JPS61154034A - Ｘ線露光装置 - Google Patents

Ｘ線露光装置

Info

Publication number
JPS61154034A
JPS61154034A JP59277538A JP27753884A JPS61154034A JP S61154034 A JPS61154034 A JP S61154034A JP 59277538 A JP59277538 A JP 59277538A JP 27753884 A JP27753884 A JP 27753884A JP S61154034 A JPS61154034 A JP S61154034A
Authority
JP
Japan
Prior art keywords
drive mechanism
reflecting mirror
synchrotron
mirror
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59277538A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0548615B2 (enExample
Inventor
Junichi Iizuka
飯塚　潤一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP59277538A priority Critical patent/JPS61154034A/ja
Publication of JPS61154034A publication Critical patent/JPS61154034A/ja
Publication of JPH0548615B2 publication Critical patent/JPH0548615B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59277538A 1984-12-26 1984-12-26 Ｘ線露光装置 Granted JPS61154034A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59277538A JPS61154034A (ja) 1984-12-26 1984-12-26 Ｘ線露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59277538A JPS61154034A (ja) 1984-12-26 1984-12-26 Ｘ線露光装置

Publications (2)

Publication Number Publication Date
JPS61154034A true JPS61154034A (ja) 1986-07-12
JPH0548615B2 JPH0548615B2 (enExample) 1993-07-22

Family

ID=17584946

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59277538A Granted JPS61154034A (ja) 1984-12-26 1984-12-26 Ｘ線露光装置

Country Status (1)

Country Link
JP (1) JPS61154034A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0242713A (ja) * 1988-08-02 1990-02-13 Nec Corp シンクロトロン放射光露光装置
JPH03202802A (ja) * 1989-12-28 1991-09-04 Canon Inc 照明系及びｘ線露光装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0242713A (ja) * 1988-08-02 1990-02-13 Nec Corp シンクロトロン放射光露光装置
JPH03202802A (ja) * 1989-12-28 1991-09-04 Canon Inc 照明系及びｘ線露光装置

Also Published As

Publication number Publication date
JPH0548615B2 (enExample) 1993-07-22

Similar Documents

Publication Publication Date Title
KR101235047B1 (ko) 라인 내로우잉 모듈
US6803994B2 (en) Wavefront aberration correction system
JP5141979B2 (ja) ステージ装置および露光装置
JP2004064076A (ja) 変形ミラー構造体、変形ミラーの制御方法及び露光装置
KR20000071712A (ko) 진공챔버내에서 이동 가능한 지지체와 전사투영장치에서의그 적용
US5134640A (en) Synchrotron radiation apparatus
JP3895319B2 (ja) リソグラフィ装置およびデバイス製造方法
US4803713A (en) X-ray lighography system using synchrotron radiation
KR890001264B1 (ko) X-선 석판 인쇄 시스템
EP0985976A2 (en) Illumination apparatus, projection exposure apparatus and projection exposure method
JP3278317B2 (ja) 露光装置及びデバイス製造方法
JP3231241B2 (ja) Ｘ線縮小露光装置、及び該装置を用いた半導体製造方法
JPS61154034A (ja) Ｘ線露光装置
JPH11330592A (ja) レーザ光源装置およびそれを備えた露光装置
JP3090708B2 (ja) シンクロトロン放射光照射装置及びｘ線露光装置
US5182763A (en) Reflection device
JP2009253048A (ja) 光学系、露光装置及び電子デバイスの製造方法
EP0435644B1 (en) Scanning system
JP2743861B2 (ja) レーザスキャン装置
EP0869703B1 (en) Acoustic delay line with movable partition plates
JPH10511810A (ja) Ｘ線リソグラフィー用ビームラインのための出口ウィンドウ
JPH0570296B2 (enExample)
JPWO2005086209A1 (ja) 光学素子、投影光学系及び露光装置
JPH02234498A (ja) シンクロトロン放射光走査装置
JP3028675B2 (ja) Ｘ線走査装置