JPS61202433A - 弧状領域照明光学装置 - Google Patents

弧状領域照明光学装置

Info

Publication number
JPS61202433A
JPS61202433A JP60042724A JP4272485A JPS61202433A JP S61202433 A JPS61202433 A JP S61202433A JP 60042724 A JP60042724 A JP 60042724A JP 4272485 A JP4272485 A JP 4272485A JP S61202433 A JPS61202433 A JP S61202433A
Authority
JP
Japan
Prior art keywords
light source
light
optical fiber
fiber bundle
arc
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60042724A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0568846B2 (cg-RX-API-DMAC10.html
Inventor
Takashi Komata
小俣　貴
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP60042724A priority Critical patent/JPS61202433A/ja
Publication of JPS61202433A publication Critical patent/JPS61202433A/ja
Publication of JPH0568846B2 publication Critical patent/JPH0568846B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • H10P95/00—

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60042724A 1985-03-06 1985-03-06 弧状領域照明光学装置 Granted JPS61202433A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60042724A JPS61202433A (ja) 1985-03-06 1985-03-06 弧状領域照明光学装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60042724A JPS61202433A (ja) 1985-03-06 1985-03-06 弧状領域照明光学装置

Publications (2)

Publication Number Publication Date
JPS61202433A true JPS61202433A (ja) 1986-09-08
JPH0568846B2 JPH0568846B2 (cg-RX-API-DMAC10.html) 1993-09-29

Family

ID=12644011

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60042724A Granted JPS61202433A (ja) 1985-03-06 1985-03-06 弧状領域照明光学装置

Country Status (1)

Country Link
JP (1) JPS61202433A (cg-RX-API-DMAC10.html)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04102942U (ja) * 1991-02-08 1992-09-04 象印マホービン株式会社 液体容器
CN103680078A (zh) * 2013-12-11 2014-03-26 京东方科技集团股份有限公司 预警系统及光学设备

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04102942U (ja) * 1991-02-08 1992-09-04 象印マホービン株式会社 液体容器
CN103680078A (zh) * 2013-12-11 2014-03-26 京东方科技集团股份有限公司 预警系统及光学设备
CN103680078B (zh) * 2013-12-11 2016-08-17 京东方科技集团股份有限公司 预警系统及光学设备

Also Published As

Publication number Publication date
JPH0568846B2 (cg-RX-API-DMAC10.html) 1993-09-29

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term