JPS60172390A - Manufacture of highly demineralized water - Google Patents
Manufacture of highly demineralized waterInfo
- Publication number
- JPS60172390A JPS60172390A JP2729384A JP2729384A JPS60172390A JP S60172390 A JPS60172390 A JP S60172390A JP 2729384 A JP2729384 A JP 2729384A JP 2729384 A JP2729384 A JP 2729384A JP S60172390 A JPS60172390 A JP S60172390A
- Authority
- JP
- Japan
- Prior art keywords
- water
- steam
- stage
- membrane
- supplied
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title claims abstract description 48
- 238000004519 manufacturing process Methods 0.000 title claims description 13
- 239000012528 membrane Substances 0.000 claims abstract description 24
- 238000005342 ion exchange Methods 0.000 claims abstract description 16
- 238000010438 heat treatment Methods 0.000 claims abstract description 11
- 230000000717 retained effect Effects 0.000 claims abstract description 5
- 238000000034 method Methods 0.000 claims description 24
- 229910021642 ultra pure water Inorganic materials 0.000 claims description 18
- 239000012498 ultrapure water Substances 0.000 claims description 18
- 238000011282 treatment Methods 0.000 claims description 5
- 238000001471 micro-filtration Methods 0.000 claims description 4
- 238000001914 filtration Methods 0.000 abstract description 8
- 238000001223 reverse osmosis Methods 0.000 abstract description 8
- 238000001035 drying Methods 0.000 abstract description 7
- 238000000108 ultra-filtration Methods 0.000 abstract description 4
- 238000001704 evaporation Methods 0.000 abstract description 3
- 239000000463 material Substances 0.000 abstract description 3
- 230000008020 evaporation Effects 0.000 abstract description 2
- 239000008235 industrial water Substances 0.000 abstract description 2
- 230000001954 sterilising effect Effects 0.000 description 6
- 238000004140 cleaning Methods 0.000 description 5
- 238000004659 sterilization and disinfection Methods 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 238000005345 coagulation Methods 0.000 description 4
- 230000015271 coagulation Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000007517 polishing process Methods 0.000 description 4
- 238000011109 contamination Methods 0.000 description 3
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 238000006114 decarboxylation reaction Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000003456 ion exchange resin Substances 0.000 description 2
- 229920003303 ion-exchange polymer Polymers 0.000 description 2
- 238000002203 pretreatment Methods 0.000 description 2
- 238000004062 sedimentation Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 238000010977 unit operation Methods 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000006298 dechlorination reaction Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 239000013505 freshwater Substances 0.000 description 1
- 239000008214 highly purified water Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 244000005700 microbiome Species 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 239000010802 sludge Substances 0.000 description 1
- 230000026676 system process Effects 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
- 239000002349 well water Substances 0.000 description 1
- 235000020681 well water Nutrition 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、半導体製造工業その他の各種工業の水洗浄工
程に使用される高度浄化水、いわゆる超純水を製造する
方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a method for producing highly purified water, so-called ultrapure water, used in water cleaning processes in the semiconductor manufacturing industry and other various industries.
従来の代表的な超純水製造システムは、第1図に示すよ
うに、原水1を凝集沈殿工程2によって処理し、脱炭酸
工程3、ろ過工程4、逆浸透膜工程5、イオン交換工程
6、さらにろ過工程7を順次行って一次純水を製造し、
さらに高度な超純水を得るために、前記−次純水を紫外
線殺菌工程8、イオン交換ボリシャ工程9、限外ろ過工
程lOを経て精密ろ過工程11を行い、その後この超純
水12を必要個所に送っている。As shown in FIG. 1, a typical conventional ultrapure water production system processes raw water 1 through a coagulation and precipitation process 2, followed by a decarboxylation process 3, a filtration process 4, a reverse osmosis membrane process 5, and an ion exchange process 6. , further sequentially perform filtration step 7 to produce primary pure water,
In order to obtain even higher level ultrapure water, the above-described ultrapure water is subjected to an ultraviolet sterilization process 8, an ion exchange bolisha process 9, an ultrafiltration process 1O, and a precision filtration process 11, and then this ultrapure water 12 is required. It is sent to individual locations.
