JPH0225425B2 - - Google Patents
Info
- Publication number
- JPH0225425B2 JPH0225425B2 JP59131720A JP13172084A JPH0225425B2 JP H0225425 B2 JPH0225425 B2 JP H0225425B2 JP 59131720 A JP59131720 A JP 59131720A JP 13172084 A JP13172084 A JP 13172084A JP H0225425 B2 JPH0225425 B2 JP H0225425B2
- Authority
- JP
- Japan
- Prior art keywords
- compound
- vapor
- container
- compound vapor
- heater
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 150000001875 compounds Chemical class 0.000 claims description 54
- 239000002245 particle Substances 0.000 claims description 7
- 238000005507 spraying Methods 0.000 claims description 6
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 239000012530 fluid Substances 0.000 claims 1
- 229940125904 compound 1 Drugs 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 4
- YNPNZTXNASCQKK-UHFFFAOYSA-N phenanthrene Chemical compound C1=CC=C2C3=CC=CC=C3C=CC2=C1 YNPNZTXNASCQKK-UHFFFAOYSA-N 0.000 description 4
- 229920006395 saturated elastomer Polymers 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 238000011109 contamination Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- AICOOMRHRUFYCM-ZRRPKQBOSA-N oxazine, 1 Chemical compound C([C@@H]1[C@H](C(C[C@]2(C)[C@@H]([C@H](C)N(C)C)[C@H](O)C[C@]21C)=O)CC1=CC2)C[C@H]1[C@@]1(C)[C@H]2N=C(C(C)C)OC1 AICOOMRHRUFYCM-ZRRPKQBOSA-N 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/72—Repair or correction of mask defects
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/047—Coating on selected surface areas, e.g. using masks using irradiation by energy or particles
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- General Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59131720A JPS6112864A (ja) | 1984-06-26 | 1984-06-26 | 化合物蒸気吹付け装置 |
| PCT/JP1985/000349 WO1986000426A1 (en) | 1984-06-26 | 1985-06-21 | Mask repairing apparatus |
| DE8585903053T DE3579236D1 (de) | 1984-06-26 | 1985-06-21 | Reparatur von masken. |
| EP85903053A EP0221184B1 (en) | 1984-06-26 | 1985-06-21 | Mask repairing apparatus |
| US07/227,469 US4930439A (en) | 1984-06-26 | 1988-08-02 | Mask-repairing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59131720A JPS6112864A (ja) | 1984-06-26 | 1984-06-26 | 化合物蒸気吹付け装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6112864A JPS6112864A (ja) | 1986-01-21 |
| JPH0225425B2 true JPH0225425B2 (enrdf_load_stackoverflow) | 1990-06-04 |
Family
ID=15064624
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59131720A Granted JPS6112864A (ja) | 1984-06-26 | 1984-06-26 | 化合物蒸気吹付け装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6112864A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0544819U (ja) * | 1991-10-18 | 1993-06-15 | 小岩金網株式会社 | 屋外用収納箱 |
-
1984
- 1984-06-26 JP JP59131720A patent/JPS6112864A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0544819U (ja) * | 1991-10-18 | 1993-06-15 | 小岩金網株式会社 | 屋外用収納箱 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6112864A (ja) | 1986-01-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5435850A (en) | Gas injection system | |
| US5827786A (en) | Charged particle deposition of electrically insulating films | |
| KR101128745B1 (ko) | 증기 방출 장치, 유기 박막 증착 장치 및 유기 박막 증착 방법 | |
| KR20140103071A (ko) | 기판 처리 장치 | |
| US20040173759A1 (en) | Device, set and method for carrying a gas or a liquid to a surface through a tube | |
| JPH0225425B2 (enrdf_load_stackoverflow) | ||
| KR101323249B1 (ko) | 초전도 선재 제조장치 및 제조방법 | |
| JP2004514063A (ja) | 液体原材料を気相にしてｃｖｄ反応室へ供給する装置及び方法 | |
| US2762722A (en) | Method and apparatus for coating by thermal evaporation | |
| JPH0112263Y2 (enrdf_load_stackoverflow) | ||
| JPS646506Y2 (enrdf_load_stackoverflow) | ||
| KR100471358B1 (ko) | 유기 전자 발광층의 증착 장치 | |
| JPS646505Y2 (enrdf_load_stackoverflow) | ||
| WO2015159428A1 (ja) | ラインソース | |
| KR0144917B1 (ko) | 하향분사가 가능한 소오스 구조를 이용한 이온빔 증착방법 및 그 장치 | |
| US5170032A (en) | Radiation manufacturing apparatus and amendment | |
| JP4965774B2 (ja) | 樹脂蒸着ユニットおよび成膜装置 | |
| JPS6319857B2 (enrdf_load_stackoverflow) | ||
| JPH01119663A (ja) | 薄膜形成装置 | |
| WO1986000426A1 (en) | Mask repairing apparatus | |
| JP2943076B2 (ja) | バブリング機構とこれを含む表面処理装置 | |
| US6706647B1 (en) | Method of and apparatus for manufacturing semiconductors | |
| JPS6154631A (ja) | エツチング方法 | |
| JPH0331477A (ja) | Ｃｖｄ装置用バブラー | |
| KR20030059708A (ko) | 세슘 공급 장치 및 방법 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313111 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| EXPY | Cancellation because of completion of term |