JPS61187375U - - Google Patents

Info

Publication number
JPS61187375U
JPS61187375U JP7062585U JP7062585U JPS61187375U JP S61187375 U JPS61187375 U JP S61187375U JP 7062585 U JP7062585 U JP 7062585U JP 7062585 U JP7062585 U JP 7062585U JP S61187375 U JPS61187375 U JP S61187375U
Authority
JP
Japan
Prior art keywords
heating mechanism
substrate heating
plasma cvd
utility
registration request
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7062585U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP7062585U priority Critical patent/JPS61187375U/ja
Publication of JPS61187375U publication Critical patent/JPS61187375U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Photoreceptors In Electrophotography (AREA)
JP7062585U 1985-05-15 1985-05-15 Pending JPS61187375U (enrdf_load_stackoverflow)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7062585U JPS61187375U (enrdf_load_stackoverflow) 1985-05-15 1985-05-15

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7062585U JPS61187375U (enrdf_load_stackoverflow) 1985-05-15 1985-05-15

Publications (1)

Publication Number Publication Date
JPS61187375U true JPS61187375U (enrdf_load_stackoverflow) 1986-11-21

Family

ID=30607376

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7062585U Pending JPS61187375U (enrdf_load_stackoverflow) 1985-05-15 1985-05-15

Country Status (1)

Country Link
JP (1) JPS61187375U (enrdf_load_stackoverflow)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5372460A (en) * 1976-12-10 1978-06-27 Hitachi Ltd Plasma cvd unit
JPS58117868A (ja) * 1981-12-28 1983-07-13 Toshiba Corp 皮膜形成装置
JPS58164776A (ja) * 1982-03-24 1983-09-29 Toshiba Corp グロ−放電化学処理装置
JPS59197561A (ja) * 1983-04-25 1984-11-09 Toshiba Corp 薄膜形成装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5372460A (en) * 1976-12-10 1978-06-27 Hitachi Ltd Plasma cvd unit
JPS58117868A (ja) * 1981-12-28 1983-07-13 Toshiba Corp 皮膜形成装置
JPS58164776A (ja) * 1982-03-24 1983-09-29 Toshiba Corp グロ−放電化学処理装置
JPS59197561A (ja) * 1983-04-25 1984-11-09 Toshiba Corp 薄膜形成装置

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