このように、従来の超純水製造システムは、きわめて多
くの単位操作(分離操作が大半を占める)を直列に配列
したものとなるために、次のような多くの問題点を抱え
ている。As described above, conventional ultrapure water production systems have a large number of unit operations (mostly separation operations) arranged in series, and therefore have many problems as described below.
■ 維持管理が煩雑である。■ Maintenance is complicated.
■ 逆浸透膜の洗浄、交換を必要とする。■ Reverse osmosis membrane needs to be cleaned and replaced.
■ イオン交換樹脂の再生、補給を必要とする。■ Ion exchange resin needs to be regenerated and replenished.
■ 紫外線殺菌による殺菌効果が十分とはいえない。■ The sterilizing effect of ultraviolet sterilization is not sufficient.
■ 凝集沈殿操作などの前処理操作で発生するスラッジ
の処理処分を必要とする。■ It is necessary to treat and dispose of sludge generated during pretreatment operations such as coagulation and sedimentation operations.
■ 原水にシリカ成分が多いときには、逆浸透膜操作で
のスケールトラブルを避けるために、水の回収率を下げ
たり、あるいは予じめイオン交換処理してシリカ成分を
除去するなどの余分な処置をとらざるを得ない。■ When raw water contains a large amount of silica, extra measures such as lowering the water recovery rate or removing silica through ion exchange treatment in advance should be taken to avoid scaling problems during reverse osmosis membrane operation. I have no choice but to take it.
■ 逆浸透膜操作での膜汚染を防止するために1塩素注
入、脱塩素、凝集固液分離などの煩雑な前処理を必要と
する。■ In order to prevent membrane contamination during reverse osmosis membrane operation, complicated pretreatments such as chlorine injection, dechlorination, and coagulation solid-liquid separation are required.
■ 多数の単位操作を必要とするため、装置、槽、配管
類が多くなり、全体の設備費、設置面積が大となり、ま
た後汚染(アフターポリューション)のトラブルを招き
やすい。■ Since a large number of unit operations are required, the number of devices, tanks, and piping increases, which increases the overall equipment cost and installation area, and also tends to cause troubles such as after-pollution.
本発明は、このような従来の超純水製造システムのもつ
諸問題を的確に解決する超純水の製造方法を提供するこ
とを目的とするものである。An object of the present invention is to provide a method for producing ultrapure water that accurately solves the problems of conventional ultrapure water production systems.
さらに本発明の他の目的は、超純水を使用する工場の熱
利用工程の省エネルギ化、合理化を達成せしめんとする
にある。Still another object of the present invention is to achieve energy saving and rationalization of heat utilization processes in factories that use ultrapure water.
本発明は、原水を加熱蒸発せしめ、発生したスチームを
間接加熱による熱所要工程に供給して該スチームの保有
熱を利用したのち、該スチームの凝縮水をイオン交換ポ
リシャ、透過膜による精密ろ過処理の少なくとも一つに
て処理することを特徴とするものである。The present invention heats and evaporates raw water, supplies the generated steam to a process that requires heat through indirect heating, utilizes the heat retained in the steam, and then processes the condensed water of the steam through precision filtration using an ion exchange polisher and a permeable membrane. It is characterized by processing using at least one of the following.
本発明の一実施例を図面を参照しながら説明すれば、第
2図において、井戸水、工業用水、水道水、湖沼卒、河
川水などの淡水を原水とし、この原水lを、ボイラなど
のスチーム生成工程13に供給し、ここで発生したスチ
ーム14を間接加熱による乾燥工程15に供給し、スチ
ーム14の保有熱量を含水物16の乾燥に利用したのち
、スチーム14からの凝縮水17を得る。An embodiment of the present invention will be described with reference to the drawings. In FIG. 2, fresh water such as well water, industrial water, tap water, lake water, river water, etc. is used as raw water, and this raw water is used to steam steam from a boiler or the like. The steam 14 generated here is supplied to a drying step 15 by indirect heating, and the heat capacity of the steam 14 is used to dry the water-containing material 16, and then condensed water 17 from the steam 14 is obtained.
