JPS61187984A - Apparatus for producing extremely pure demineralized water - Google Patents

Abstract

PURPOSE:To miniaturize the titled apparatus for producing extremely pure demineralized water by providing an evaporator at least at the preceding stage of a polisher and an ultrafiltration membrane apparatus. CONSTITUTION:An evaporator 11 consisting of an evaporator part 14 and a condensation part 17 is provided at least at the preceding stage of a polisher and an ultrafiltration membrane apparatus. Namely, a thermal evaporator is furnished in place of the primary demineralized water system consisting of many unit devices in the conventional extremely pure demineralized water producing apparatus and a hydrophobic porous membrane is used as the mist separator 12. Consequently, the primary demineralized water system can be replaced by only the thermal evaporator, the conventional extremely pure demineralized water producing apparatus can be miniaturized. Besides, a pervaporation device using a membrane (e.g., a hydrophobic porous membrane) can be provided as the thermal evaporator to further miniaturize the thermal evaporator. Moreover, since the evaporator is provided at the preceding stage of a high-temp. ultrafiltration membrane apparatus, high-temp. produced water can be obtained, a UV bactericidal lamp need not be used and the apparatus can be further miniaturized.

Description

DETAILED DESCRIPTION OF THE INVENTION [Field of Application of the Invention] The present invention relates to a first-generation ultrapure water production process, and particularly to a miniaturized ultrapure water production apparatus.

[Background of the invention]

The conventional ultrapure water production process is shown in Figure 5. These processes include coagulation sedimentation t>fi filtration, reverse osmosis, ion exchange resin desalination (all frozen water systems), pre-filter, polisher, UV ( Ultrapure water is produced using a large-capacity, centralized processing method using large-scale equipment, as it consists of a large number of elemental equipment such as ultraviolet sterilization), ultrafiltration (secondary pure water system), etc. Therefore, these problems can be summarized as follows.

(1) Deterioration of water quality within the process' (2) Large installation area (3) High cost of manufacturing auxiliary equipment when the system goes down (4) Maintenance is a factor Here, (1) above refers to the piping within the process. Because of the long
Re-contaminated on the way to the point of use.

This is because water quality deteriorates. In addition, (4) is particularly caused by the resin regeneration operation in the ion exchange resin desalting device.

As mentioned above, there are many problems caused by the large size of the apparatus, and therefore there is a strong demand for miniaturization of the process. Incidentally, related known techniques include Nirakei Mechanical 1984.5.
21. There are some listed on page 54.

[Purpose of the invention]

An object of the present invention is to eliminate the above-mentioned drawbacks and provide an ultrapure water production process that can be downsized.

[Summary of the invention]

In order to achieve the above object, the present invention includes the following configuration.

That is, the present invention installs a thermal evaporation device as an alternative to a primary pure water system consisting of a large number of component devices in a conventional ultrapure water production process. Furthermore, a mist separator was attached to the thermal evaporator, and a hydrophobic porous membrane was used as the mist separator.

Due to such features, the sub-pure water system can be replaced with only a thermal evaporator, and the conventional ultrapure water production process can be downsized.

Furthermore, a pervaporation device using a membrane (for example, a hydrophobic porous membrane) was installed as the thermal evaporation device.

Such features make it possible to further downsize the thermal evaporation device.

Further, by providing the above-mentioned evaporation device before the high-temperature ultrafiltration membrane device, high-temperature generated water can be obtained, there is no need to use a UV germicidal lamp, and the device can be further downsized.

[Embodiments of the invention] Embodiments of the present invention will be described below with reference to the drawings.

FIG. 1 shows an ultrapure water manufacturing process according to the present invention, FIGS. 2 and 3 show a thermal evaporation device according to the invention, and FIG. 4 shows an ultrapure water (high temperature) manufacturing process according to the invention.

The ultrapure water production process shown in #1 consists of an evaporator polisher, a UV device, and an ultrafiltration membrane device.

The raw water becomes steam in the evaporator and the steam is condensed, so the specific resistance is 10 to 18 MΩ/aa.

