DE3579236D1 - Reparatur von masken. - Google Patents
Reparatur von masken.Info
- Publication number
- DE3579236D1 DE3579236D1 DE8585903053T DE3579236T DE3579236D1 DE 3579236 D1 DE3579236 D1 DE 3579236D1 DE 8585903053 T DE8585903053 T DE 8585903053T DE 3579236 T DE3579236 T DE 3579236T DE 3579236 D1 DE3579236 D1 DE 3579236D1
- Authority
- DE
- Germany
- Prior art keywords
- masks
- repair
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/72—Repair or correction of mask defects
- G03F1/74—Repair or correction of mask defects by charged particle beam [CPB], e.g. focused ion beam
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/047—Coating on selected surface areas, e.g. using masks using irradiation by energy or particles
Landscapes
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Toxicology (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59131720A JPS6112864A (ja) | 1984-06-26 | 1984-06-26 | 化合物蒸気吹付け装置 |
JP59232853A JPS61110140A (ja) | 1984-11-05 | 1984-11-05 | マスクリペア装置 |
JP1984171789U JPS638901Y2 (de) | 1984-11-13 | 1984-11-13 | |
PCT/JP1985/000349 WO1986000426A1 (en) | 1984-06-26 | 1985-06-21 | Mask repairing apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
DE3579236D1 true DE3579236D1 (de) | 1990-09-20 |
Family
ID=27316357
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8585903053T Expired - Lifetime DE3579236D1 (de) | 1984-06-26 | 1985-06-21 | Reparatur von masken. |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP0221184B1 (de) |
DE (1) | DE3579236D1 (de) |
WO (1) | WO1986000426A1 (de) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0316111B1 (de) * | 1987-11-09 | 1994-08-17 | AT&T Corp. | Maskenkorrektur |
US5747818A (en) * | 1996-10-21 | 1998-05-05 | Schlumberger Technologies Inc. | Thermoelectric cooling in gas-assisted FIB system |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3930155A (en) * | 1973-01-19 | 1975-12-30 | Hitachi Ltd | Ion microprobe analyser |
JPS5846055B2 (ja) * | 1977-04-30 | 1983-10-14 | 三菱電機株式会社 | ホトマスクの欠陥修正法 |
JPS5922372B2 (ja) * | 1979-02-21 | 1984-05-26 | 株式会社日立製作所 | フォトマスク修正方法 |
JPS55150226A (en) * | 1979-05-11 | 1980-11-22 | Hitachi Ltd | Method of correcting pattern |
JPS6052022A (ja) * | 1983-08-31 | 1985-03-23 | Nec Corp | マスクパタ−ン修正方法 |
-
1985
- 1985-06-21 WO PCT/JP1985/000349 patent/WO1986000426A1/ja active IP Right Grant
- 1985-06-21 DE DE8585903053T patent/DE3579236D1/de not_active Expired - Lifetime
- 1985-06-21 EP EP85903053A patent/EP0221184B1/de not_active Expired
Also Published As
Publication number | Publication date |
---|---|
WO1986000426A1 (en) | 1986-01-16 |
EP0221184A1 (de) | 1987-05-13 |
EP0221184B1 (de) | 1990-08-16 |
EP0221184A4 (de) | 1987-08-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8320 | Willingness to grant licences declared (paragraph 23) | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: SII NANO TECHNOLOGY INC., CHIBA, JP |