次いでこの凝縮水17(温水である)をイオン交換ポリ
シャ工程9で処理し、逆浸透膜、限外ろ過膜等を使用し
たメンブレンフィルタ18で精密ろ過して超純水12を
得、必要個所へ供給する。Next, this condensed water 17 (warm water) is treated in an ion exchange polisher step 9, and subjected to precision filtration through a membrane filter 18 using a reverse osmosis membrane, an ultrafiltration membrane, etc. to obtain ultrapure water 12, which is then delivered to the required location. supply
なお、要求水質に応じて、イオン交換ポリシャ工程9又
はメンブレンフィルタ18のいずれかを省略することが
できる。Note that either the ion exchange polisher step 9 or the membrane filter 18 can be omitted depending on the required water quality.
才だ、凝縮水17内には配管からのクラット9の発生、
外部から少量の油脂分が含まれることがあり得るから、
イオン交換、トリジヤニ程9やメンブレンフィルタ18
による精密ろ過膜に、ろ過又は活性炭処理等の前処理を
行う場合もある。Yes, there is a crack 9 from the piping in the condensed water 17.
Because small amounts of fat and oil may be included from the outside,
Ion exchange, Trijiani level 9 and membrane filter 18
In some cases, the microfiltration membrane is subjected to pretreatment such as filtration or activated carbon treatment.
さらに、凝縮水17は90℃前後の温度をもつもので、
水温が高いほど透過率が向上する膜処理にとってはきわ
めて都合がよいが、凝縮水17をイオン交換ポリシャ工
程9で処理するときは60℃以下に冷却してイオン交換
樹脂の劣化を防止することが好ましい。Furthermore, the condensed water 17 has a temperature of around 90°C,
A higher water temperature is extremely convenient for membrane treatment where the permeability improves, but when treating the condensed water 17 in the ion exchange polisher step 9, it is necessary to cool it to below 60°C to prevent deterioration of the ion exchange resin. preferable.
なお、前記実施例では、スチーム14の保有熱を含水物
16の乾燥のための間接加熱による乾燥工程15にて利
用したが、暖房、温水製造その他の任意の間接加熱によ
る熱所要工程に利用できることはいうまでもなく、場合
によってはスチーム生成工程13からの発生スチーム1
4の温度を断熱圧縮などの手段によってさらに昇温させ
ることも有利である。In the above embodiment, the heat retained by the steam 14 is used in the drying process 15 by indirect heating for drying the water-containing material 16, but it can also be used for heating, hot water production, and any other process requiring heat by indirect heating. Needless to say, in some cases, the generated steam 1 from the steam generation step 13
It is also advantageous to further increase the temperature of 4 by means such as adiabatic compression.
また、水の加熱蒸発装置と得られたスチームを利用する
工程がすでに設置されているときは、それらを利用して
本発明を実施することができる。Further, when a water heating evaporation device and a process using the obtained steam have already been installed, the present invention can be implemented using them.
〔発明の効果〕・
以上述べたように、本発明は原水から加熱蒸発によって
スチームを発生させ、このスチームの保有熱を熱所要工
程に利用したのち、自身が凝縮して生成される、高度の
水質をもち温度の高い凝縮水という特定の水をイオン交
換ポリシャや透過膜による精密ろ過(以下「ポリシング
工程」という)で処理するという、従来全く例をみない
構成をとったので、次のようなきわめて重要なる効果を
得ることができ、従来の超純水製造システムの欠点を解
消し、超純水を利用する諸工業の発展に大きな貢献を果
すことができるものである。[Effects of the Invention] As described above, the present invention generates steam from raw water by heating and evaporating it, uses the heat retained in this steam for heat-requiring processes, and then condenses itself to generate high-grade steam. We have adopted a completely unprecedented configuration in which a specific type of water, condensed water with high quality and high temperature, is processed through microfiltration using an ion exchange polisher and a permeable membrane (hereinafter referred to as the "polishing process"). It is possible to obtain extremely important effects, eliminate the drawbacks of conventional ultrapure water production systems, and make a significant contribution to the development of various industries that utilize ultrapure water.
