JPS61188354U - - Google Patents
Info
- Publication number
- JPS61188354U JPS61188354U JP7279985U JP7279985U JPS61188354U JP S61188354 U JPS61188354 U JP S61188354U JP 7279985 U JP7279985 U JP 7279985U JP 7279985 U JP7279985 U JP 7279985U JP S61188354 U JPS61188354 U JP S61188354U
- Authority
- JP
- Japan
- Prior art keywords
- cradle
- semiconductor wafer
- turntable
- grooves
- support body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 claims description 9
- 238000001035 drying Methods 0.000 claims description 8
- 235000012431 wafers Nutrition 0.000 claims 5
- 238000010586 diagram Methods 0.000 description 3
Landscapes
- Drying Of Solid Materials (AREA)
Description
第1図は本考案の実施例に係る乾燥装置の縦断
面図、第2図は従来の乾燥装置の縦断面図、第3
図は第2図の乾燥装置におけるクレードルの斜視
図、第4図は第1図の乾燥装置におけるヤレード
ルの斜視図、第5図は第1図の乾燥装置における
クレードル位置選定装置の構造図、第6図はロボ
ツトアームから第1図の乾燥装置における支持体
に対して半導体ウエハを移し替えする場合の説明
図、第7図は本考案の他の実施例に係るクレード
ル位置選定装置及び半導体ウエハ支持装置の構造
図である。
2……容器、3……ターンテーブル、6……モ
ータ、12……クレードル、12B……溝、13
……半導体ウエハ、14,34……クレードル位
置選定装置、17,37……半導体ウエハ支持装
置、19A……支持体。
FIG. 1 is a vertical cross-sectional view of a drying device according to an embodiment of the present invention, FIG. 2 is a vertical cross-sectional view of a conventional drying device, and FIG.
The figures are a perspective view of the cradle in the drying device shown in FIG. 2, FIG. 4 is a perspective view of the cradle in the drying device shown in FIG. 1, FIG. 5 is a structural diagram of the cradle positioning device in the drying device shown in FIG. FIG. 6 is an explanatory diagram when transferring a semiconductor wafer from the robot arm to the support in the drying device shown in FIG. 1, and FIG. 7 is a cradle positioning device and semiconductor wafer support according to another embodiment of the present invention. FIG. 2 is a structural diagram of the device. 2...Container, 3...Turntable, 6...Motor, 12...Cradle, 12B...Groove, 13
... Semiconductor wafer, 14, 34 ... Cradle position selection device, 17, 37 ... Semiconductor wafer support device, 19A ... Support body.
Claims (1)
と、このターンテーブル上の所定箇所に垂直姿勢
位置および水平姿勢位置を取り得るよう揺動自在
に配置されたクレードルと、このクレードルを揺
動させ該クレードルに垂直姿勢位置または水平姿
勢位置を適宜取らせるクレードル位置選定装置と
、前記ターンテーブルを回転駆動させる駆動装置
とを備えた半導体ウエハの乾燥装置において、 前記クレードルの内側に半導体ウエハ収納用の
複数の溝を形成すると共に、 上面に半導体ウエハ支持用の複数の溝が形成さ
れた支持体を有し前記クレードルが水平姿勢位置
にあるとき前記支持体をクレードルの底部よりク
レードル内に対して出没させる半導体ウエハ支持
装置を設けたことを特徴とする半導体ウエハの乾
燥装置。[Claims for Utility Model Registration] A turntable rotatably disposed within a container; a cradle swingably disposed at a predetermined location on the turntable so as to be able to assume a vertical position and a horizontal position; A semiconductor wafer drying apparatus comprising: a cradle positioning device for swinging the cradle to appropriately take a vertical posture position or a horizontal posture position; and a driving device for rotationally driving the turntable; A plurality of grooves for accommodating semiconductor wafers are formed in the cradle, and a support body having a plurality of grooves for supporting semiconductor wafers formed on the upper surface is formed, and when the cradle is in a horizontal position, the support body is moved from the bottom of the cradle. 1. A semiconductor wafer drying device, comprising a semiconductor wafer support device that is retractable from inside a cradle.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7279985U JPH0316278Y2 (en) | 1985-05-16 | 1985-05-16 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7279985U JPH0316278Y2 (en) | 1985-05-16 | 1985-05-16 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61188354U true JPS61188354U (en) | 1986-11-25 |
JPH0316278Y2 JPH0316278Y2 (en) | 1991-04-08 |
Family
ID=30611551
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7279985U Expired JPH0316278Y2 (en) | 1985-05-16 | 1985-05-16 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0316278Y2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06112186A (en) * | 1992-09-25 | 1994-04-22 | Dainippon Screen Mfg Co Ltd | Horizontal shaft rotating type substrate dryer |
JP2001144038A (en) * | 1999-11-16 | 2001-05-25 | Tokyo Electron Ltd | Substrate treatment apparatus and substrate treatment method |
-
1985
- 1985-05-16 JP JP7279985U patent/JPH0316278Y2/ja not_active Expired
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06112186A (en) * | 1992-09-25 | 1994-04-22 | Dainippon Screen Mfg Co Ltd | Horizontal shaft rotating type substrate dryer |
JP2001144038A (en) * | 1999-11-16 | 2001-05-25 | Tokyo Electron Ltd | Substrate treatment apparatus and substrate treatment method |
Also Published As
Publication number | Publication date |
---|---|
JPH0316278Y2 (en) | 1991-04-08 |