JPS61188933A - 露光方法 - Google Patents

露光方法

Info

Publication number
JPS61188933A
JPS61188933A JP60028357A JP2835785A JPS61188933A JP S61188933 A JPS61188933 A JP S61188933A JP 60028357 A JP60028357 A JP 60028357A JP 2835785 A JP2835785 A JP 2835785A JP S61188933 A JPS61188933 A JP S61188933A
Authority
JP
Japan
Prior art keywords
wafer
exposed
original plate
exposure apparatus
stage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60028357A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0562449B2 (enrdf_load_stackoverflow
Inventor
Hiroshi Shinkai
洋 新開
Junji Isohata
磯端　純二
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP60028357A priority Critical patent/JPS61188933A/ja
Publication of JPS61188933A publication Critical patent/JPS61188933A/ja
Publication of JPH0562449B2 publication Critical patent/JPH0562449B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60028357A 1985-02-18 1985-02-18 露光方法 Granted JPS61188933A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60028357A JPS61188933A (ja) 1985-02-18 1985-02-18 露光方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60028357A JPS61188933A (ja) 1985-02-18 1985-02-18 露光方法

Publications (2)

Publication Number Publication Date
JPS61188933A true JPS61188933A (ja) 1986-08-22
JPH0562449B2 JPH0562449B2 (enrdf_load_stackoverflow) 1993-09-08

Family

ID=12246358

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60028357A Granted JPS61188933A (ja) 1985-02-18 1985-02-18 露光方法

Country Status (1)

Country Link
JP (1) JPS61188933A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01227432A (ja) * 1988-03-08 1989-09-11 Nikon Corp 露光装置及び露光方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01227432A (ja) * 1988-03-08 1989-09-11 Nikon Corp 露光装置及び露光方法

Also Published As

Publication number Publication date
JPH0562449B2 (enrdf_load_stackoverflow) 1993-09-08

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term