■ 乾燥などのスチームによる間接加熱工程からの凝縮
水をボリシング工程に供給するから、従来のポリシング
工程前段の逆浸透膜工程、イオン交換工程その他の各種
前処理工程を省略することができ、合理的かつ簡潔な超
純水製造システムを実現することができる。■ Since condensed water from the indirect steam heating process such as drying is supplied to the borishing process, it is possible to omit the reverse osmosis membrane process, ion exchange process, and other various pretreatment processes that are required before the conventional polishing process, making it more rational. Moreover, a simple ultrapure water production system can be realized.
■ 従来の前処理工程を省略できるから錐持管理がきわ
めて容易となる。■ Since the conventional pre-treatment process can be omitted, it is extremely easy to manage the cone retention.
■ スチームからの凝縮水をポリシング工程に供給する
から、従来の紫外線照射による殺菌よりもはるかに完全
な加熱殺菌が行われており、微生物による汚染トラブル
の発生がほとんどない。■ Since condensed water from steam is supplied to the polishing process, heat sterilization is far more complete than conventional sterilization by ultraviolet irradiation, and there are almost no problems with contamination caused by microorganisms.
■ ポリシンダニ程に供給される水は、スチームの凝縮
水であって蒸留水に近い水質となっており、ポリシング
工程においてスケール生成、膜汚染を招くことがない。■ The water supplied to the polisher is steam condensed water and has a quality close to that of distilled water, so it does not cause scale formation or membrane contamination during the polishing process.
■ 半導体製造工業などの水洗浄工程では、洗浄水の水
温が高いほど洗浄効果が高く、本発明ではスチームの9
0〜100℃程度の凝縮水を利用するから、高温の超純
水を得ることができ、洗浄効果が著しく向上する。■ In water cleaning processes such as those in the semiconductor manufacturing industry, the higher the temperature of the cleaning water, the higher the cleaning effect.
Since condensed water of about 0 to 100° C. is used, high-temperature ultrapure water can be obtained, and the cleaning effect is significantly improved.
■ 超純水を使用する工場の熱利用工程の省エネルギ化
11合理化を達成することができる。■ Energy saving and rationalization of heat utilization processes in factories that use ultrapure water can be achieved.
第1図は従来例を示す系統説明図で、第2図は本発明の
一実施例を示す系統説明図である。
1・・・・・・原水、2・・・・・・凝集沈殿工程、3
・・・・・・脱炭酸工程、4,7・・・・・・ろ過工程
、5・・・・・・逆浸透膜工程、6・・・・・・イオン
交換工程、8・・・・・・紫外線殺菌工程、9・・・・
・・イオン交換ボリシャ工程、lO・・・・・・限外ろ
過工程、11・・・精密ろ過工程、12・・・・・・超
純水、13・・・・・・スチーム生成工程、14・・・
・・・スチーム、15・・・・・・乾燥工程、16・・
・・・・含水物、17・・・・・・凝縮水、18・・・
・・・メンブレンフィルタ。
特許出願人 荏原インフィルコ株式会社代理人 弁理士
高 木 正 行FIG. 1 is a system explanatory diagram showing a conventional example, and FIG. 2 is a system explanatory diagram showing an embodiment of the present invention. 1...Raw water, 2...Coagulation sedimentation step, 3
...Decarboxylation step, 4,7...Filtration step, 5...Reverse osmosis membrane step, 6...Ion exchange step, 8... ...Ultraviolet sterilization process, 9...
...Ion exchange borisha process, lO...ultrafiltration process, 11...microfiltration process, 12...ultra pure water, 13...steam generation process, 14 ...
...Steam, 15...Drying process, 16...
... Hydrate, 17 ... Condensed water, 18 ...
