original Assignee
Showa Denko KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Denko KK filed Critical Showa Denko KK
Priority to JP60047400A priority Critical patent/JPS61207566A/ja
Publication of JPS61207566A publication Critical patent/JPS61207566A/ja
Priority to US07/408,951 priority patent/US5204189A/en
Publication of JPH0515781B2 publication Critical patent/JPH0515781B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Coating By Spraying Or Casting (AREA)
JP60047400A 1985-03-12 1985-03-12 セラミツク溶射皮膜形成方法 Granted JPS61207566A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP60047400A JPS61207566A (ja) 1985-03-12 1985-03-12 セラミツク溶射皮膜形成方法
US07/408,951 US5204189A (en) 1985-03-12 1989-09-18 Heat-sensitive transferring recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60047400A JPS61207566A (ja) 1985-03-12 1985-03-12 セラミツク溶射皮膜形成方法

Publications (2)

Publication Number Publication Date
JPS61207566A true JPS61207566A (ja) 1986-09-13
JPH0515781B2 JPH0515781B2 (enrdf_load_stackoverflow) 1993-03-02

Family

ID=12774059

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60047400A Granted JPS61207566A (ja) 1985-03-12 1985-03-12 セラミツク溶射皮膜形成方法

Country Status (1)

Country Link
JP (1) JPS61207566A (enrdf_load_stackoverflow)

Cited By (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63274751A (ja) * 1987-05-01 1988-11-11 Toyota Motor Corp セラミック溶射部材
US4885213A (en) * 1986-11-05 1989-12-05 Toyota Jidosha Kabushiki Kaisha Ceramic-sprayed member and process for making the same
US5204302A (en) * 1991-09-05 1993-04-20 Technalum Research, Inc. Catalyst composition and a method for its preparation
EP0707091A1 (en) * 1994-09-16 1996-04-17 Praxair S.T. Technology, Inc. Zirconia-based tipped blades having macrocracked structure and process for producing it
FR2763259A1 (fr) * 1997-05-16 1998-11-20 Ecia Equip Composants Ind Auto Catalyseur en materiau composite, convertisseur muni d'un tel catalyseur et procede pour sa fabrication
JP2006097042A (ja) * 2004-09-28 2006-04-13 Hitachi Ltd 遮熱被覆を有する耐熱部材およびガスタービン
US7137353B2 (en) 2002-09-30 2006-11-21 Tokyo Electron Limited Method and apparatus for an improved deposition shield in a plasma processing system
US7147749B2 (en) 2002-09-30 2006-12-12 Tokyo Electron Limited Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system
US7163585B2 (en) 2002-09-30 2007-01-16 Tokyo Electron Limited Method and apparatus for an improved optical window deposition shield in a plasma processing system
US7166166B2 (en) 2002-09-30 2007-01-23 Tokyo Electron Limited Method and apparatus for an improved baffle plate in a plasma processing system
US7166200B2 (en) 2002-09-30 2007-01-23 Tokyo Electron Limited Method and apparatus for an improved upper electrode plate in a plasma processing system
JP2007083692A (ja) * 2005-09-26 2007-04-05 Tohoku Univ 金属ガラス複合材料およびそれを使用した電子電気機器用部材
US7204912B2 (en) 2002-09-30 2007-04-17 Tokyo Electron Limited Method and apparatus for an improved bellows shield in a plasma processing system
US7282112B2 (en) 2002-09-30 2007-10-16 Tokyo Electron Limited Method and apparatus for an improved baffle plate in a plasma processing system
US7291566B2 (en) 2003-03-31 2007-11-06 Tokyo Electron Limited Barrier layer for a processing element and a method of forming the same
US7364798B2 (en) 1999-12-10 2008-04-29 Tocalo Co., Ltd. Internal member for plasma-treating vessel and method of producing the same
US7552521B2 (en) 2004-12-08 2009-06-30 Tokyo Electron Limited Method and apparatus for improved baffle plate
US7560376B2 (en) 2003-03-31 2009-07-14 Tokyo Electron Limited Method for adjoining adjacent coatings on a processing element
US7601242B2 (en) 2005-01-11 2009-10-13 Tokyo Electron Limited Plasma processing system and baffle assembly for use in plasma processing system
US8877002B2 (en) 2002-11-28 2014-11-04 Tokyo Electron Limited Internal member of a plasma processing vessel
WO2015190325A1 (ja) * 2014-06-11 2015-12-17 日本発條株式会社 積層体の製造方法及び積層体
JP2017226923A (ja) * 2017-09-20 2017-12-28 日本発條株式会社 積層体及び積層体の製造方法

