JPS6116349B2 - - Google Patents
Info
- Publication number
- JPS6116349B2 JPS6116349B2 JP7357982A JP7357982A JPS6116349B2 JP S6116349 B2 JPS6116349 B2 JP S6116349B2 JP 7357982 A JP7357982 A JP 7357982A JP 7357982 A JP7357982 A JP 7357982A JP S6116349 B2 JPS6116349 B2 JP S6116349B2
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- plasma
- reduced pressure
- gas
- common electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 claims description 32
- 238000005268 plasma chemical vapour deposition Methods 0.000 claims description 14
- 239000002994 raw material Substances 0.000 claims description 12
- 239000010409 thin film Substances 0.000 claims description 10
- 230000035699 permeability Effects 0.000 claims description 3
- 239000010408 film Substances 0.000 description 9
- 238000010438 heat treatment Methods 0.000 description 5
- 229910021417 amorphous silicon Inorganic materials 0.000 description 4
- 238000009423 ventilation Methods 0.000 description 4
- 230000006837 decompression Effects 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7357982A JPS58193360A (ja) | 1982-04-30 | 1982-04-30 | プラズマｃｖｄの方法およびその装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7357982A JPS58193360A (ja) | 1982-04-30 | 1982-04-30 | プラズマｃｖｄの方法およびその装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58193360A JPS58193360A (ja) | 1983-11-11 |
| JPS6116349B2 true JPS6116349B2 (enrdf_load_stackoverflow) | 1986-04-30 |
Family
ID=13522343
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7357982A Granted JPS58193360A (ja) | 1982-04-30 | 1982-04-30 | プラズマｃｖｄの方法およびその装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58193360A (enrdf_load_stackoverflow) |
-
1982
- 1982-04-30 JP JP7357982A patent/JPS58193360A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58193360A (ja) | 1983-11-11 |
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