JPS61145606A - 干渉対応形パタ−ン切換式温度制御装置 - Google Patents

干渉対応形パタ−ン切換式温度制御装置

Info

Publication number
JPS61145606A
JPS61145606A JP59266411A JP26641184A JPS61145606A JP S61145606 A JPS61145606 A JP S61145606A JP 59266411 A JP59266411 A JP 59266411A JP 26641184 A JP26641184 A JP 26641184A JP S61145606 A JPS61145606 A JP S61145606A
Authority
JP
Japan
Prior art keywords
temperature
furnace
distribution pattern
set value
temperature distribution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59266411A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0149961B2 (OSRAM
Inventor
Takehiko Motomiya
本宮　丈彦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ohkura Electric Co Ltd
Original Assignee
Ohkura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ohkura Electric Co Ltd filed Critical Ohkura Electric Co Ltd
Priority to JP59266411A priority Critical patent/JPS61145606A/ja
Priority to US06/806,817 priority patent/US4688180A/en
Publication of JPS61145606A publication Critical patent/JPS61145606A/ja
Publication of JPH0149961B2 publication Critical patent/JPH0149961B2/ja
Granted legal-status Critical Current

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/02—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity of multiple-track type; of multiple-chamber type; Combinations of furnaces
    • F27B9/029—Multicellular type furnaces constructed with add-on modules
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/06—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity heated without contact between combustion gases and charge; electrically heated
    • F27B9/062—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity heated without contact between combustion gases and charge; electrically heated electrically heated
    • F27B9/063—Resistor heating, e.g. with resistors also emitting IR rays
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/30—Details, accessories or equipment specially adapted for furnaces of these types
    • F27B9/40—Arrangements of controlling or monitoring devices
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D23/00—Control of temperature
    • G05D23/19—Control of temperature characterised by the use of electric means
    • G05D23/1917—Control of temperature characterised by the use of electric means using digital means
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D23/00—Control of temperature
    • G05D23/19—Control of temperature characterised by the use of electric means
    • G05D23/20—Control of temperature characterised by the use of electric means with sensing elements having variation of electric or magnetic properties with change of temperature
    • G05D23/22—Control of temperature characterised by the use of electric means with sensing elements having variation of electric or magnetic properties with change of temperature the sensing element being a thermocouple

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Automation & Control Theory (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Control Of Temperature (AREA)
  • Feedback Control In General (AREA)
  • Waste-Gas Treatment And Other Accessory Devices For Furnaces (AREA)
JP59266411A 1984-12-19 1984-12-19 干渉対応形パタ−ン切換式温度制御装置 Granted JPS61145606A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP59266411A JPS61145606A (ja) 1984-12-19 1984-12-19 干渉対応形パタ−ン切換式温度制御装置
US06/806,817 US4688180A (en) 1984-12-19 1985-12-10 Pattern-switching temperature control apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59266411A JPS61145606A (ja) 1984-12-19 1984-12-19 干渉対応形パタ−ン切換式温度制御装置

Publications (2)

Publication Number Publication Date
JPS61145606A true JPS61145606A (ja) 1986-07-03
JPH0149961B2 JPH0149961B2 (OSRAM) 1989-10-26

Family

ID=17430558

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59266411A Granted JPS61145606A (ja) 1984-12-19 1984-12-19 干渉対応形パタ−ン切換式温度制御装置

Country Status (2)

Country Link
US (1) US4688180A (OSRAM)
JP (1) JPS61145606A (OSRAM)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06301404A (ja) * 1993-04-14 1994-10-28 Nec Corp 協調方式
JPH0895648A (ja) * 1994-09-21 1996-04-12 Nec Corp 温度制御方法および装置
JP2001306103A (ja) * 2000-04-18 2001-11-02 Omron Corp 制御装置、温度調節器および熱処理装置
CN115220498A (zh) * 2021-06-04 2022-10-21 广州汽车集团股份有限公司 温度控制设备的控制方法、温度控制设备及存储介质

