JPS61189637A - 露光装置 - Google Patents
露光装置Info
- Publication number
- JPS61189637A JPS61189637A JP60029458A JP2945885A JPS61189637A JP S61189637 A JPS61189637 A JP S61189637A JP 60029458 A JP60029458 A JP 60029458A JP 2945885 A JP2945885 A JP 2945885A JP S61189637 A JPS61189637 A JP S61189637A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- temperature
- cooling plate
- cooling
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H10P95/00—
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60029458A JPS61189637A (ja) | 1985-02-19 | 1985-02-19 | 露光装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60029458A JPS61189637A (ja) | 1985-02-19 | 1985-02-19 | 露光装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61189637A true JPS61189637A (ja) | 1986-08-23 |
| JPH0521332B2 JPH0521332B2 (cg-RX-API-DMAC10.html) | 1993-03-24 |
Family
ID=12276657
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60029458A Granted JPS61189637A (ja) | 1985-02-19 | 1985-02-19 | 露光装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61189637A (cg-RX-API-DMAC10.html) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63312640A (ja) * | 1987-06-15 | 1988-12-21 | Canon Inc | 露光装置 |
| EP1064713A4 (en) * | 1998-07-09 | 2005-07-20 | Nikon Corp | EXPOSURE DEVICE WITH PLANAR MOTOR |
| US6954258B2 (en) | 2001-08-20 | 2005-10-11 | Canon Kabushiki Kaisha | Positioning apparatus |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6632292B1 (en) | 1998-03-13 | 2003-10-14 | Semitool, Inc. | Selective treatment of microelectronic workpiece surfaces |
| US7264698B2 (en) | 1999-04-13 | 2007-09-04 | Semitool, Inc. | Apparatus and methods for electrochemical processing of microelectronic workpieces |
| WO2002004887A1 (en) | 2000-07-08 | 2002-01-17 | Semitool, Inc. | Methods and apparatus for processing microelectronic workpieces using metrology |
-
1985
- 1985-02-19 JP JP60029458A patent/JPS61189637A/ja active Granted
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63312640A (ja) * | 1987-06-15 | 1988-12-21 | Canon Inc | 露光装置 |
| EP1064713A4 (en) * | 1998-07-09 | 2005-07-20 | Nikon Corp | EXPOSURE DEVICE WITH PLANAR MOTOR |
| US6954258B2 (en) | 2001-08-20 | 2005-10-11 | Canon Kabushiki Kaisha | Positioning apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0521332B2 (cg-RX-API-DMAC10.html) | 1993-03-24 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |