JPS61179509A - Magnetic material - Google Patents

Magnetic material

Info

Publication number
JPS61179509A
JPS61179509A JP1875785A JP1875785A JPS61179509A JP S61179509 A JPS61179509 A JP S61179509A JP 1875785 A JP1875785 A JP 1875785A JP 1875785 A JP1875785 A JP 1875785A JP S61179509 A JPS61179509 A JP S61179509A
Authority
JP
Japan
Prior art keywords
thin film
magnetic
metal
magnetic metal
film layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1875785A
Other languages
Japanese (ja)
Inventor
Hideji Orihara
秀治 折原
Togo Nishiyama
西山 東郷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Victor Company of Japan Ltd
Original Assignee
Victor Company of Japan Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Victor Company of Japan Ltd filed Critical Victor Company of Japan Ltd
Priority to JP1875785A priority Critical patent/JPS61179509A/en
Publication of JPS61179509A publication Critical patent/JPS61179509A/en
Pending legal-status Critical Current

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  • Magnetic Heads (AREA)
  • Thin Magnetic Films (AREA)

Abstract

PURPOSE:To improve the magnetic characteristics as well as the working characteristics and to reduce the stress strain between thin film layers, by layering magnetic metal thin films and non-magnetic metal thin films. CONSTITUTION:A substrate 1, formed of a bulky non-magnetic material such as ceramics, glass or metal, carries thereon a soft magnetic material 2a such as permalloy, sendust alloy or amorphous metal provided by a thin film forming means, which may be a dry plating means such as spattering or a wet plating means such as electroplating or electroless plating. Magnetic metal thin film layers 2b and 2c are also provided thereon in a similar manner. Further, a non-magnetic metal material 3a such as aluminum or the like is formed on the magnetic metal thin film layer 2a by a thin film forming means similar to that of the layer 2a. A non-magnetic metal thin film layer 3b is also formed in a similar manner.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、例えば薄膜型磁気ヘッドのコア材料として用
いられる磁性材料に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a magnetic material used, for example, as a core material of a thin-film magnetic head.

〔従来技術とその問題点〕[Prior art and its problems]

現在市販されている家庭用ビデオテープレコーダで用い
られている磁気テープは、その磁性粒子がγ−FezO
xのものが主流となっており、このような磁気テープは
その抗磁力が約600エルステツド程度のものである。
The magnetic tape used in home video tape recorders currently on the market has magnetic particles made of γ-FezO.
Magnetic tapes of this type have a coercive force of approximately 600 oersteds.

そして、このような特性の磁気テープに対して、記録再
生装置側の磁気ヘッドは、その磁性材料がMn−Znn
系単結晶フェライトあるのが主流である。
For magnetic tapes with such characteristics, the magnetic head on the recording/reproducing device side has a magnetic material of Mn-Znn.
The mainstream is single-crystal ferrite.

しかし、上記のような磁気テープでは、記録再生装置の
小型化及び高密度記録化に伴なう改良に対しては所望の
画質及びS/Nの得られないものであり、この為抗磁力
が600工ルステツド程度のものから1000エルステ
ツド程度のものにする必要がある。そして、このような
抗磁力が1000エルステツド程度の磁気テープが用い
られると、上記Mn−Zn 系単結晶フェライトの飽和
磁束密度が4000〜5000ガウス程度のものである
ことより、充分な記録ができず、又、充分な再生画質及
び高S/Nが得られず、高密度記録再生が図れない。
However, with the above-mentioned magnetic tape, it is not possible to obtain the desired image quality and S/N despite improvements accompanying the miniaturization of recording and reproducing devices and higher density recording, and for this reason, the coercive force is low. It is necessary to increase the diameter from about 600 oersted to about 1000 oersted. If such a magnetic tape with a coercive force of about 1000 oersteds is used, sufficient recording cannot be made because the saturation magnetic flux density of the Mn-Zn single crystal ferrite is about 4000 to 5000 Gauss. Furthermore, sufficient reproduction image quality and high S/N ratio cannot be obtained, and high-density recording and reproduction cannot be achieved.

そこで、このような欠点を解決する為に、磁気ヘッドの
磁性材料として、飽和磁束密度は現在の単結晶フェライ
トに比べて約2倍程度大きく、かつ透磁率は同程度のも
のである、例えば〕し・7アス金属磁性材料あるいはセ
ンダスト合金磁性材料を用いることが考えられている。
Therefore, in order to solve these drawbacks, we have developed a magnetic material for magnetic heads that has a saturation magnetic flux density approximately twice as high as that of current single-crystal ferrite, and a magnetic permeability that is about the same. It has been considered to use a magnetic material such as a 7-A metal magnetic material or a Sendust alloy magnetic material.

しかし、このような金属磁性材料で従莱の磁気ヘッドと
同構造の磁気ヘッドを構成したのでは、コアの磁性材料
が金属であることより比抵抗が小さく、渦電流損失が問
題となる。
However, if a magnetic head having the same structure as the Jourai magnetic head is constructed using such a metallic magnetic material, the specific resistance is lower than that of the magnetic material of the core due to the metal, and eddy current loss becomes a problem.

そこで、このような問題を解決する為に、磁気ヘッドの
コア材料として、金属磁性薄膜と5iOz又はA t2
’ 03等の酸化物系非磁性材料による薄膜とを交互に
積層した多層薄膜積層体を用いることが提案されている
Therefore, in order to solve this problem, we used a metal magnetic thin film and 5iOz or At2 as the core material of the magnetic head.
It has been proposed to use a multilayer thin film laminate in which thin films made of oxide-based nonmagnetic materials such as '03 are alternately laminated.

又、さらには、約1000〜100OOA厚の金属磁性
薄膜と約10〜100OA 厚の酸化物系非磁性薄膜と
を交互に積層した多層薄膜積層体を用いて、薄膜型の磁
気ヘッドを作ることが提案されている。
Furthermore, it is possible to make a thin-film type magnetic head using a multilayer thin film laminate in which metal magnetic thin films with a thickness of about 1000 to 100 OA and oxide-based nonmagnetic thin films with a thickness of about 10 to 100 OA are alternately laminated. Proposed.

しかし、本発明者の研究によれば、このような金属磁性
薄膜と酸化物系非磁性薄膜との多層薄膜積層体は、その
構成材料である金属磁性薄膜と酸化物系非磁性薄膜との
物理的特性が異なりすぎ、例えば金属磁性薄膜と酸化物
系非磁性薄膜との熱膨張係数が大巾に異なることより、
多層薄膜構成において生じる応力歪が大きく、又、例え
ばエツチングによって加工する場合に、エツチング特性
が大1]に異なる(金属材料の方が酸化物材料よりエツ
チング速度が速い)ことより、エツチング加工性が悪い
といった欠点のあることがわかってきた。
However, according to the research of the present inventor, such a multilayer thin film laminate of a metal magnetic thin film and an oxide-based nonmagnetic thin film is difficult to form due to the physics of the metal magnetic thin film and oxide-based nonmagnetic thin film that are its constituent materials. For example, the thermal expansion coefficients of metal magnetic thin films and oxide non-magnetic thin films are vastly different.
The stress strain that occurs in a multilayer thin film structure is large, and when processing, for example, by etching, the etching properties are significantly different (metal materials have a faster etching rate than oxide materials), so etching processability is It has become clear that there are some drawbacks.

〔問題点を解決する為の手段〕[Means for solving problems]

金属磁性薄膜層と金属非磁性薄膜層とを積層構成する。 A metal magnetic thin film layer and a metal nonmagnetic thin film layer are laminated.

〔実施例〕〔Example〕

図面は、本発明に係る磁性材料の1実施例の説明図であ
る。
The drawing is an explanatory diagram of one embodiment of the magnetic material according to the present invention.

同図中、1は、例えばセラミック、ガラス、金属といっ
たバルクな非磁性材料からなる基板である。
In the figure, 1 is a substrate made of a bulk nonmagnetic material such as ceramic, glass, or metal.

2aは、基板1面上に、例えば蒸着、スパッタリング等
の乾式メッキ手段、又は電気若しくは無電解メッキとい
った湿式メッキ手段のような薄膜形成手段で構成された
、例えばパーマロイ、センダスト合金、あるいはアモル
ファス金属等の軟磁性材料による約100A〜1μm厚
の金属磁性薄膜層である。
2a is made of permalloy, sendust alloy, amorphous metal, etc., formed by a thin film forming means such as dry plating means such as vapor deposition or sputtering, or wet plating means such as electric or electroless plating, on the surface of the substrate 1. It is a metal magnetic thin film layer with a thickness of about 100A to 1 μm made of a soft magnetic material.

尚、2b、2cも2aと同様に構成された金属磁性薄膜
層である。
Incidentally, 2b and 2c are also metal magnetic thin film layers having the same structure as 2a.

3aは、金属磁性薄膜層23面上に上記薄膜形成手段と
同様な薄膜形成手段で構成された、例えばアルミニウム
、モリブデン、タングステン、チタン、ジルコニウム、
ニオブ、バナジウム、クロム、タンタル、ハフニウム等
の非磁性の金属材料による約10〜1000 A厚の金
属非磁性薄膜層である。
3a is formed by a thin film forming means similar to the above thin film forming means on the surface of the metal magnetic thin film layer 23, such as aluminum, molybdenum, tungsten, titanium, zirconium,
It is a metal nonmagnetic thin film layer with a thickness of about 10 to 1000 A made of a nonmagnetic metal material such as niobium, vanadium, chromium, tantalum, or hafnium.

尚、3bも3aと同様に構成された金属非磁性薄膜層で
ある。
Incidentally, 3b is also a metal nonmagnetic thin film layer having the same structure as 3a.

上記のように構成された積層型の磁性材料、例えば金属
磁性薄膜層の材料としてパーマロイが、又、金属非磁性
薄膜層の材料としてアルミニウム又はモリブデンが用い
られている積層型の磁性材料のエツチング加工特性は、
エツチング液としてリン酸、硝酸、塩酸及び水の混合液
を用いると、金属磁性薄膜層と金属非磁性薄膜層とが同
時にエツチング加工され、加工能率及び加工特性の良い
ものである。
Etching processing of a laminated magnetic material configured as described above, for example, a laminated magnetic material in which permalloy is used as the material for the metal magnetic thin film layer, and aluminum or molybdenum is used as the material for the metal nonmagnetic thin film layer. The characteristics are
When a mixed solution of phosphoric acid, nitric acid, hydrochloric acid, and water is used as the etching solution, the metal magnetic thin film layer and the metal nonmagnetic thin film layer are simultaneously etched, resulting in good processing efficiency and processing characteristics.

又、積層型の磁性材料を構成する金属磁性薄膜層と金属
非磁性薄膜層とは、いずれも金属材料であるから熱膨張
係数にそれ程の差はなく、つまり金属非磁性薄膜層の代
りに酸化物系非磁性材を用いた場合のような熱膨張係数
に大きな差はなく、従ってこれらの薄膜層が積層構成さ
れていても応力歪は少なく、従って機械的特性に優れて
いる。
In addition, since the metal magnetic thin film layer and the metal nonmagnetic thin film layer that make up the laminated magnetic material are both metal materials, there is not much difference in coefficient of thermal expansion. There is no large difference in coefficient of thermal expansion as in the case of using a physical non-magnetic material, so even if these thin film layers are laminated, stress strain is small, and the mechanical properties are excellent.