Cited By (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4885213A (en) * 1986-11-05 1989-12-05 Toyota Jidosha Kabushiki Kaisha Ceramic-sprayed member and process for making the same
JPS63274751A (ja) * 1987-05-01 1988-11-11 Toyota Motor Corp セラミック溶射部材
US5204302A (en) * 1991-09-05 1993-04-20 Technalum Research, Inc. Catalyst composition and a method for its preparation
EP0707091A1 (en) * 1994-09-16 1996-04-17 Praxair S.T. Technology, Inc. Zirconia-based tipped blades having macrocracked structure and process for producing it
FR2763259A1 (fr) * 1997-05-16 1998-11-20 Ecia Equip Composants Ind Auto Catalyseur en materiau composite, convertisseur muni d'un tel catalyseur et procede pour sa fabrication
US7364798B2 (en) 1999-12-10 2008-04-29 Tocalo Co., Ltd. Internal member for plasma-treating vessel and method of producing the same
US7204912B2 (en) 2002-09-30 2007-04-17 Tokyo Electron Limited Method and apparatus for an improved bellows shield in a plasma processing system
US7566368B2 (en) 2002-09-30 2009-07-28 Tokyo Electron Limited Method and apparatus for an improved upper electrode plate in a plasma processing system
US7163585B2 (en) 2002-09-30 2007-01-16 Tokyo Electron Limited Method and apparatus for an improved optical window deposition shield in a plasma processing system
US7166166B2 (en) 2002-09-30 2007-01-23 Tokyo Electron Limited Method and apparatus for an improved baffle plate in a plasma processing system
US7166200B2 (en) 2002-09-30 2007-01-23 Tokyo Electron Limited Method and apparatus for an improved upper electrode plate in a plasma processing system
US7147749B2 (en) 2002-09-30 2006-12-12 Tokyo Electron Limited Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system
US7137353B2 (en) 2002-09-30 2006-11-21 Tokyo Electron Limited Method and apparatus for an improved deposition shield in a plasma processing system
US7282112B2 (en) 2002-09-30 2007-10-16 Tokyo Electron Limited Method and apparatus for an improved baffle plate in a plasma processing system
US7566379B2 (en) 2002-09-30 2009-07-28 Tokyo Electron Limited Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system
US8877002B2 (en) 2002-11-28 2014-11-04 Tokyo Electron Limited Internal member of a plasma processing vessel
US7560376B2 (en) 2003-03-31 2009-07-14 Tokyo Electron Limited Method for adjoining adjacent coatings on a processing element
US7291566B2 (en) 2003-03-31 2007-11-06 Tokyo Electron Limited Barrier layer for a processing element and a method of forming the same
JP2006097042A (ja) * 2004-09-28 2006-04-13 Hitachi Ltd 遮熱被覆を有する耐熱部材およびガスタービン
US7901790B2 (en) 2004-09-28 2011-03-08 Hitachi, Ltd. High temperature component with thermal barrier coating and gas turbine using the same
US7552521B2 (en) 2004-12-08 2009-06-30 Tokyo Electron Limited Method and apparatus for improved baffle plate
US7601242B2 (en) 2005-01-11 2009-10-13 Tokyo Electron Limited Plasma processing system and baffle assembly for use in plasma processing system
JP2007083692A (ja) * 2005-09-26 2007-04-05 Tohoku Univ 金属ガラス複合材料およびそれを使用した電子電気機器用部材
WO2015190325A1 (ja) * 2014-06-11 2015-12-17 日本発條株式会社 積層体の製造方法及び積層体
JP2016000849A (ja) * 2014-06-11 2016-01-07 日本発條株式会社 積層体の製造方法及び積層体
US10315388B2 (en) 2014-06-11 2019-06-11 Nhk Spring Co., Ltd. Method of manufacturing laminate and laminate
JP2017226923A (ja) * 2017-09-20 2017-12-28 日本発條株式会社 積層体及び積層体の製造方法

Also Published As

Publication number Publication date
JPH0515781B2 (enrdf_load_stackoverflow) 1993-03-02

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