JPS6112864A - 化合物蒸気吹付け装置 - Google Patents

化合物蒸気吹付け装置

Info

Publication number
JPS6112864A
JPS6112864A JP59131720A JP13172084A JPS6112864A JP S6112864 A JPS6112864 A JP S6112864A JP 59131720 A JP59131720 A JP 59131720A JP 13172084 A JP13172084 A JP 13172084A JP S6112864 A JPS6112864 A JP S6112864A
Authority
JP
Japan
Prior art keywords
compound
vapor
container
compd
compound vapor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59131720A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0225425B2 (enrdf_load_stackoverflow
Inventor
Yoshitomo Nakagawa
良知 中川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Instruments Inc
Original Assignee
Seiko Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Instruments Inc filed Critical Seiko Instruments Inc
Priority to JP59131720A priority Critical patent/JPS6112864A/ja
Priority to PCT/JP1985/000349 priority patent/WO1986000426A1/ja
Priority to DE8585903053T priority patent/DE3579236D1/de
Priority to EP85903053A priority patent/EP0221184B1/en
Publication of JPS6112864A publication Critical patent/JPS6112864A/ja
Priority to US07/227,469 priority patent/US4930439A/en
Publication of JPH0225425B2 publication Critical patent/JPH0225425B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72Repair or correction of mask defects
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04Coating on selected surface areas, e.g. using masks
    • C23C16/047Coating on selected surface areas, e.g. using masks using irradiation by energy or particles

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP59131720A 1984-06-26 1984-06-26 化合物蒸気吹付け装置 Granted JPS6112864A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP59131720A JPS6112864A (ja) 1984-06-26 1984-06-26 化合物蒸気吹付け装置
PCT/JP1985/000349 WO1986000426A1 (en) 1984-06-26 1985-06-21 Mask repairing apparatus
DE8585903053T DE3579236D1 (de) 1984-06-26 1985-06-21 Reparatur von masken.
EP85903053A EP0221184B1 (en) 1984-06-26 1985-06-21 Mask repairing apparatus
US07/227,469 US4930439A (en) 1984-06-26 1988-08-02 Mask-repairing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59131720A JPS6112864A (ja) 1984-06-26 1984-06-26 化合物蒸気吹付け装置

Publications (2)

Publication Number Publication Date
JPS6112864A true JPS6112864A (ja) 1986-01-21
JPH0225425B2 JPH0225425B2 (enrdf_load_stackoverflow) 1990-06-04

Family

ID=15064624

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59131720A Granted JPS6112864A (ja) 1984-06-26 1984-06-26 化合物蒸気吹付け装置

Country Status (1)

Country Link
JP (1) JPS6112864A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0544819U (ja) * 1991-10-18 1993-06-15 小岩金網株式会社 屋外用収納箱

Also Published As

Publication number Publication date
JPH0225425B2 (enrdf_load_stackoverflow) 1990-06-04

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