又、金属磁性薄膜層間の非磁性薄膜材料として金属材料
を用いても、金属磁性薄膜層の厚みを約10OA−1μ
m1かつ金属非磁性薄膜層の厚みを約10〜100OA
  としているので、各層の合計厚みかったように磁気
特性も著しく向上する。
Furthermore, even if a metal material is used as the non-magnetic thin film material between the metal magnetic thin film layers, the thickness of the metal magnetic thin film layer is approximately 10OA-1μ.
m1 and the thickness of the metal nonmagnetic thin film layer is approximately 10 to 100 OA.
As the total thickness of each layer is increased, the magnetic properties are also significantly improved.

〔効果〕〔effect〕

磁気特性の向上が得られるものであり、又、例えばエツ
チングによる加工特性が良く、さらには薄膜層間の応力
歪の少ないものであって、機械的特性の良いものである
It has improved magnetic properties, has good etching processing properties, has less stress strain between thin film layers, and has good mechanical properties.

【図面の簡単な説明】[Brief explanation of drawings]

図面は、本発明に係る磁性材料の1実施例の説明図であ
る。 2a 、 2b 、 2c・・・金属磁性薄膜層、3a
、3b・・・金属非磁性薄膜層。
The drawing is an explanatory diagram of one embodiment of the magnetic material according to the present invention. 2a, 2b, 2c...metal magnetic thin film layer, 3a
, 3b...Metal nonmagnetic thin film layer.

Claims (1)

【特許請求の範囲】[Claims] 金属磁性薄膜層と金属非磁性薄膜層とを積層構成したこ
とを特徴とする磁性材料。
A magnetic material characterized by having a laminated structure of a metal magnetic thin film layer and a metal nonmagnetic thin film layer.
JP1875785A 1985-02-04 1985-02-04 Magnetic material Pending JPS61179509A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1875785A JPS61179509A (en) 1985-02-04 1985-02-04 Magnetic material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1875785A JPS61179509A (en) 1985-02-04 1985-02-04 Magnetic material

Publications (1)

Publication Number Publication Date
JPS61179509A true JPS61179509A (en) 1986-08-12

Family

ID=11980516

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1875785A Pending JPS61179509A (en) 1985-02-04 1985-02-04 Magnetic material

Country Status (1)

Country Link
JP (1) JPS61179509A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61290703A (en) * 1985-06-19 1986-12-20 Sony Corp Soft magnetic thin film
JPS6255911A (en) * 1985-09-05 1987-03-11 Sony Corp Soft-magnetic thin film
JPS6380509A (en) * 1986-09-24 1988-04-11 Hitachi Ltd Magnetic superlattice film and magnetic head using same
JPS63254709A (en) * 1987-04-13 1988-10-21 Hitachi Ltd Laminated thin magnet film and magnetic head using the same
US4935311A (en) * 1987-04-13 1990-06-19 Hitachi, Ltd. Magnetic multilayered film and magnetic head using the same
JPH04214205A (en) * 1990-12-12 1992-08-05 Fuji Electric Co Ltd Thin-film magnetic head and its production

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4977198A (en) * 1972-12-01 1974-07-25

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4977198A (en) * 1972-12-01 1974-07-25

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61290703A (en) * 1985-06-19 1986-12-20 Sony Corp Soft magnetic thin film
JPS6255911A (en) * 1985-09-05 1987-03-11 Sony Corp Soft-magnetic thin film
JPS6380509A (en) * 1986-09-24 1988-04-11 Hitachi Ltd Magnetic superlattice film and magnetic head using same
JPS63254709A (en) * 1987-04-13 1988-10-21 Hitachi Ltd Laminated thin magnet film and magnetic head using the same
US4935311A (en) * 1987-04-13 1990-06-19 Hitachi, Ltd. Magnetic multilayered film and magnetic head using the same
JP2690893B2 (en) * 1987-04-13 1997-12-17 株式会社日立製作所 Laminated magnetic thin film and magnetic head using the same
JPH04214205A (en) * 1990-12-12 1992-08-05 Fuji Electric Co Ltd Thin-film magnetic head and its production

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