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4841459A (en) * 1986-04-09 1989-06-20 Toshiba Kikai Kabushiki Kaisha Temperature indicating control apparatus having data storing function
US5375448A (en) * 1987-08-12 1994-12-27 Hitachi, Ltd. Non-interference control method and device
DE3830867C1 (OSRAM) * 1988-09-10 1990-01-18 Hermann Berstorff Maschinenbau Gmbh, 3000 Hannover, De
DE3834574A1 (de) * 1988-10-11 1990-04-12 Berstorff Gmbh Masch Hermann Arbeitsverfahren und vorrichtung zum gleichmaessigen erwaermen mittels mikrowellen
US4907177A (en) * 1988-10-31 1990-03-06 Grumman Aerospace Corporation Computerized multi-zone crystal growth furnace precise temperature and heating control method
US5151871A (en) * 1989-06-16 1992-09-29 Tokyo Electron Limited Method for heat-processing semiconductor device and apparatus for the same
JPH0786783B2 (ja) * 1989-11-04 1995-09-20 勝久 古田 調整入力による炉温制御装置
US5273424A (en) * 1990-03-23 1993-12-28 Tokyo Electron Sagami Limited Vertical heat treatment apparatus
EP0469522B1 (en) * 1990-07-30 1996-05-29 Nikkiso Co., Ltd. Production method and apparatus for vapor-grown fine fibers
US5291514A (en) * 1991-07-15 1994-03-01 International Business Machines Corporation Heater autotone control apparatus and method
DE4137148A1 (de) * 1991-11-12 1993-05-13 Transtec Verfahren zur steuerung eines tunnelofens
JP2654328B2 (ja) * 1993-03-11 1997-09-17 勝久 古田 調整入力利用のカスケード炉温制御装置
US5582235A (en) * 1994-08-11 1996-12-10 Micro Control Company Temperature regulator for burn-in board components
US5517594A (en) * 1994-10-17 1996-05-14 Relman, Inc. Thermal reactor optimization
DE69728256T2 (de) 1996-01-31 2005-03-03 Asm America Inc., Phoenix Modellgestützte prädiktive regelung für thermische behandlungen
US5895596A (en) * 1997-01-27 1999-04-20 Semitool Thermal Model based temperature controller for semiconductor thermal processors
US5994675A (en) * 1997-03-07 1999-11-30 Semitool, Inc. Semiconductor processing furnace heating control system
EP1093664A4 (en) * 1998-05-11 2003-07-09 Semitool Inc TEMPERATURE CONTROL SYSTEM FOR THERMAL ACTUATOR
US6560514B1 (en) 1999-09-23 2003-05-06 Kic Thermal Profiling Method and apparatus for optimizing control of a part temperature in conveyorized thermal processor
US6453219B1 (en) 1999-09-23 2002-09-17 Kic Thermal Profiling Method and apparatus for controlling temperature response of a part in a conveyorized thermal processor
US6283379B1 (en) 2000-02-14 2001-09-04 Kic Thermal Profiling Method for correlating processor and part temperatures using an air temperature sensor for a conveyorized thermal processor
DE50010559D1 (de) * 2000-04-11 2005-07-21 Siempelkamp Handling Sys Gmbh Vorwärmtechnik mit Leistungsdrosselung bei Betriebsunterbrechungen
WO2001079943A1 (en) * 2000-04-14 2001-10-25 Omron Corporation Controller, temperature regulator, and heat treatment apparatus
US6818864B2 (en) * 2002-08-09 2004-11-16 Asm America, Inc. LED heat lamp arrays for CVD heating
JP2006113724A (ja) * 2004-10-13 2006-04-27 Omron Corp 制御方法、温度制御方法、温度調節器、熱処理装置、プログラムおよび記録媒体
JP4758716B2 (ja) * 2005-09-16 2011-08-31 株式会社タムラ製作所 加熱装置の制御方法
US20070268778A1 (en) * 2006-05-22 2007-11-22 Wesley Van Velsor Aggregate preheating system, kit and method
MY160998A (en) * 2008-01-18 2017-03-31 Astc Tech Ltda Improved burning system
WO2011077702A1 (ja) * 2009-12-25 2011-06-30 キヤノンアネルバ株式会社 基板加熱処理装置の温度制御方法、半導体デバイスの製造方法、基板加熱処理装置の温度制御プログラム及び記録媒体
DE102016113062A1 (de) * 2016-07-15 2018-01-18 Eisenmann Se Vorrichtung, Anlage und Verfahren zum Temperieren von Werkstücken
CN106227264B (zh) * 2016-08-24 2018-03-16 成都飞机工业（集团）有限责任公司 一种盐浴炉温度控制系统
US10998205B2 (en) * 2018-09-14 2021-05-04 Kokusai Electric Corporation Substrate processing apparatus and manufacturing method of semiconductor device

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4004138A (en) * 1972-05-16 1977-01-18 Hitachi, Ltd. Method of and system for controlling temperature of continuous furnace
US4223385A (en) * 1978-09-21 1980-09-16 Westinghouse Electric Corp. Control of workpiece heating
JPS5848011B2 (ja) * 1979-11-26 1983-10-26 日本鋼管株式会社 加熱炉燃焼制御方法
US4394121A (en) * 1980-11-08 1983-07-19 Yoshinori Wakamiya Method of controlling continuous reheating furnace
JPS5947324A (ja) * 1982-09-08 1984-03-17 Mitsubishi Electric Corp 加熱炉の加熱制御方法
US4577278A (en) * 1983-07-18 1986-03-18 North American Manufacturing Company Method and system for controlling a selected zone in a fuel fired furnace

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06301404A (ja) * 1993-04-14 1994-10-28 Nec Corp 協調方式
JPH0895648A (ja) * 1994-09-21 1996-04-12 Nec Corp 温度制御方法および装置
JP2001306103A (ja) * 2000-04-18 2001-11-02 Omron Corp 制御装置、温度調節器および熱処理装置
CN115220498A (zh) * 2021-06-04 2022-10-21 广州汽车集团股份有限公司 温度控制设备的控制方法、温度控制设备及存储介质

Also Published As

Publication number Publication date
JPH0149961B2 (OSRAM) 1989-10-26
US4688180A (en) 1987-08-18

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