JPS61196245A - フオトマスクブランク及びフオトマスク - Google Patents

フオトマスクブランク及びフオトマスク

Info

Publication number
JPS61196245A
JPS61196245A JP60035344A JP3534485A JPS61196245A JP S61196245 A JPS61196245 A JP S61196245A JP 60035344 A JP60035344 A JP 60035344A JP 3534485 A JP3534485 A JP 3534485A JP S61196245 A JPS61196245 A JP S61196245A
Authority
JP
Japan
Prior art keywords
photomask
alumino
chromium
glass substrate
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60035344A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6352374B2 (enrdf_load_stackoverflow
Inventor
Norihiko Shinkai
新開　紀彦
Sumiyoshi Kanazawa
金沢　純悦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Priority to JP60035344A priority Critical patent/JPS61196245A/ja
Publication of JPS61196245A publication Critical patent/JPS61196245A/ja
Publication of JPS6352374B2 publication Critical patent/JPS6352374B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP60035344A 1985-02-26 1985-02-26 フオトマスクブランク及びフオトマスク Granted JPS61196245A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60035344A JPS61196245A (ja) 1985-02-26 1985-02-26 フオトマスクブランク及びフオトマスク

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60035344A JPS61196245A (ja) 1985-02-26 1985-02-26 フオトマスクブランク及びフオトマスク

Publications (2)

Publication Number Publication Date
JPS61196245A true JPS61196245A (ja) 1986-08-30
JPS6352374B2 JPS6352374B2 (enrdf_load_stackoverflow) 1988-10-18

Family

ID=12439241

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60035344A Granted JPS61196245A (ja) 1985-02-26 1985-02-26 フオトマスクブランク及びフオトマスク

Country Status (1)

Country Link
JP (1) JPS61196245A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10969677B2 (en) * 2016-01-27 2021-04-06 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask
US10969686B2 (en) 2016-01-27 2021-04-06 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby
US11029596B2 (en) 2016-01-27 2021-06-08 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61107350A (ja) * 1984-10-31 1986-05-26 Hoya Corp フオトマスクブランクとフオトマスク

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61107350A (ja) * 1984-10-31 1986-05-26 Hoya Corp フオトマスクブランクとフオトマスク

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10969677B2 (en) * 2016-01-27 2021-04-06 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask
US10969686B2 (en) 2016-01-27 2021-04-06 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby
US11029596B2 (en) 2016-01-27 2021-06-08 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby

Also Published As

Publication number Publication date
JPS6352374B2 (enrdf_load_stackoverflow) 1988-10-18

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