The resulting primary pure water has a TOC of 50 to 300/12. The primary pure water obtained here has trace amounts of metal ions removed in a polisher, sterilized in a UV device, and finally residual suspended solids are removed in an ultrafiltration device.

The evaporator basically consists of an evaporator section and a condensation section. Raw water is evaporated in the evaporation section and then enters the condensation section, where the condensed water is taken out as primary pure water. In the present invention, conventionally, coagulation and precipitation,
The primary pure water system, which previously consisted of many elemental devices such as filtration, reverse osmosis, and ion-exchange resin desalination, can be replaced with just the evaporator mentioned above, making it possible to downsize the secondary pure water system and simplifying the entire process. Leads to downsizing. FIG. 2 shows an evaporation device according to the invention. The evaporator 1 is composed of two parts: an evaporator section 14 and a condensation section I. The raw water that has entered the evaporator 11 is heated and evaporated by the heater 15, and the generated steam 1
3 enters the upper condensation section after the mist is removed by the mist separator 12. Steam entering the condensing section 1
3 is cooled by the cooler 16, condenses and returns to liquid form.

This condensed water becomes the primary pure water in the ultrapure water production process. Furthermore, FIG. 3 shows an example of an evaporator using a hydrophobic porous membrane. In this device, a hydrophobic porous membrane 1 and a cooling surface 5 are used.
By stacking many layers, raw water chamber 2. Transmission chamber 3. Cooling room 4
It consists of many.

In this evaporator, raw water is heated by a heater 6 and fed into each raw water chamber 2 . Hydrophobic porous II! The raw water sent into the raw water chamber 2, which is constructed on both sides by 41, is hydrophobic and porous! It evaporates on the I11 surface, passes through the membrane, moves further inside the permeation chamber 3, and is cooled and condensed on the cooling surface 5. In this device, only water vapor can be selectively separated by using a hydrophobic porous membrane 1 that does not allow liquid to pass through, but allows gas to pass through.Therefore, there is no problem of contamination of the produced water due to mist scattering, and it is even more effective. In this device, 1M water is heated with a heater 6, and evaporation occurs using the temperature difference (water vapor partial pressure difference) between the raw water and the cooling surface 5 as a driving hose. By reducing the pressure inside the permeation chamber 3, the pressure difference may be used as a driving hose.The polisher shown in FIG. 1 is an ion exchange resin desalting device. Further, the ultrafiltration membrane device shown in the figure may be a membrane filtration device.

FIG. 4 shows an ultrapure water (high temperature) production process according to the present invention. This process uses evaporator and polisher.

Consists of a high temperature ultrafiltration membrane device. The evaporator is the same as described in FIGS. 1-3. In the evaporator.

By adjusting the temperature of the cooling water, primary pure water at a desired temperature can be obtained. Trace metal ions are removed from this high-temperature ultra-pure water using a polisher, and residual suspended solids are removed using a high-temperature ultrafiltration membrane device. Therefore, sterilization using a UV device is not necessary, and further compactness can be achieved.

Here, the polisher is a fine particle ion exchange resin (5 to 1000 μm) that can withstand high temperatures or a composite adsorbent (Mg, A
ly (O)l), etc.) are filled. Similarly, high-temperature ultraviolet membrane devices are constructed of heat-resistant materials such as polysulfone.

〔Effect of the invention〕

According to the ultrapure water production process of the present invention, a large number of elemental equipment in the caustic water system can be replaced with only the evaporator, so a compact ultrapure water production process can be obtained, and a decentralized ultrapure water production process directly connected to the clean room can be achieved. manufacturing process becomes possible.

[Brief explanation of drawings]

FIG. 1 is a block diagram of an ultrapure water production apparatus according to an embodiment of the present invention, FIGS. 2 and 3 are block diagrams of an evaporation apparatus according to the present invention, and FIG. 4 is a block diagram of an ultrapure water production apparatus according to an embodiment of the present invention. FIG. 5 is a block diagram of a conventional ultrapure water production device. 1...Hydrophobic porous membrane, 5...Cooling surface, top...
Evaporation device, 12... mist separator.

Claims (1)

[Claims] 1. An ultrapure water production device characterized in that an evaporation device is provided at least before a polisher and an ultrafiltration membrane device.