JPS61154034A - Ｘ線露光装置 - Google Patents

Ｘ線露光装置

Info

Publication number
JPS61154034A
JPS61154034A JP59277538A JP27753884A JPS61154034A JP S61154034 A JPS61154034 A JP S61154034A JP 59277538 A JP59277538 A JP 59277538A JP 27753884 A JP27753884 A JP 27753884A JP S61154034 A JPS61154034 A JP S61154034A
Authority
JP
Japan
Prior art keywords
drive mechanism
reflecting mirror
synchrotron
mirror
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59277538A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0548615B2 (https=
Inventor
Junichi Iizuka
飯塚　潤一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP59277538A priority Critical patent/JPS61154034A/ja
Publication of JPS61154034A publication Critical patent/JPS61154034A/ja
Publication of JPH0548615B2 publication Critical patent/JPH0548615B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP59277538A 1984-12-26 1984-12-26 Ｘ線露光装置 Granted JPS61154034A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59277538A JPS61154034A (ja) 1984-12-26 1984-12-26 Ｘ線露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59277538A JPS61154034A (ja) 1984-12-26 1984-12-26 Ｘ線露光装置

Publications (2)

Publication Number Publication Date
JPS61154034A true JPS61154034A (ja) 1986-07-12
JPH0548615B2 JPH0548615B2 (https=) 1993-07-22

Family

ID=17584946

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59277538A Granted JPS61154034A (ja) 1984-12-26 1984-12-26 Ｘ線露光装置

Country Status (1)

Country Link
JP (1) JPS61154034A (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0242713A (ja) * 1988-08-02 1990-02-13 Nec Corp シンクロトロン放射光露光装置
JPH03202802A (ja) * 1989-12-28 1991-09-04 Canon Inc 照明系及びｘ線露光装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0242713A (ja) * 1988-08-02 1990-02-13 Nec Corp シンクロトロン放射光露光装置
JPH03202802A (ja) * 1989-12-28 1991-09-04 Canon Inc 照明系及びｘ線露光装置

Also Published As

Publication number Publication date
JPH0548615B2 (https=) 1993-07-22

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