JPS61137101A - マイクロフレネルレンズの製造方法 - Google Patents
マイクロフレネルレンズの製造方法Info
- Publication number
- JPS61137101A JPS61137101A JP25848484A JP25848484A JPS61137101A JP S61137101 A JPS61137101 A JP S61137101A JP 25848484 A JP25848484 A JP 25848484A JP 25848484 A JP25848484 A JP 25848484A JP S61137101 A JPS61137101 A JP S61137101A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- pattern
- resist
- film
- lens
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 12
- 238000000034 method Methods 0.000 claims abstract description 16
- 239000000758 substrate Substances 0.000 claims abstract description 15
- 238000005530 etching Methods 0.000 claims abstract description 10
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 8
- 239000010703 silicon Substances 0.000 claims abstract description 8
- 239000011521 glass Substances 0.000 claims description 9
- 239000002184 metal Substances 0.000 claims description 4
- 229910052751 metal Inorganic materials 0.000 claims description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 14
- 150000004767 nitrides Chemical class 0.000 abstract description 14
- 229910052814 silicon oxide Inorganic materials 0.000 abstract description 14
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 6
- 238000010894 electron beam technology Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 230000010363 phase shift Effects 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1876—Diffractive Fresnel lenses; Zone plates; Kinoforms
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25848484A JPS61137101A (ja) | 1984-12-07 | 1984-12-07 | マイクロフレネルレンズの製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25848484A JPS61137101A (ja) | 1984-12-07 | 1984-12-07 | マイクロフレネルレンズの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61137101A true JPS61137101A (ja) | 1986-06-24 |
| JPH0322601B2 JPH0322601B2 (enrdf_load_stackoverflow) | 1991-03-27 |
Family
ID=17320848
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP25848484A Granted JPS61137101A (ja) | 1984-12-07 | 1984-12-07 | マイクロフレネルレンズの製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61137101A (enrdf_load_stackoverflow) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6343101A (ja) * | 1986-08-08 | 1988-02-24 | Toyo Commun Equip Co Ltd | 透過型回折格子の製造方法 |
| JPS6349702A (ja) * | 1986-08-20 | 1988-03-02 | Toshiba Corp | グレ−テイングレンズの製造方法 |
| US6475704B1 (en) | 1997-09-12 | 2002-11-05 | Canon Kabushiki Kaisha | Method for forming fine structure |
| US6569608B2 (en) | 1998-09-18 | 2003-05-27 | Canon Kabushiki Kaisha | Method of manufacturing an element with multiple-level surface |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5028165B2 (ja) * | 2007-07-03 | 2012-09-19 | 日立建機株式会社 | エンジン動力機械 |
-
1984
- 1984-12-07 JP JP25848484A patent/JPS61137101A/ja active Granted
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6343101A (ja) * | 1986-08-08 | 1988-02-24 | Toyo Commun Equip Co Ltd | 透過型回折格子の製造方法 |
| JPS6349702A (ja) * | 1986-08-20 | 1988-03-02 | Toshiba Corp | グレ−テイングレンズの製造方法 |
| US6475704B1 (en) | 1997-09-12 | 2002-11-05 | Canon Kabushiki Kaisha | Method for forming fine structure |
| US7018783B2 (en) | 1997-09-12 | 2006-03-28 | Canon Kabushiki Kaisha | Fine structure and devices employing it |
| US6569608B2 (en) | 1998-09-18 | 2003-05-27 | Canon Kabushiki Kaisha | Method of manufacturing an element with multiple-level surface |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0322601B2 (enrdf_load_stackoverflow) | 1991-03-27 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TW200402596A (en) | Stamper, pattern transferring method using the stamper, and method of forming a structure by a transferred pattern | |
| US6569608B2 (en) | Method of manufacturing an element with multiple-level surface | |
| US5124561A (en) | Process for X-ray mask warpage reduction | |
| US6875695B2 (en) | System and method for analog replication of microdevices having a desired surface contour | |
| JPS61137101A (ja) | マイクロフレネルレンズの製造方法 | |
| WO2001069316A1 (en) | Exposure controlling photomask and production method therefor | |
| JPH11160510A5 (enrdf_load_stackoverflow) | ||
| US6803154B1 (en) | Two-dimensional phase element and method of manufacturing the same | |
| JP3576885B2 (ja) | 素子の製造方法 | |
| JPS6144628A (ja) | マイクロフレネルレンズの製造方法 | |
| JPH1130711A (ja) | 回折光学素子及びその製造方法及び光学機器 | |
| EP0499944B1 (en) | Method for forming a sloped surface having a predetermined slope | |
| JP3408217B2 (ja) | 微細構造の作成方法及び回折光学素子 | |
| JP2003139920A (ja) | マイクロレンズの製造方法 | |
| JPS60230650A (ja) | 微細パタ−ンの製作法 | |
| JP2002116315A (ja) | 微細光学素子の製造方法 | |
| US20230350112A1 (en) | Multi-level structures and methods for manufacturing the same | |
| US5252434A (en) | Method for forming a sloped surface having a predetermined slope | |
| JPS6266204A (ja) | フレネルレンズ及びその製造方法 | |
| JPS6144627A (ja) | マイクロフレネルレンズの製造方法 | |
| JP4306212B2 (ja) | 光導波路のコアの製造方法 | |
| JPH05343806A (ja) | 位相シフト型回折格子の製造方法 | |
| US6979527B2 (en) | Master base for fabrication and method for manufacturing the same | |
| JP2012009776A (ja) | 基板作製方法 | |
| US20090277795A1 (en) | Process for fabricating molding stamp |