...Membrane filter. Patent applicant: Ebara Infilco Co., Ltd. Representative Patent attorney: Masayuki Takagi
Claims (1)
加熱による熱所要工程に供給して該スチームの保有熱を
利用したのち、該スチームの凝縮水をイオン交換ポリシ
ャ、透過膜による精密ろ過処理の少なくとも一つにて処
理することを特徴とする超純水の製造方法。 2、前記イオン交換ポリシャにより処理する際に前記凝
縮水の水温を60℃以下に冷却するものである特許請求
の範囲第1項記載の超純水の製造方法。[Claims] 1. Raw water is heated to evaporate, the generated steam is supplied to a process that requires heat by indirect heating, and the retained heat of the steam is utilized, and then the condensed water of the steam is passed through an ion exchange polisher or a permeable membrane. 1. A method for producing ultrapure water, the method comprising treating it with at least one of microfiltration treatments. 2. The method for producing ultrapure water according to claim 1, wherein the temperature of the condensed water is cooled to 60° C. or lower during treatment with the ion exchange polisher.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2729384A JPS60172390A (en) | 1984-02-17 | 1984-02-17 | Manufacture of highly demineralized water |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2729384A JPS60172390A (en) | 1984-02-17 | 1984-02-17 | Manufacture of highly demineralized water |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS60172390A true JPS60172390A (en) | 1985-09-05 |
Family
ID=12217036
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2729384A Pending JPS60172390A (en) | 1984-02-17 | 1984-02-17 | Manufacture of highly demineralized water |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60172390A (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61187984A (en) * | 1985-02-15 | 1986-08-21 | Hitachi Ltd | Apparatus for producing extremely pure demineralized water |
JPH0613030U (en) * | 1991-04-26 | 1994-02-18 | アルパイン株式会社 | Push button device |
WO2000017108A1 (en) * | 1997-03-31 | 2000-03-30 | Mitsubishi Denki Kabushiki Kaisha | High temperature ultra-pure water production apparatus and liquid medicine preparation apparatus equipped with the production apparatus |
KR100397313B1 (en) * | 1998-09-18 | 2003-09-06 | 미쓰비시덴키 가부시키가이샤 | High temperature ultra-pure water production apparatus |
JP2009147113A (en) * | 2007-12-14 | 2009-07-02 | Nec Corp | Rack for electronic equipment |
US10198390B2 (en) | 2011-03-22 | 2019-02-05 | Amazon Technologies, Inc. | Modular mass storage system |
CN110759573A (en) * | 2019-11-05 | 2020-02-07 | 谢黎 | Concentrated water treatment process |
-
1984
- 1984-02-17 JP JP2729384A patent/JPS60172390A/en active Pending
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61187984A (en) * | 1985-02-15 | 1986-08-21 | Hitachi Ltd | Apparatus for producing extremely pure demineralized water |
JPH0613030U (en) * | 1991-04-26 | 1994-02-18 | アルパイン株式会社 | Push button device |
WO2000017108A1 (en) * | 1997-03-31 | 2000-03-30 | Mitsubishi Denki Kabushiki Kaisha | High temperature ultra-pure water production apparatus and liquid medicine preparation apparatus equipped with the production apparatus |
KR100397313B1 (en) * | 1998-09-18 | 2003-09-06 | 미쓰비시덴키 가부시키가이샤 | High temperature ultra-pure water production apparatus |
JP2009147113A (en) * | 2007-12-14 | 2009-07-02 | Nec Corp | Rack for electronic equipment |
US10198390B2 (en) | 2011-03-22 | 2019-02-05 | Amazon Technologies, Inc. | Modular mass storage system |
US10803002B2 (en) | 2011-03-22 | 2020-10-13 | Amazon Technologies, Inc. | Modular mass storage system |
US11347674B2 (en) | 2011-03-22 | 2022-05-31 | Amazon Technologies, Inc. | Modular mass storage system |
CN110759573A (en) * | 2019-11-05 | 2020-02-07 | 谢黎 | Concentrated water treatment process |
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